KrF Laser-Induced Chemical Vapor Deposition of Diamond

1989 ◽  
Vol 162 ◽  
Author(s):  
George W. Tyndall ◽  
Nigel P. Hacker
Keyword(s):  
Vapor Deposition ◽  
Large Fraction ◽  
Pulsed Laser ◽  
Chemical Vapor ◽  
Normal Incidence ◽  
Carbon Films ◽  
Buffer Gas ◽  
Acid Vapor ◽  
Deposited Film ◽  
Pulsed Laser Beam

ABSTRACTA KrF* (248 nm) laser-based process for the deposition of carbon films containing a large fraction of diamond is reported. The experiment consists of focusing the pulsed laser beam at normal incidence onto the surface of a low temperature (20° - 150° C) silicon substrate in the presence of acetic or malonic acid vapor. The process does not require the presence of hydrogen, although an inert buffer gas, e. g. argon, is usually employed. Deposition rates of approximately 1 μm - hour−1 are obtained, and the presence of diamond in the deposited film is inferred from Raman Spectroscopy and Auger Electron Spectroscopy.

Using Molecular-Beam Mass Spectrometry to Study the Pecvd of Diamondlike Carbon Films

1993 ◽  
Vol 334 ◽  
Author(s):  
I.B. Graff ◽  
R.A. Pugliese ◽  
P.R. Westmoreland
Keyword(s):  
Mass Spectrometry ◽  
Vapor Deposition ◽  
Molecular Beam ◽  
Film Growth ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Total Flow ◽  
Measured Concentration ◽  
Molecular Beam Mass Spectrometry ◽  
Diamondlike Carbon

AbstractMolecular-beam mass spectrometry has been used to study plasma-enhanced chemical vapor deposition (PECVD) of diamondlike carbon films. A threshold-ionization technique was used to identify and quantify species in the plasma. Mole fractions of H, H2, CH4, C2H2, C2H6 and Ar were measured in an 83.3% CH4/Ar mixture at a pressure of 0.1 torr and a total flow of 30 sccm. Comparisons were made between mole fractions measured at plasma powers of 25W and 50W. These results were compared to measured concentration profiles and to film growth rates.

Surface studies of diamond-like carbon films grown by plasma-enhanced chemical vapor deposition

2010 ◽  
Vol 42 (12-13) ◽  
pp. 1702-1705 ◽  
Author(s):  
R. Maheswaran ◽  
R. Sivaraman ◽  
O. Mahapatra ◽  
P. C. Rao ◽  
C. Gopalakrishnan ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Surface Studies

Formation of Diamond-Like Carbon Films by Photoemission-Assisted Plasma-Enhanced Chemical Vapor Deposition

2013 ◽  
Vol 52 (11R) ◽  
pp. 110123 ◽  
Author(s):  
Meng Yang ◽  
Susumu Takabayashi ◽  
Shuichi Ogawa ◽  
Hiroyuki Hayashi ◽  
Radek Ješko ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon

Synthesis of diamond-like carbon films on Si substrates by photoemission-assisted plasma-enhanced chemical vapor deposition

2012 ◽  
Vol 523 ◽  
pp. 25-28 ◽  
Author(s):  
Meng Yang ◽  
Shuichi Ogawa ◽  
Susumu Takabayashi ◽  
Taiichi Otsuji ◽  
Yuji Takakuwa
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Si Substrates

Characterization of Low Temperature Chemical Vapor Deposited Gd2O3 Doped CeO2 Films

2011 ◽  
Vol 485 ◽  
pp. 133-136 ◽  
Author(s):  
Ryoichi Saotome ◽  
Naoki Wakiya ◽  
Takanori Kiguchi ◽  
Jeffrey S. Cross ◽  
Osamu Sakurai ◽  
...  
Keyword(s):  
Activation Energy ◽  
Vapor Deposition ◽  
Electrochemical Impedance ◽  
Pulsed Laser ◽  
Chemical Vapor ◽  
Partial Pressures ◽  
Chemical Vapor Deposited ◽  
Electrical Conductivities ◽  
Deposited Films

Highly oriented and polycrystalline Gd2O3 doped CeO2 thin films were prepared on α-Al2O3(0001) substrates by chemical vapor deposition, using Ce(C5H4C2H5)3 and Gd(C5H4C2H5)3 as precursors. The compositions of the films were controlled by optimizing the vaporization pressure of Gd precursor under the constant vaporization condition of Ce precursor. In-plane electrical conductivities of the films at various temperatures and oxygen partial pressures were evaluated by electrochemical impedance spectroscopy measurements. The activation energy of the film was determined as 0.94 eV, which is comparable with that of pulsed laser deposited films.

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