Highly Transparent Arcproof Films for Space Applications

1998 ◽  
Vol 551 ◽  
Author(s):  
A. J. Adorjan ◽  
C. Alexander ◽  
T. L. Blanchard ◽  
E. Bruckner ◽  
R. Ferrante ◽  
...  
Keyword(s):  
Indium Tin Oxide ◽  
Electrical Transport ◽  
Ion Beam ◽  
Heat Treating ◽  
Ion Beam Sputtering ◽  
Sheet Resistivity ◽  
Space Applications ◽  
Transparent Films ◽  
Beam Sputtering ◽  
Commercial Applications

AbstractHighly transparent films with tailorable sheet resistivity were prepared by ion-beam sputtering of indium tin oxide (ITO) with MgF2 or SiO2 in the presence of high-purity air. Sheet resistivities of 103−101 ohms/square (ω/–) and visible transmittances as high as 92% (not corrected for substrate absorption) were obtained in films ∼30 nm thick. Resistivity increased by as much as two orders of magnitude in the first year after preparation; however, thicker films (e.g. 80 nm) were much more stable but somewhat less transparent. Preliminary data from exposure of film samples to atomic oxygen in a plasma asher indicate minimal degradation in optical properties. Heat-treating pure ITO in air produced transparent, slightly conductive films but with poorer stability of sheet resistivity in air than co-deposited ITO with either SiO2, or MgF2. Electrical transport measurements yielded new information on the electronic properties of ITO and related materials. These films show promise as low-absorption static bleedoff coatings for space photovoltaic arrays as well as CRT faceplates and other commercial applications.

Ultraflat indium tin oxide films prepared by ion beam sputtering

2005 ◽  
Vol 473 (2) ◽  
pp. 218-223 ◽  
Author(s):  
Younggun Han ◽  
Donghwan Kim ◽  
Jun-Sik Cho ◽  
Seok-Keun Koh
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Ion Beam ◽  
Oxide Films ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Tin Oxide Films

scholarly journals Preparation and Spectrum Characterization of a High Quality Linear Variable Filter

Coatings ◽  
2018 ◽  
Vol 8 (9) ◽  
pp. 308 ◽  
Author(s):  
Haolong Tang ◽  
Jinsong Gao ◽  
Jian Zhang ◽  
Xiaoyi Wang ◽  
Xiuhua Fu
Keyword(s):  
Ion Beam ◽  
Single Layer ◽  
Spot Size ◽  
Optical Systems ◽  
Thickness Variation ◽  
Ion Beam Sputtering ◽  
Space Applications ◽  
Central Wavelength ◽  
Beam Sputtering ◽  
Linear Variable Filter

To meet the requirements for lightweight, miniaturized dispersive optical systems for space applications, linear variable filters with a high transmittance and spatial dispersion coefficient are proposed. The filters were produced with dual ion beam sputtering, where a single layer thickness variation was achieved with a deposition rate adjustment based on a linear variable correction formula. A linear variable trend matching method was used to correct the film thickness based on the reduction of the mismatch error between two materials: Ta2O5 and SiO2. The influence of the spectral and spatial measuring average effects was addressed by sampling the spot size optimization. This paper presents an all-dielectric linear variable filter that operates between 520 and 1000 nm, with an excellent linear dependence of 40 nm/mm over 12 mm. The linear variable filter possessed a 2.5% bandwidth, and its transmittance was found to be >80% at the central wavelength of the band, with a 0.1% transmittance in the cut-off region. These results indicate great potential for optical devices for space applications, and the developed process has good reproducibility and stability.

In situ electrical and mechanical study of Indium Tin Oxide films deposited on polyimide substrate by Xe ion beam sputtering

2022 ◽  
Vol 741 ◽  
pp. 139035
Author(s):  
T. Chommaux ◽  
P.O. Renault ◽  
D. Thiaudière ◽  
P. Godard ◽  
F. Paumier ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Ion Beam ◽  
Oxide Films ◽  
Ion Beam Sputtering ◽  
Polyimide Substrate ◽  
Mechanical Study ◽  
Beam Sputtering ◽  
Tin Oxide Films

Indium Tin Oxide Thin Films Deposited at Low Temperature Using Dual Ion Beam Sputtering

2014 ◽  
Vol 1699 ◽  
Author(s):  
Wilhelmus J. Geerts ◽  
Nelson A. Simpson ◽  
Alan D. Woodall ◽  
Maclyn Stuart Compton
Keyword(s):  
Flow Rate ◽  
Indium Tin Oxide ◽  
Atomic Oxygen ◽  
Ion Beam ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Visible Range ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

ABSTRACTITO samples were sputtered at room temperature by ion assisted dual ion beam sputtering using atomic or molecular oxygen. The electrical properties appear to depend on the oxygen flow rate during deposition and the resistivity decreases for samples sputtered at a higher oxygen flow rate (1-5 sccm). The resistivity is lowest at an oxygen flow rate of 4 sccm. The average absorption in the visible part of the spectrum also decreases as a function of the oxygen flow rate and is lower for samples sputtered with atomic oxygen. The figure of merit, i.e. the ratio of the conductivity versus the average absorption in the visible range, increases for higher oxygen flow rates and is typically 20-60% higher for samples sputtered using an atomic oxygen assist beam.

Effects of annealing on the properties of indium–tin oxide films prepared by ion beam sputtering

2005 ◽  
Vol 192 (1) ◽  
pp. 106-111 ◽  
Author(s):  
Ding-Fwu Lii ◽  
Jow-Lay Huang ◽  
Iau-Jiue Jen ◽  
Su-Shia Lin ◽  
Pavol Sajgalik
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Ion Beam ◽  
Oxide Films ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Tin Oxide Films
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