Observation of Paramagnetic Silicon Dangling Orbitals in Luminescent Porous Silicon

1992 ◽  
Vol 283 ◽  
Author(s):  
F. C. Rong ◽  
E. H. Poindexter ◽  
J. F. Harvey ◽  
D. C. Morton ◽  
R. A. Lux ◽  
...  

ABSTRACTWe have detected two dominant paramagnetic centers in porous silicon by electron paramagnetic resonance (EPR). One of them is isotropic, assigned to a defect in amorphous silicon oxide in the porous silicon layer. The other is anisotropic, and is very much like a Pb center at a planar Si/SiO2 interface. This EPR center is unambiguously identified as an •Si≡Si3 moiety, a silicon with dangling orbital, back-bonded to three silicon atoms, by 29 Si hyperfine structure (HFS) associated with the dangling orbital, and 29 Si superHFS from three neighboring silicon atoms, as similarly observed in the usual planar surface Pb structure. The dangling orbitals are highly localized and heavily p character. The disposition of dangling orbitals is evidence that the skeletal structure of luminescent porous silicon is crystalline and has a lattice which is aligned and continuous with the wafer substrate. The possibility that these centers are the major photoluminescent killers or quenchers is not supported by our hydrogen annealing experiments.

ChemInform ◽  
1990 ◽  
Vol 21 (47) ◽  
Author(s):  
M. YAMANA ◽  
N. KASHIWAZAKI ◽  
A. KINOSHITA ◽  
T. NAKANO ◽  
M. YAMAMOTO ◽  
...  

2013 ◽  
Vol 667 ◽  
pp. 397-401
Author(s):  
S.F.M. Yusop ◽  
N. Azaman ◽  
Hartini Ahmad Rafaie ◽  
S. Amizam ◽  
Saifollah Abdullah ◽  
...  

The characterized on porous silicon layer by using photoluminescence (PL) and I-V measurement (I-V) has been done. Porous silicon was formed by electrochemical etching on (100) p-type Si wafer substrate with the constant current density (20mA/cm2) and variable the etching time. The samples ware prepared under various etching time and properties of porous silicon depend on an etching time. Porous silicon has been used in humidity sensors to detect humidity through changes of its electrical properties. The samples of porous silicon were characterized by using Photoluminescence Spectroscopy (PL) that used to characterize optical properties while I-V Measurement (I-V) used to characterize porous silicon junction properties using a linear voltage source. The result shows PL intensity is increase while the wavelength is decrease for etching time of PSi is longer. For the I-V measurement result shows the etching time affect the resistance of sample due to its porosity.


1990 ◽  
Vol 137 (9) ◽  
pp. 2925-2927 ◽  
Author(s):  
M. Yamana ◽  
N. Kashiwazaki ◽  
A. Kinoshita ◽  
T. Nakano ◽  
M. Yamamoto ◽  
...  

2020 ◽  
Vol 12 (4) ◽  
pp. 04020-1-04020-5
Author(s):  
A. P. Oksanich ◽  
◽  
S. E. Pritchin ◽  
M. A. Mashchenko ◽  
A. Yu. Bobryshev ◽  
...  

1995 ◽  
Vol 66 (26) ◽  
pp. 3660-3662 ◽  
Author(s):  
M. Schoisswohl ◽  
J. L. Cantin ◽  
H. J. von Bardeleben ◽  
G. Amato

2017 ◽  
Vol 68 (7) ◽  
pp. 53-57 ◽  
Author(s):  
Martin Kopani ◽  
Milan Mikula ◽  
Daniel Kosnac ◽  
Jan Gregus ◽  
Emil Pincik

AbstractThe morphology and chemical bods of p-type and n-type porous Si was compared. The surface of n-type sample is smooth, homogenous without any features. The surface of p-type sample reveals micrometer-sized islands. FTIR investigation reveals various distribution of SiOxHycomplexes in both p-and n-type samples. From the conditions leading to porous silicon layer formation (the presence of holes) we suggest both SiOxHyand SiFxHycomplexes in the layer.


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