Studies of Ion-Assisted Growth and Properties of PbTe Epilayers Deposited by Rf Magnetron Sputtering

1989 ◽  
Vol 157 ◽  
Author(s):  
J.G. Cook ◽  
G. Mukherjee ◽  
S.R. Das
Keyword(s):  
Magnetron Sputtering ◽  
Langmuir Probe ◽  
Growth Habit ◽  
Rf Magnetron Sputtering ◽  
Substrate Bias ◽  
Deposition Rates ◽  
Substrate Bias Voltage ◽  
Hall Effect Measurements ◽  
Substrate Temperatures ◽  
Negative Substrate Bias

ABSTRACT(111) PbTe // (111) BaF2 epilayers have been prepared by rf magnetron sputtering. A small negative substrate bias voltage (-10 V) enhances the (111) growth habit at reduced substrate temperatures (180 °C) and increased deposition rates (2.5 μ/h–1). Langmuir probe diagnostics is used to determine the energy and flux density of Ar ions incident on the growing film. Hall effect measurements are made to determine the carrier type and mobility as a function of the growth temperature.

Structure and Property of CrAlN Coatings Prepared by Bipolar Pulsed Dual Magnetron Sputtering (BPDMS) under Different Pulse Bias Voltage

2011 ◽  
Vol 189-193 ◽  
pp. 668-671
Author(s):  
Ming Sheng Li ◽  
Yong Zhong Fan ◽  
Shu Juan Zhang ◽  
Chang Jie Feng
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
High Hardness ◽  
Substrate Bias ◽  
Dense Structure ◽  
Substrate Bias Voltage ◽  
Structure And Property ◽  
Excellent Adhesion ◽  
Mechanical Performances ◽  
Negative Substrate Bias

Recently, Cr-Al-N coatings have received more and more attention of researchers owing to its standing-out mechanical performances and superior chemical stability. In this present work, CrAlN ternary coatings were deposited by a bipolar pulsed dual magnetron sputtering (BPDMS) method and the effects of substrate negative bias on deposition rate, structure, hardness and adhesion of the coatings were investigated. The application of appropriate negative substrate bias voltage leads to dense structure, high hardness and excellent adhesion for CrAlN coatings.

Improvement of Zr film purity by using a purified sputtering target and negative substrate bias voltage

2006 ◽  
Vol 201 (3-4) ◽  
pp. 1899-1901 ◽  
Author(s):  
J.-W. Lim ◽  
J.W. Bae ◽  
Y.F. Zhu ◽  
S. Lee ◽  
K. Mimura ◽  
...  
Keyword(s):  
Bias Voltage ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Negative Substrate Bias

Spectroscopic Studies of Magnetron Sputtering Plasma Discharge in Cu/O2/Ar Mixture for Copper Oxide Thin Film Fabrication

2015 ◽  
Vol 73 (1) ◽  
Author(s):  
Jia Wei Low ◽  
Nafarizal Nayan ◽  
Mohd Zainizan Sahdan ◽  
Mohd Khairul Ahmad ◽  
Ali Yeon Md Shakaff ◽  
...  
Keyword(s):  
Thin Film ◽  
Copper Oxide ◽  
Flow Rate ◽  
Langmuir Probe ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Oxide Thin Film ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Copper Oxide Thin Film

Magnetron sputtering plasma for the deposition of copper oxide thin film has been investigated using optical emission spectroscopy and Langmuir probe. The intensity of the light emission from atoms and radicals in the plasma were measured using optical emission spectroscopy (OES). Then, Langmuir probe was employed to estimate the plasma density, electron temperature and ion flux. In present studies, reactive copper sputtering plasmas were produced at different oxygen flow rate of 0, 4, 8 and 16 sccm. The size of copper target was 3 inches. The dissipation rf power, Ar flow rate and working pressure were fixed at 400 W, 50 sccm and 22.5 mTorr, respectively. Since the substrate bias plays an important role to the thin film formation, the substrate bias voltages of 0, -40, -60 and -100 V were studied. Based on OES results, oxygen emission increased drastically when the oxygen flow rate above 8 sccm. On the other hand, copper and argon emission decreased gradually. In addition, Langmuir probe results showed a different ion flux when substrate bias voltage was applied. Based on these plasma diagnostic results, it has been concluded that the optimized parameter to produce copper oxide thin film are between -40 to -60 V of substrate bias voltage and between 8 to 12 sccm of oxygen flow rate.

Characterization of Bias Sputtered Aluminum Film

1986 ◽  
Vol 76 ◽  
Author(s):  
Y. Homma ◽  
K. Hinode ◽  
T. Terada
Keyword(s):  
Heat Treatment ◽  
Bias Voltage ◽  
Void Growth ◽  
Aluminum Film ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Film Characteristics ◽  
Negative Substrate Bias

ABSTRACTThe characteristics of RF bias-sputtered Al films are clarified. A negative substrate bias voltage, VDC, produced by RF biasing, strongly influences not only the planarization effect but also film characteristics such as hillock and void growth, and Ar content.Films deposited at VDc lower than -150 V. are significantly degraded due to the formation of two kinds of voids grown during annealing. One type is a blister-like voids, while the others are large and irregular. These are produced when Ar is released from the films during heat treatment. as evidenced by the fact that the amount of Ar released from the films rapidly increases when VDC is lower than -150 V.Although biasing strongly effects Al films resulting in the formation of an almost complete (111) texture. the effect degrades as VDC exceeds -200 V. Thus, Al bias sputtering requires a high resputtering rate and a VDC higher than -150 V to achieve appropriate planarization with suitable film characteristics.

scholarly journals Processing and Study of Optical and Electrical Properties of (Mg, Al) Co-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering for Photovoltaic Application

Materials ◽  
2020 ◽  
Vol 13 (9) ◽  
pp. 2146 ◽  
Author(s):  
Chayma Abed ◽  
Susana Fernández ◽  
Selma Aouida ◽  
Habib Elhouichet ◽  
Fernando Priego ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Band Gap ◽  
Rf Magnetron Sputtering ◽  
Band Gap Energy ◽  
Thin Layers ◽  
Working Pressure ◽  
Hall Effect Measurements ◽  
Diffraction Patterns

In this study, high transparent thin films were prepared by radio frequency (RF) magnetron sputtering from a conventional solid state target based on ZnO:MgO:Al2O3 (10:2 wt %) material. The films were deposited on glass and silicon substrates at the different working pressures of 0.21, 0.61, 0.83 and 1 Pa, 300 °C and 250 W of power. X-ray diffraction patterns (XRD), atomic force microscopy (AFM), UV-vis absorption and Hall effect measurements were used to evaluate the structural, optical, morphological and electrical properties of thin films as a function of the working pressure. The optical properties of the films, such as the refractive index, the extinction coefficient and the band gap energy were systematically studied. The optical band gap of thin films was estimated from the calculated absorption coefficient. That parameter, ranged from 3.921 to 3.655 eV, was hardly influenced by the working pressure. On the other hand, the lowest resistivity of 8.8 × 10−2 Ω cm−1 was achieved by the sample deposited at the lowest working pressure of 0.21 Pa. This film exhibited the best optoelectronic properties. All these data revealed that the prepared thin layers would offer a good capability to be used in photovoltaic applications.

scholarly journals Tribological properties of boron carbonitride coatings sliding against different wood (acerbic, beech, and lauan) balls

2019 ◽  
Vol 28 ◽  
pp. 096369351987573 ◽  
Author(s):  
Zhiwei Wu ◽  
Sihao Li ◽  
Zhaojun Xu ◽  
Qianzhi Wang ◽  
Fei Zhou
Keyword(s):  
Bias Voltage ◽  
Tribological Properties ◽  
Photoelectron Spectroscopy ◽  
Rf Magnetron Sputtering ◽  
Substrate Bias ◽  
Boron Carbonitride ◽  
Friction Behavior ◽  
Substrate Bias Voltage ◽  
Mechanical And Tribological Properties ◽  
C And N

Boron carbonitride (BCN) coatings were prepared using radio frequency (RF) magnetron sputtering via adjusting substrate bias voltage from −50 V to −200 V. The mechanical and tribological properties of the coatings were investigated. The coexistence of B–N, B–C, and N–C bonds was detected in coatings according to X-ray photoelectron spectroscopy analysis, indicating the formation of ternary BCN hybridization. The hardness of BCN coatings increased from 14.4 GPa to 24.3 GPa with an increase of substrate bias voltage, while their adhesion strength on substrate decreased. The friction behavior of BCN coatings sliding against different wood (acerbic, beech, and lauan) balls was examined using a ball-on-disk tribometer. The average friction coefficient fluctuated in a range of 0.74–1.02. The wear track of BCN coating sliding against hardwood (acerbic) presented obvious scratches, which were not noted as sliding against other softwood balls in comparison.

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