Crystalline Polyimide Thin Film Deposition by Ionized Cluster Bean

1989 ◽  
Vol 157 ◽  
Author(s):  
S.J. Cho ◽  
H.S. Choe ◽  
H.G. Jang ◽  
S.S. Iim ◽  
C.N. Whang
Keyword(s):  
Crystal Orientation ◽  
Thin Film Deposition ◽  
Polyimide Film ◽  
Film Deposition ◽  
Ion Acceleration ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Acceleration Voltage ◽  
Preferential Crystal Orientation ◽  
Beam Deposition

ABSTRACTPolyimide thin films are deposited by the ionized cluster beam deposition( ICBD ) technique. Polymerization and crystallization of polyimide were investigated using TEN, IR, and the electronic structure of the polyimide film was investigated using XPS. Films deposited at optimum ion acceleration voltage showed strong preferential crystal orientation. Crystalline polyimide film was obtained at ion acceleration voltage of 700 V.

Aluminum Atom Surface Mobility on SiO2 During Ionized Cluster Beam Deposition

1988 ◽  
Vol 128 ◽  
Author(s):  
Leonard L. Levenson ◽  
Amy B. Swartzlander ◽  
Hiroaki Usui ◽  
Isao Yamada ◽  
Toshinori Takagi
Keyword(s):  
Aluminum Atom ◽  
Chamber Pressure ◽  
Cluster Beam ◽  
Diffusion Distance ◽  
Surface Mobility ◽  
Scanning Auger Microprobe ◽  
Cluster Beam Deposition ◽  
Acceleration Voltage ◽  
Mask Edge ◽  
Beam Deposition

ABSTRACTAn ionized cluster beam (ICB) source was used to deposit Al onto SiO2 substrates. A 60 gtm diameter wire held at the substrate served as a mask. After Al deposition, the wire was removed and the masked area was examined by scanning electron microscopy (SEM) and by scanning Auger microprobe (SAM). The ICB source was operated at 0, 3, and 6 kV acceleration voltages. The substrate was held at 80°, 200°, and 400°C during Al depositions. The Al deposition rate averaged 240 A per min. The chamber pressure during deposition was 2×10-6 Torr. The diffusion distance of Al under the mask edge was determined from the SEM micrographs and SAM line scans. The maximum diffusion distance for all acceleration voltages occured at a substate temperature of 200°C. The maximum diffusion distance at 200°C was 29 μm at 6 kV acceleration voltage. The minimum diffusion distance was 12 μm at 400°C for an acceleration voltage of 6 kV.

Stabilization of Metastable Zinc-Blende Phase MnTe by Ionized Cluster Beam Deposition

1992 ◽  
Vol 279 ◽  
Author(s):  
K. Ando ◽  
K. Takahashi ◽  
Y. Takeuchi
Keyword(s):  
Ion Beam ◽  
High Energy ◽  
Cluster Beam ◽  
Bulk Crystals ◽  
Film Properties ◽  
Zinc Blende ◽  
Cluster Ion ◽  
Cluster Beam Deposition ◽  
Acceleration Voltage ◽  
Beam Deposition

ABSTRACTThe ionized cluster beam (ICB) deposition was use to stabilize the metastable zinc-blende (ZB) MnTe films directly on GaAs (100) substrates at 300 °C with MnTe cluster ion beam. Influences of the ionization and the acceleration voltage on film properties were investigated by the reflection high-energy electron diffraction (RHEED), optical reflection, Raman scattering, and photoluminescence. The ZB-MnTe was stabilized by 3kV acceleration of the MnTe cluster beam. These results showed that the ICB deposition is useful to get compounds having crystalline phase different from the structures observed io equilibrium-grown bulk crystals.

Synthesis of crystalline polyimide film by ionized cluster-beam deposition

1993 ◽  
Vol 28 (6) ◽  
pp. 1537-1541 ◽  
Author(s):  
K. W. Kim ◽  
S. C. Choi ◽  
S. S. Kim ◽  
S. J. Cho ◽  
C. N. Whang ◽  
...  
Keyword(s):  
Polyimide Film ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Mass selection of neutral clusters in Low‐Energy Cluster Beam Deposition experiments: Is it realistic?

1994 ◽  
Vol 64 (10) ◽  
pp. 1212-1214 ◽  
Author(s):  
J. F. Roux ◽  
B. Cabaud ◽  
G. Fuchs ◽  
D. Guillot ◽  
A. Hoareau ◽  
...  
Keyword(s):  
Low Energy ◽  
Mass Selection ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Energy Cluster ◽  
Selection Of ◽  
Beam Deposition

scholarly journals Flexible and biocompatible microelectrode arrays fabricated by supersonic cluster beam deposition on SU-8

2011 ◽  
Vol 21 (4) ◽  
pp. 045013 ◽  
Author(s):  
Mattia Marelli ◽  
Giorgio Divitini ◽  
Cristian Collini ◽  
Luca Ravagnan ◽  
Gabriele Corbelli ◽  
...  
Keyword(s):  
Microelectrode Arrays ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Ionized-Cluster Beam Deposition

1975 ◽  
pp. 341-346 ◽  
Author(s):  
T. Takagi ◽  
I. Yamada ◽  
K. Yanagawa
Keyword(s):  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Gas Sensor Arrays by Supersonic Cluster Beam Deposition

2019 ◽  
pp. 282-284
Author(s):  
E. Barborini ◽  
M. Leccardi ◽  
G. Bertolini ◽  
O. Rorato ◽  
M. Franchi ◽  
...  
Keyword(s):  
Gas Sensor ◽  
Sensor Arrays ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition ◽  
Gas Sensor Arrays
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