Dependence of Kerr rotation angle of Tb-Fe-Co/Al bilayers on layer thickness

1993 ◽  
Vol 29 (6) ◽  
pp. 3367-3369 ◽  
Author(s):  
K. Song ◽  
H. Ito ◽  
M. Naoe
Keyword(s):  
Layer Thickness ◽  
Rotation Angle ◽  
Kerr Rotation ◽  
Kerr Rotation Angle

Microstructure and Magneto-Optical Properties of TbFeCo Films Prepared by Facing Targets Sputtering

1988 ◽  
Vol 132 ◽  
Author(s):  
H. Ito ◽  
T. Hirata ◽  
M. Naoe
Keyword(s):  
Magnetic Properties ◽  
Optical Properties ◽  
Rotation Angle ◽  
Perpendicular Magnetic Anisotropy ◽  
Columnar Structure ◽  
Torque Measurement ◽  
Amorphous Films ◽  
Kerr Rotation ◽  
Wide Range ◽  
Kerr Rotation Angle

ABSTRACTThe microstructure of TbFeCo amorphous films deposited by a facing targets type of sputtering (FTS) method varied with the change of deposition rate Rd. The films deposited at Rd of about 100–200 nm/min did not present any distinguishable columnar structure while the ones at Rd of about 50 nm/min revealed obvious columnar structure. The films with columnless structure exhibited Kerr rotation angle θk of 0.37 deg. of which the value was higher than that of the films with columnar structure over the wide range of Th content. The torque measurement implied that the presence of columnar structure was not mainly necessary for the occurrence of large perpendicular magnetic anisotropy. Under satisfactory confinement of plasma during sputtering, the dense, uniform and columnless TbFeCo films can be obtained on plasma-free substrate even at Rd as high as 200 nm/min, without destroying the excellent magnetic properties and magneto-optical characteristics.

Magneto-Optical Properties of Multilayered FePt for High Density Recording

2004 ◽  
Vol 834 ◽  
Author(s):  
Hojun Ryu ◽  
Dongwoo Suh ◽  
Yongwoo Park ◽  
Eunkyung Kim ◽  
Yonggoo Yoo ◽  
...  
Keyword(s):  
Computer Simulation ◽  
Heat Dissipation ◽  
Rotation Angle ◽  
Multilayered Structure ◽  
Thickness Variation ◽  
Kerr Rotation ◽  
Silicon Nitride Films ◽  
High Density Recording ◽  
Kerr Angle ◽  
Kerr Rotation Angle

ABSTRACTThe Si3N4/FePt/Si3N4/Al/Si structures have been fabricated. 57 nm silicon nitride films have been used as dielectric layer for heat dissipation and 500 nm Al film used for reflection layer. The Kerr rotation angle was changed with the FePt layer thickness. At the 65 % Pt composition in 10 nm FePt layer, the maximum Kerr rotation angle was 0.82°. As increase with FePt thickness the Kerr angle is slightly decreased. The change of Kerr rotation angle and the thermal behavior of multilayered structure according to FePt thickness variation were also calculated by computer simulation.

Effect of bias voltage on kerr rotation angle in amorphous TbFeCo films prepared by RF-sputtering

1984 ◽  
Vol 20 (5) ◽  
pp. 1027-1029 ◽  
Author(s):  
H. Tsujimoto ◽  
K. Saiki ◽  
S. Inokuchi ◽  
Y. Sakurai
Keyword(s):  
Bias Voltage ◽  
Rotation Angle ◽  
Rf Sputtering ◽  
Kerr Rotation ◽  
Kerr Rotation Angle

Wavelength dependencies of the Kerr rotation angle and ellipticity for the magneto‐optical recording media

1991 ◽  
Vol 70 (10) ◽  
pp. 6286-6288
Author(s):  
Feng Lei Zhou ◽  
J. Kevin Erwin ◽  
Charles F. Brucker ◽  
M. Mansuripur
Keyword(s):  
Rotation Angle ◽  
Optical Recording ◽  
Recording Media ◽  
Kerr Rotation ◽  
Kerr Rotation Angle
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