Processing and Structural Characterization of Ferroelectric Thin Films Deposited by Ion Beam Sputtering

1990 ◽  
Vol 200 ◽  
Author(s):  
M. S. Ameen ◽  
T. M. Graettinger ◽  
S. H. Rou ◽  
H. N. Al-Shareef ◽  
K. D. Gifford ◽  
...  
Keyword(s):  
Ion Beam ◽  
Ferroelectric Properties ◽  
Processing Parameters ◽  
Layer By Layer ◽  
Ion Beam Sputtering ◽  
Target Holder ◽  
Feedback Information ◽  
Transparent Films ◽  
Precise Control ◽  
Crystal Resonator

ABSTRACTAn analysis is presented of the ion beam sputter deposition of ferroelectric KNbO3 and Pb(Zr, Ti)O3 (PZT), and the observed compositional, structural, and microstructural properties of these films. Films are deposited using a specially designed computer-controlled system with ability to produce multicomponent films via layer-by-layer deposition of elemental components. Metal or oxide targets are sequentially exposed to a high current ion beam by means of a rotatable target holder. A quartz crystal resonator provides feedback information on layer thicknesses to the computer. Precise control of film stoichiometry is obtained using this method.KNbO3, a material possessing a high figure-of-merit for electrooptic applications, has been deposited epitaxially on (100) MgO substrates. The structure of the optically transparent films has been studied with x-ray and electron diffraction, and transmission electron microscopy. The effects of various processing parameters on the microstructure of the films are discussed.We have demonstrated the ability of the technique to produce multicomponent films and control cation concentration at elevated substrate temperatures for materials such as PZT. The microstructure and associated ferroelectric properties are discussed in relation to processing conditions.

Characterization of KNbO3 Thin Films Deposited by Ion Beam Sputtering using a Computer-Controlled Rotating Target Holder

1989 ◽  
Vol 152 ◽  
Author(s):  
M. S. Ameen ◽  
T. M. Graettinger ◽  
O. Auciello ◽  
S. H. Rou ◽  
A. I. Kingon ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Target Holder ◽  
Crystal Resonator ◽  
Deposition Parameters ◽  
Beam Sputtering ◽  
Computer Controlled ◽  
Strong Candidate

ABSTRACTKNbO3 is a strong candidate as a material for use as channel waveguides due to a high electrooptic figure of merit. High quality single crystals are difficult to obtain due to incongruent melting of the compound. Control of cation concentration and oxygen incorporation are problems encountered in current thin film processing routes.In order to overcome the problems discussed above, an ion beam deposition system featuring a computer-controlled rotatable target holder and quartz crystal resonator (QCR) feedback loop has been developed. Multicomponent films are produced via sputtering from elemental or compound targets sequentially exposed to an ion beam. Initial results are presented on the use of this new technique for the deposition of KNbO3. Pressed KNbO3, Nb2O5, and KO2 powders were used as sputtering targets. By varying the programmed thickness of deposited film from each target being sputtered, the ratio of K:Nb could be reproducibly controlled. The variation in sticking coefficients due to substrate temperature was also compensated for in this manner.Thin films were analyzed by X-ray diffraction and TEM to determine phases present and film microstructure. Film morphology and composition has been studied as a function of substrate temperature, layer thickness, and ion beam process parameters. The relation between deposition parameters and film characteristics are discussed.

Epitaxial Growth of BSCCO Type Structure in Atomic Layer by Layer Deposition by Ion Beam Sputtering

1993 ◽  
pp. 849-852
Author(s):  
Hiroyuki Ota ◽  
Shinji Migita ◽  
Hiroshi Otera ◽  
Jun-Ichi Ito ◽  
Kazuo Sakai ◽  
...  
Keyword(s):  
Epitaxial Growth ◽  
Ion Beam ◽  
Atomic Layer ◽  
Type Structure ◽  
Layer By Layer ◽  
Ion Beam Sputtering ◽  
Layer Deposition ◽  
Beam Sputtering

Study of Droplet Diffusion in Hydrothermal-Assisted Transient Jet Fusion of Ceramics

2020 ◽  
Author(s):  
Fan Fei ◽  
Li He ◽  
Levi Kirby ◽  
Xuan Song
Keyword(s):  
High Performance ◽  
Functional Materials ◽  
Processing Parameters ◽  
Layer By Layer ◽  
Transient Solution ◽  
Powder Bed ◽  
Manufacturing Method ◽  
Precise Control ◽  
Powder Packing ◽  
Diffusion Profiles

Abstract Hydrothermal-assisted transient jet fusion (HTJF) is a powder-based additive manufacturing method of ceramics, which utilizes a water-mediated hydrothermal mechanism to fuse particles together, eliminating the use of organic binders in forming green bodies and thereby contributing to high green-density parts (> 90%) advantageous for fabricating functional materials with high-performance. In the HTJF process, a transient solution such as water is selectively deposited into a powder bed in a layer-by-layer fashion followed by a hydrothermal fusion process. Upon the ejection and deposition of a droplet of the transient solution on the surface of the powder bed, the diffusion behavior of the liquid significantly influences the particle fusion and the fabrication accuracy of the HTJF process. Precise control of the liquid diffusion in the powder bed is critical for the fabrication of ceramic structures with both high density and accuracy. In this paper, the dependence of transient solution diffusion on different process parameters (i.e., powder packing density, droplet size, pressure, etc.) in the HTJF process were studied. Both numerical modeling and experimental methods were used to quantify the relationships between processing parameters and diffusion profiles of transient solution droplets (e.g., diffusion width/depth). Optimum processing conditions were identified to mitigate the undesired diffusion of transient solution droplets in the powder bed.

scholarly journals Quantum Dots: An Emerging Approach for Cancer Therapy

2022 ◽  
Vol 8 ◽  
Author(s):  
Sheetal Devi ◽  
Manish Kumar ◽  
Abhishek Tiwari ◽  
Varsha Tiwari ◽  
Deepak Kaushik ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Ion Beam ◽  
Atomic Layer ◽  
Present Review ◽  
Layer By Layer ◽  
Ion Beam Sputtering ◽  
Photodynamic Treatment ◽  
Sputtering Deposition ◽  
Beam Sputtering ◽  
Fundamental Insight

Nanotechnology is indisputably a scientific technique that offers the prospect of new therapies, and hope, for the treatment of malignant illnesses. It is a novel technology that offers new approaches for the diagnosis and management of diverse diseases. Although the discovery of Quantum dots (QD) nano-transporters has already led to a few positive developments, QD nano-transporters are still at their initial stage, though have yet proven valuable to society. The excertion of QD indicates conversion in natural imaging along with photograph have established incredible suitability in bio-imaging, new drug development, targeted gene deliverance, biosensing, photodynamic treatment as well as diagnosis. The present review aimed to confer the significance of QD in diagnosis as well as in management of cancer. This review aims to impart fundamental insight as well as conception of QD its merits, properties, utilization as well as mode of action. This review highlight of different designing schemes of QD like hydrothermal, drop-casting, ultrasonic, solvothermal, spin-coating, atomic layer desorption, layer by layer, polymethylmethacrylate aided-transfer, electrochemical, ion beam sputtering deposition. Moreover, we have elaborated on the diverse researches related to cytotoxic examination to reveal that QDs are harmless. Concisely, the present review summarizes the fabrication schemes, current research and utilization of QD in cancer treatment.

Highly Transparent Arcproof Films for Space Applications

1998 ◽  
Vol 551 ◽  
Author(s):  
A. J. Adorjan ◽  
C. Alexander ◽  
T. L. Blanchard ◽  
E. Bruckner ◽  
R. Ferrante ◽  
...  
Keyword(s):  
Indium Tin Oxide ◽  
Electrical Transport ◽  
Ion Beam ◽  
Heat Treating ◽  
Ion Beam Sputtering ◽  
Sheet Resistivity ◽  
Space Applications ◽  
Transparent Films ◽  
Beam Sputtering ◽  
Commercial Applications

AbstractHighly transparent films with tailorable sheet resistivity were prepared by ion-beam sputtering of indium tin oxide (ITO) with MgF2 or SiO2 in the presence of high-purity air. Sheet resistivities of 103−101 ohms/square (ω/–) and visible transmittances as high as 92% (not corrected for substrate absorption) were obtained in films ∼30 nm thick. Resistivity increased by as much as two orders of magnitude in the first year after preparation; however, thicker films (e.g. 80 nm) were much more stable but somewhat less transparent. Preliminary data from exposure of film samples to atomic oxygen in a plasma asher indicate minimal degradation in optical properties. Heat-treating pure ITO in air produced transparent, slightly conductive films but with poorer stability of sheet resistivity in air than co-deposited ITO with either SiO2, or MgF2. Electrical transport measurements yielded new information on the electronic properties of ITO and related materials. These films show promise as low-absorption static bleedoff coatings for space photovoltaic arrays as well as CRT faceplates and other commercial applications.

Structural and Ferroelectric Properties of Domain-Structure-Controlled BiFeO$_{3}$ Thin Films Prepared by Dual-Ion-Beam Sputtering

2012 ◽  
Vol 51 ◽  
pp. 09LB02 ◽  
Author(s):  
Seiji Nakashima ◽  
Hironori Fujisawa ◽  
Yosuke Tsujita ◽  
Shota Seto ◽  
Masafumi Kobune ◽  
...  
Keyword(s):  
Thin Films ◽  
Domain Structure ◽  
Ion Beam ◽  
Ferroelectric Properties ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Study of Droplet Diffusion in Hydrothermal-Assisted Transient Jet Fusion of Ceramics

2020 ◽  
Vol 143 (5) ◽  
Author(s):  
Fan Fei ◽  
Li He ◽  
Levi Kirby ◽  
Xuan Song
Keyword(s):  
High Performance ◽  
Functional Materials ◽  
Processing Parameters ◽  
Layer By Layer ◽  
Transient Solution ◽  
Powder Bed ◽  
Precise Control ◽  
Powder Packing ◽  
And Diffusion ◽  
Diffusion Profiles

Abstract Hydrothermal-assisted transient jet fusion (HTJF) is a powder-based additive manufacturing (AM) method of ceramics, which utilizes a water-mediated hydrothermal mechanism to fuse particles together, eliminating the use of organic binders in forming green bodies and thereby contributing to high green-density parts (>90%) advantageous for fabricating functional materials with high performance. In the HTJF process, a transient solution such as water is selectively deposited into a powder bed in a layer-by-layer fashion followed by a hydrothermal fusion process. Upon the ejection and deposition of a droplet of the transient solution on the surface of the powder bed, the diffusion behavior of the liquid significantly influences the particle fusion and the fabrication accuracy of the HTJF process. Precise control of the liquid diffusion in the powder bed is critical for the fabrication of ceramic structures with both high density and accuracy. In this paper, the dependence of transient solution diffusion on different process parameters (i.e., powder packing density, droplet size, pressure, etc.) in the HTJF process were studied. Both numerical modeling and experimental methods were used to quantify the relationships between processing parameters and diffusion profiles of transient solution droplets (e.g., diffusion width/depth). Optimum processing conditions were identified to mitigate the undesired diffusion of transient solution droplets in the powder bed.

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