The Preparation of InAsSb/InSb SLS and InSb Photodiodes by MOCVD

1990 ◽  
Vol 216 ◽  
Author(s):  
R. M. Biefeld ◽  
B. T. Cunningham ◽  
S. R. Kurtz ◽  
J. R. Wendt

ABSTRACTInfrared absorption and photoluminescence have been demonstrated for InAs1-xSbx/InSb strained-layer superlattices (SLS's) in the 8-15 μm region for As content less than 20%. This extended infrared activity is due to the type II heterojunction band offset in these SLS's. The preparation of the first MOCVD grown p-n junction diode was achieved by using dimethyltellurium as an n-type dopant. Several factors, such as background doping and dopant profiles affect the performance of this device. InSb diodes have been prepared using tetraethyltin. The resulting current-voltage characteristics are improved over those of diodes grown previously using dimethyltellurium. Doping levels of 8x1015 to 5x1018cm−3 and mobilities of 6.7x104 to 1.1x104 cm2/Vs have been measured for Sn doped InSb. SLS diode structures have been prepared using Sn and Cd as the dopants. Structures prepared with p-type buffer layers are more reproducible.

1999 ◽  
Vol 607 ◽  
Author(s):  
S. Kato ◽  
T. Horikoshi ◽  
T. Ohkubo ◽  
T. Iida ◽  
Y. Takano

AbstractThe bulk crystal of silicon germanium was grown by vertical Bridgman method with germanium composition, x, varying from 0.6 to 1.0. The temperature dependent variation of the mobility is indicative of alloy scattering dominantly for the bulk wafer. Phosphorus was diffused in as-grown p-type bulk wafer at 850 °C to form pn-junction, and the diffusion coefficient of phosphorus was evaluated as a function of x. The diffusion behavior of phosphorus in silicon germanium is closely correlated with the germanium self-diffusion with changing x. For specimens with lower content x, P concentration profiles indicated “kink and tail” shape, while it was not observed for higher x. For current-voltage characteristics measurement, an ideality factor was obtained.


1985 ◽  
Vol 132 (2) ◽  
pp. 346-349 ◽  
Author(s):  
Nobuyoshi Koshida ◽  
Masahiro Nagasu ◽  
Takashi Sakusabe ◽  
Yuji Kiuchi

1994 ◽  
Vol 49 (13) ◽  
pp. 9244-9247 ◽  
Author(s):  
Xiuguang Jiang ◽  
P. J. Connolly ◽  
S. J. Hagen ◽  
C. J. Lobb

2006 ◽  
Vol 957 ◽  
Author(s):  
Yahya Alivov ◽  
Xiao Bo ◽  
Fan Qian ◽  
Daniel Johnstone ◽  
Cole Litton ◽  
...  

ABSTRACTThe conduction band offset of n-ZnO/n-6H-SiC heterostructures fabricated by rf-sputtered ZnO on commercial n-type 6H-SiC substrates has been measured. Temperature dependent current-voltage characteristics, photocapacitance, and deep level transient spectroscopy measurements showed the conduction band offsets to be 1.25 eV, 1.1 eV, and 1.22 eV, respectively.


1997 ◽  
Vol 82 (5) ◽  
pp. 2421-2426 ◽  
Author(s):  
I. Lapushkin ◽  
A. Zakharova ◽  
V. Gergel ◽  
H. Goronkin ◽  
S. Tehrani

1992 ◽  
Vol 46 (3) ◽  
pp. 1557-1563 ◽  
Author(s):  
P. Peyla ◽  
Y. Merle d’Aubigné ◽  
A. Wasiela ◽  
R. Romestain ◽  
H. Mariette ◽  
...  

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