Growth of High Quality Lwir Films by Liquid Phase Epitaxy

1989 ◽  
Vol 161 ◽  
Author(s):  
Dipankar Chandra

ABSTRACTGrowth of long wavelength infra-red mercury cadmium telluride films by liquid phase epitaxy has usually yielded films of inferior electrical properties as evidenced by Hall mobilities lower than theoretical values by factors of 5 or more at 77°K. In addition the Hall behavior over the entire temperature range did not follow classical patterns. A systematic series of investigations was conducted to improve the electrical performance of these films by four methods: i) growth of HgCdZnTe films, where a portion of the cadmium was replaced by zinc, ii) growth at temperatures > 550°C, iii) growth at a slow rate on a CdZnTe substrate following ‘Cleaning’ in the melt of the substrate surface and iv) doping the film by controlled levels of indium. The first method did not lead to any improvements in the Hall behavior. In addition, the films grown displayed varying dislocation densities. The second method led to a small but definite increase in the yield of non-anomalous or classical films (5%). The third method yielded films with classical or non-anomalous Hall behavior about 20% of the time. The last method consistently led to films with classical Hall behavior. This was accomplished with indium doping levels at 1.5× 1014/cm3. Preliminary data indicate that it will be possible to go to still lower doping levels while maintaining classical Hall behavior. The improvement in electrical properties of these epifilms can be attributed to the reduction or elimination of type inhomogeneities known to degrade Hall mobilities in films grown by liquid phase epitaxy.

1980 ◽  
Vol 51 (10) ◽  
pp. 5438 ◽  
Author(s):  
Shigeo Fujita ◽  
S.M. Bedair ◽  
M.A. Littlejohn ◽  
J.R. Hauser

2015 ◽  
Author(s):  
Yingfei Lv ◽  
Shuhong Hu ◽  
Yonggang Xu ◽  
Yang Wang ◽  
Guolin Yu ◽  
...  

1998 ◽  
pp. 1029-1032
Author(s):  
Kenji Hashimoto ◽  
Sadahiko Miura ◽  
Toshiaki Takagi ◽  
Jian-Guo Wen ◽  
Naoki Koshizuka ◽  
...  

1998 ◽  
Vol 24 (3) ◽  
pp. 243-245 ◽  
Author(s):  
M. Aidaraliev ◽  
N. V. Zotova ◽  
S. A. Karandashev ◽  
B. A. Matveev ◽  
M. A. Remennyi ◽  
...  

1995 ◽  
Vol 24 (5) ◽  
pp. 497-504 ◽  
Author(s):  
J. P. Tower ◽  
S. P. Tobin ◽  
M. Kestigian ◽  
P. W. Norton ◽  
A. B. Bollong ◽  
...  

1980 ◽  
Vol 23 (8) ◽  
pp. 839-844 ◽  
Author(s):  
S.B. Phatak ◽  
S.M. Bedair ◽  
Shigeo Fujita

2014 ◽  
Vol 936 ◽  
pp. 486-490 ◽  
Author(s):  
Yan Cai Zhu ◽  
Jing Qin Wang ◽  
Li Qiang An ◽  
Hai Tao Wang

In order to improve the machinability and electrical performance of the Ag electrical contact materials. A new kind of nano-Ag/SnO2-TiO2 electrical contact materials were prepared by liquid phase in-situ chemical route. The distribution state of elements titanium in copper and their effects on the microstructures and properties have been studied. The results of SEM show that SnO2-TiO2 powders are small, uniform and with no obvious phenomenon of reunion. At last, Ag/SnO2-TiO2 electrical contact materials were prepared by powder metallurgy method and electrical performance were done. Test results show that the electrical properties of Ag/SnO2-TiO2 are superior to the electrical properties of Ag/SnO2. Hence Ag/SnO2-TiO2 may become a new contact material which can replace Ag/SnO2.


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