Laser-Assisted Growth of ZnSe by Metalorganic Molecular Beam Epitaxy

1992 ◽  
Vol 263 ◽  
Author(s):  
C. A. Coronado ◽  
E. Ho ◽  
L. A. Kolodziejski ◽  
C. A. Huber

ABSTRACTBy employing metalorganic molecular beam epitaxy (MOMBE), the heteroepitaxy of ZnSe on GaAs has been achieved using diethylselenium and diethylzinc. Significant (10x ∼ 15x) growth rate enhancement has been observed when radiation from an argon ion laser is incident to the surface; photons with energies greater than the bandgap at the growth temperature contribute to the enhancement. Photo-thermal effects are ruled out due to the low power densities used (∼200 mW/cm2). Growth rate enhancementis found to be a function of substrate temperature, VI/II gas flow ratio, laser wavelength and intensity. To further understand the effect of the laser on ZnSe growth, solid sources of Zn and Se are used in conjunction with metalorganic gas sources. The effect of laser illumination is found to depend on the combination of precursors employed: both growth rate enhancement and growth rate suppression are observed. Laser-assisted growth has application for achieving. selective area epitaxy and for tuning the surface stoichiometry.

1989 ◽  
Vol 54 (4) ◽  
pp. 335-337 ◽  
Author(s):  
H. Sugiura ◽  
R. Iga ◽  
T. Yamada ◽  
M. Yamaguchi

2020 ◽  
Vol 117 (22) ◽  
pp. 222105
Author(s):  
Piero Mazzolini ◽  
Andreas Falkenstein ◽  
Zbigniew Galazka ◽  
Manfred Martin ◽  
Oliver Bierwagen

1991 ◽  
Vol 30 (Part 2, No. 1A) ◽  
pp. L4-L6 ◽  
Author(s):  
Ryuzo Iga ◽  
Hideo Sugiura ◽  
Takeshi Yamada

1994 ◽  
Vol 340 ◽  
Author(s):  
H. K. Dong ◽  
S. C. H. Hung ◽  
C. W. Tu

ABSTRACTMetalorganic molecular beam epitaxy (MOMBE) of GaAs using triethylgallium (TEGa) and As4 has been studied by reflection high-energy electron diffraction (RHEED). The effect of varying the group-Ill flow rates and group-V beam flux on the growth rate has been investigated over a wide range of substrate temperatures. For a given arsenic flux, the GaAs growth rate first increases linearly as the TEGa flow rate increases. This linear relation extends up to a certain TEGa flow rate, where the growth rate reaches its maximum value. When the TEGa flow rate is increased above this critical value, the growth rate decreases and reaches a stabilized value. From a study of both group-Ill and group-V induced RHEED intensity oscillations, we find that the V/Ill incorporation ratio is unity at the transition point. Compared to conventional molecular beam epitaxy (MBE), MOMBE behaves differently when the V/Ill incorporation ratio is less than unity. The transition region between V/III>I and V/III<1 is gradual and no excess gallium accumulates on the surface during growth. The arseniccontrolled growth rate obtained from conventional group-V induced oscillations where excess Ga atoms are present is greater than the growth rate in the stabilization region where V/IIl<1.


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