Hollow Cold Cathode Ion Source for Reactive Ion-Beam Etching

1989 ◽  
Vol 158 ◽  
Author(s):  
A.I. Stognij ◽  
V.V. Tokarev
Keyword(s):  
Ion Beam ◽  
High Vacuum ◽  
Ion Source ◽  
Operating Parameters ◽  
Cold Cathode ◽  
Plasma Emitter ◽  
Ion Beam Etching ◽  
Pressure Discharge ◽  
Reactive Gas ◽  
Cold Cathode Ion Source

ABSTRACTA wide-aperture reactive gas ion source has been developed for various ion-beam processings in high vacuum (p < < 5×10−2 Pa). The peculiar feature of the ion source is that two-stage self-maintained low-pressure discharge is used here as a plasma emitter. This provides high operating parameters of the source along with simple diode-type structure.

The Synthesis of Metal Oxide Films from Compound Powder Targets

1991 ◽  
Vol 236 ◽  
Author(s):  
A.I. Stognij ◽  
V.V. Tokarev ◽  
Yu.N. Mitin
Keyword(s):  
Metal Oxide ◽  
Ion Beam ◽  
Oxide Films ◽  
Ion Source ◽  
Cold Cathode ◽  
Metal Oxide Films ◽  
Oxygen Ion ◽  
Microscopy Investigation ◽  
Electron Microscopy Investigation ◽  
Cold Cathode Ion Source

AbstractThe paper presents the results of AES, SIMS, RBS and electron microscopy investigation of compound metal oxide films. The films were deposited by sputtering compound targets with oxygen ion beam, extracted from hollow cold cathode ion source.

Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source

1982 ◽  
Vol 21 (Part 2, No. 1) ◽  
pp. L4-L6 ◽  
Author(s):  
Seitaro Matsuo ◽  
Yoshio Adachi
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Ecr Ion Source ◽  
Ion Beam Etching ◽  
Broad Beam ◽  
Reactive Ion Beam Etching

A Compact Nuclear Microprobe With a Liquid Metal Ion Source and a Toroidal Analyzer

1992 ◽  
Vol 295 ◽  
Author(s):  
Mikio Takai ◽  
Ryou Mimura ◽  
Hiroshi Sawaragi ◽  
Ryuso Aihara
Keyword(s):  
Liquid Metal ◽  
Metal Ion ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
High Vacuum ◽  
Spot Size ◽  
Ion Source ◽  
Ultra High Vacuum ◽  
Atomic Resolution ◽  
Nuclear Microprobe

AbstractA nondestructive three-dimensional RBS/channeling analysis system with an atomic resolution has been designed and is being constructed in Osaka University for analysis of nanostructured surfaces and interfaces. An ultra high-vacuum sample-chamber with a threeaxis goniometer and a toroidal electrostatic analyzer for medium energy ion scattering (MEIS) was combined with a short acceleration column for a focused ion beam. A liquid metal ion source (LMIS) for light metal ions such as Li+ or Be+ was mounted on the short column.A minimum beam spot-size of about 10 nm with a current of 10 pA is estimated by optical property calculation for 200 keV Li+ LMIS. An energy resolution of 4 × 10-3 (AE/E) for the toroidal analyzer gives rise to atomic resolution in RBS spectra for Si and GaAs. This system seems feasible for atomic level analysis of localized crystalline/disorder structures and surfaces.

A Quick Change Axial Cold Cathode Ion Source

1977 ◽  
Vol 24 (3) ◽  
pp. 1593-1593
Author(s):  
M. L. Mallory ◽  
P. S. Miller ◽  
W. S. Chien
Keyword(s):  
Ion Source ◽  
Cold Cathode ◽  
Cold Cathode Ion Source

Improvement of extracted ion beam from cold cathode Penning ion source

2018 ◽  
Vol 144 ◽  
pp. 351-355 ◽  
Author(s):  
Samah I. Radwan ◽  
H. El-Khabeary ◽  
A.G. Helal
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Cold Cathode
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