Evolution of Structure with Fe Layer Thickness in low Dimensional Fe/Tb Multilayered Structures

1991 ◽  
Vol 238 ◽  
Author(s):  
V. G. Harris ◽  
K. D. Aylesworth ◽  
W. T. Elam ◽  
N. C. Koon ◽  
R. Coehoorn ◽  
...  
Keyword(s):  
Layer Thickness ◽  
Atomic Structure ◽  
Anisotropy Field ◽  
Amorphous Structure ◽  
Multilayered Structures ◽  
Kerr Rotation ◽  
Sample Plane ◽  
Low Dimensional ◽  
X Ray Absorption ◽  
Kerr Rotation Angle

ABSTRACTThe atomic structure of a series of low-dimensional Fe/Tb multilayered structures has been explored using a conversion-electron, extended x-ray absorption fine structure (EXAFS) technique. A structural transition from a close-packed amorphous structure to a body-centered crystalline structure is detected to occur over an Fe layer thickness range of 12.5 Å to 15.0 Å (Tb thickness is held constant at 4.5 Å). Magnetic properties, specifically, magnetization, anisotropy field, and Kerr rotation angle, are measured and found to change significantly in response to this transition. Exploitation of the polarization properties of synchrotron radiation allowed for the description of the atomic structure both perpendicular and parallel to the sample plane.

Magnetic and Magneto-Optic Properties of dc Magnetron Sputtered Co-Cr/Al Multilayers

1993 ◽  
Vol 313 ◽  
Author(s):  
G.W. Auner ◽  
R. Naik ◽  
U.M. Rao ◽  
Y. Zhao ◽  
B. Wang
Keyword(s):  
Figure Of Merit ◽  
Single Layer ◽  
Anisotropy Field ◽  
X Ray Diffraction ◽  
Multilayered Structures ◽  
Kerr Rotation ◽  
Axis Orientation ◽  
Glass Substrates ◽  
Multilayered Sample ◽  
Magneto Optic

ABSTRACTSingle layers of Co82?l8 with thickness in me ranee of 100–1500Å and multilayers of Co-Cr/Al with Co-Cr thickness in the range of 100–200A and Al at 7Å were prepared by dc magnetron sputtering. The films were deposited on to Si (111) and glass substrates at room temperature. A 100Å thick Al buffer layer was deposited to improve the c-axis orientation. X-ray diffraction (XRD) Measurements on the multilayers show a predominant Co-Cr (00.2) peak. Polar Magneto-optic measurements were performed to determine the Kerr rotation (θK) and figure of Merit. The results indicated an enhancement in the figure of merit at λ = 632.8 nm for the multilayered structures compared to single layer samples. All of the films show a 4πMs value around 6 kG and ferromagnetic resonance measurements indicate an enhancement in the perpendicular anisotropy field for the 150Å multilayered sample.

Material Characteristics and Electrical Modeling of Ultra Thin Copper Oxides in ULSI Application

2007 ◽  
Vol 561-565 ◽  
pp. 1225-1228
Author(s):  
Takayuki Ohba
Keyword(s):  
Diffraction Pattern ◽  
Barrier Height ◽  
Oxide Thickness ◽  
Amorphous Structure ◽  
Emission Model ◽  
X Ray Diffraction ◽  
Edge Structure ◽  
X Ray ◽  
Current Emission ◽  
X Ray Absorption

With the highest brilliance synchrotron radiation X-ray (SPring-8) and TEM observations, Cu oxides ranged 2-nm to 10-nm in thickness formed on sputtered Cu has been evaluated. For the plasma-assisted Cu oxide, weak Cu2O and/or CuO X-ray diffraction pattern is observed, while no diffraction pattern in native and thermally (170°C) grown oxides. Those native and thermal oxides show Cu2O coordination observed by XANES (X-ray Absorption Near Edge Structure) method. This suggests that Cu oxide formed at low temperatures consists of stoichiometric Cu2O in an amorphous structure. According to the Fowler-Nordheim (F-N) current emission model, the current emission taking place at Cu2O decreases with increasing of the oxide thickness and its mean barrier height (φB) in the MIM band structure. In case of current density at 106A/cm2 of 1V, it is estimated that the allowable thickness of Cu oxides is approximately 1.5-nm at 1 eV of barrier height.

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