Study of Temperature and Light Bias Effects on the Occupied Near Surface Defect Density in Hydrogenated Amorphous Silicon

1990 ◽  
Vol 192 ◽  
Author(s):  
Samer Aljishi ◽  
J. David Cohen ◽  
Lothar Ley
Keyword(s):  
Surface Defect ◽  
Defect Density ◽  
Hydrogenated Amorphous Silicon ◽  
Valence Band Edge ◽  
Equilibrium Conditions ◽  
Near Surface ◽  
Effects Of Temperature ◽  
P Type ◽  
Hydrogenated Amorphous ◽  
Surface Defect Density

ABSTRACTThe occupied density of states distributions in doped and undoped a-Si:H are investigated. Results reveal the presence of a distinct defect sub-band at 0.6 eV above the valence band edge Ey in n-type and in undoped films. In p-type films, this band is absent. Instead, a new band centered at 0.8 eV above Ev develops. This band is normally unoccupied and is therefore only seen under non-equilibrium conditions. A sub-band at this energy is also discovered in undoped a-Si:H films. The effects of temperature and light bias on these defect sub-bands are discussed.

Is Thermal and Light-Induced Annealing of Met Astable Defects in a-Si:H Driven by Electrons?

1995 ◽  
Vol 377 ◽  
Author(s):  
Helena Gleskova ◽  
S. Wagner
Keyword(s):  
Electrical Conductivity ◽  
Light Intensity ◽  
Defect Density ◽  
Hydrogenated Amorphous Silicon ◽  
Free Electrons ◽  
Free Electron Density ◽  
Independent Variables ◽  
The Third ◽  
Defect Annealing ◽  
Hydrogenated Amorphous

ABSTRACTWe report results of a search for a unifying rate law for the annealing of metastable defects in hydrogenated amorphous silicon (a-Si:H). We tested the hypothesis that defect-annealing by both heating or illumination is driven by the density of free electrons. This hypothesis is formulated via the rate equation - dN/dt = A nα N f (T), where N is the defect density, t the time, A a constant, n the free electron density, and f (T) a function of temperature derived from a distribution of annealing energies. The model fits two sets of data, with light-intensity and electrical conductivity as the independent variables, reasonably well, with a ranging from 0.39 to 0.76, but not the third set, where we varied the temperature.

Light-Induced Metastable Defects or Light-Induced Metastable H Atoms in a-Si:H Films?

1997 ◽  
Vol 467 ◽  
Author(s):  
C. Godet
Keyword(s):  
Experimental Data ◽  
Characteristic Time ◽  
Defect Density ◽  
Hydrogenated Amorphous Silicon ◽  
Exponential Time ◽  
Mobile Species ◽  
Hydrogenated Amorphous ◽  
Two Parameter ◽  
Metastable Defect ◽  
Trapping Sites

ABSTRACTIn hydrogenated amorphous silicon (a-Si:H) films, the increase of the metastable defect density under high-intensity illumination is usually described by an empirical two-parameter stretched-exponential time dependence (characteristic time τSE and dispersion parameter β). In this study, a clearly different (one-parameter) analytic function is obtained from a microscopic model based on the formation of metastable H (MSH) atoms in a-Si:H films. Assuming that MSH atoms are the only mobile species, only three chemical reactions are significant : MSH are produced from doubly hydrogenated (SiH HSi) configurations and trapped either at broken bonds or Si-H bonds, corresponding respectively to light-induced annealing (LIA) and light-induced creation (LIC) of defects. Competition between trapping sites results in a saturation of N(t) at a steady-state value Nss. A one-parameter fit of this analytical function to experimental data is generally good, indicating that the use of a statistical distribution of trap energies is not necessary.

Controlling the Cytotoxicity of CdSe Magic-Sized Quantum Dots as a Function of Surface Defect Density

Nano Letters ◽  
2014 ◽  
Vol 14 (9) ◽  
pp. 5452-5457 ◽  
Author(s):  
Anielle Christine Almeida Silva ◽  
Marcelo José Barbosa Silva ◽  
Felipe Andrés Cordero da Luz ◽  
Danielle Pereira Silva ◽  
Samantha Luara Vieira de Deus ◽  
...  
Keyword(s):  
Quantum Dots ◽  
Surface Defect ◽  
Defect Density ◽  
Surface Defect Density

scholarly journals Numerical Design of Ultrathin Hydrogenated Amorphous Silicon-Based Solar Cell

2021 ◽  
Vol 2021 ◽  
pp. 1-13
Author(s):  
F. X. Abomo Abega ◽  
A. Teyou Ngoupo ◽  
J. M. B. Ndjaka
Keyword(s):  
Solar Cells ◽  
Solar Cell ◽  
Amorphous Silicon ◽  
Buffer Layer ◽  
Defect Density ◽  
Hydrogenated Amorphous Silicon ◽  
Theoretical Work ◽  
Silicon Based ◽  
The Impact ◽  
Hydrogenated Amorphous

Numerical modelling is used to confirm experimental and theoretical work. The aim of this work is to present how to simulate ultrathin hydrogenated amorphous silicon- (a-Si:H-) based solar cells with a ITO BRL in their architectures. The results obtained in this study come from SCAPS-1D software. In the first step, the comparison between the J-V characteristics of simulation and experiment of the ultrathin a-Si:H-based solar cell is in agreement. Secondly, to explore the impact of certain properties of the solar cell, investigations focus on the study of the influence of the intrinsic layer and the buffer layer/absorber interface on the electrical parameters ( J SC , V OC , FF, and η ). The increase of the intrinsic layer thickness improves performance, while the bulk defect density of the intrinsic layer and the surface defect density of the buffer layer/ i -(a-Si:H) interface, respectively, in the ranges [109 cm-3, 1015 cm-3] and [1010 cm-2, 5 × 10 13  cm-2], do not affect the performance of the ultrathin a-Si:H-based solar cell. Analysis also shows that with approximately 1 μm thickness of the intrinsic layer, the optimum conversion efficiency is 12.71% ( J SC = 18.95   mA · c m − 2 , V OC = 0.973   V , and FF = 68.95 % ). This work presents a contribution to improving the performance of a-Si-based solar cells.

Reduction of the Defect Density in a-Si:H Deposited at ≤250°C

1993 ◽  
Vol 297 ◽  
Author(s):  
Hitoshi Nishio ◽  
Gautam Ganguly ◽  
Akihisa Matsuda
Keyword(s):  
Diffusion Coefficient ◽  
Amorphous Silicon ◽  
Surface Diffusion ◽  
Film Growth ◽  
Defect Density ◽  
Hydrogenated Amorphous Silicon ◽  
Device Fabrication ◽  
Surface Diffusion Coefficient ◽  
Hydrogenated Amorphous ◽  
Substrate Temperatures

We present a method to reduce the defect density in hydrogenated amorphous silicon (a-Si:H) deposited at low substrate temperatures similar to those used for device fabrication . Film-growth precursors are energized by a heated mesh to enhance their surface diffusion coefficient and this enables them to saturate more surface dangling bonds.

Improved Light Soaking Stability of R.F. Sputter Deposited Amorphous Silicon

1991 ◽  
Vol 219 ◽  
Author(s):  
A. Wynveen ◽  
J. Fan ◽  
J. Kakalios ◽  
J. Shinar
Keyword(s):  
Amorphous Silicon ◽  
Hydrogen Content ◽  
Defect Density ◽  
Hydrogenated Amorphous Silicon ◽  
Dark Conductivity ◽  
Initial Defect ◽  
Optical Gap ◽  
Sputter Deposited ◽  
Staebler Wronski Effect ◽  
Hydrogenated Amorphous

ABSTRACTStudies of r.f. sputter deposited hydrogenated amorphous silicon (a-Si:H) find that the light induced decrease in the dark conductivity and photoconductivity (the Staebler-Wronski effect) is reduced when the r.f. power used during deposition is increased. The slower Staebler-Wronski effect is not due to an increase in the initial defect density in the high r.f. power samples, but may result from either the lower hydrogen content or the smaller optical gap found in these films.

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