X-Ray Scattering Studies of Thin Films and Multilayers

1989 ◽  
Vol 151 ◽  
Author(s):  
G. S. Cargill
Keyword(s):  
Thin Films ◽  
Energy Spectrum ◽  
Synchrotron Radiation ◽  
Ultrathin Films ◽  
Amorphous Materials ◽  
Atomic Scale ◽  
X Ray ◽  
X Ray Scattering ◽  
Broad Energy ◽  
Ray Scattering

ABSTRACTX-ray scattering experiments provide important information about the atomic scale structure and the microstructure of thin films and multilayers. The high intensity, brightness, and broad energy spectrum of synchrotron radiation greatly extend capabilities of scattering experiments, particularly for scattering from ultrathin films and for anomalous dispersion scattering from alloys. Examples of scattering studies of both crystalline and amorphous materials are given in this overview.

scholarly journals Precise and nondestructive characterization of a ‘buried’ nanostructure in a polymer thin film using synchrotron radiation ultra-small angle X-ray scattering

2012 ◽  
Vol 45 (3) ◽  
pp. 307-312 ◽  
Author(s):  
Takamichi Shinohara ◽  
Tomoko Shirahase ◽  
Daiki Murakami ◽  
Taiki Hoshino ◽  
Moriya Kikuchi ◽  
...  
Keyword(s):  
Thin Film ◽  
Synchrotron Radiation ◽  
Small Angle ◽  
Polymer Thin Film ◽  
X Ray ◽  
X Ray Scattering ◽  
Nondestructive Characterization ◽  
Ray Scattering

Structural characterization of laser ablated epitaxial (Ba0.5Sr0.5)TiO3 thin films on MgO(001) by synchrotron x-ray scattering

1999 ◽  
Vol 14 (7) ◽  
pp. 2905-2911 ◽  
Author(s):  
Sangsub Kim ◽  
Tae Soo Kang ◽  
Jung Ho Je
Keyword(s):  
Thin Films ◽  
Early Stage ◽  
Lattice Parameter ◽  
Normal Direction ◽  
X Ray ◽  
X Ray Scattering ◽  
Surface Normal ◽  
Out Of Plane ◽  
Axis Parallel ◽  
Ray Scattering

Epitaxial (Ba0.5Sr0.5) TiO3 thin films of two different thickness (∼25 and ∼134 nm) on MgO(001) prepared by a pulsed laser deposition method were studied by synchrotron x-ray scattering measurements. The film grew initially with a cube-on-cube relationship, maintaining it during further growth. As the film grew, the surface of the film became significantly rougher, but the interface between the film and the substrate did not. In the early stage of growth, the film was highly strained in a tetragonal structure (c/a = 1.04) with the longer axis parallel to the surface normal direction. As the growth proceeded further, it relaxed to a cubic structure with the lattice parameter near the bulk value, and the mosaic distribution improved significantly in both in- and out-of-plane directions. The thinner film (∼25 nm) showed only one domain limited mainly by the film thickness, but the thicker film (∼134 nm) exhibited three domains along the surface normal direction.

A New X-Ray Scattering Method for Determining Pore-Size Distribution in Low-k Thin Films

2001 ◽  
Vol 714 ◽  
Author(s):  
Kazuhiko Omote ◽  
Shigeru Kawamura
Keyword(s):  
Thin Films ◽  
Pore Size Distribution ◽  
Pore Size ◽  
Gas Adsorption ◽  
Size Distributions ◽  
X Ray ◽  
X Ray Scattering ◽  
Pore Size Distributions ◽  
Scattering Technique ◽  
Ray Scattering

ABSTRACTWe have successively developed a new x-ray scattering technique for a non-destructive determination of pore-size distributions in porous low-κ thin films formed on thick substrates. The pore size distribution in a film is derived from x-ray diffuse scattering data, which are measured using offset θ/2θ scans to avoid strong specular reflections from the film surface and its substrate. Γ-distribution mode for the pores in the film is used in the calculation. The average diameter and the dispersion parameter of the Γ-distribution function are varied and refined by computer so that the calculated scattering pattern best matches to the experimental pattern. The technique has been used to analyze porous methyl silsesquioxane (MSQ) films. The pore size distributions determined by the x-ray scattering technique agree with that of the commonly used gas adsorption technique. The x-ray technique has been also used successfully determine small pores less than one nanometer in diameter, which is well below the lowest limit of the gas adsorption technique.

Small-Angle X-Ray Scattering from Amorphous Materials

1948 ◽  
Vol 74 (9) ◽  
pp. 1076-1083 ◽  
Author(s):  
George H. Vineyard
Keyword(s):  
Small Angle ◽  
Amorphous Materials ◽  
X Ray ◽  
X Ray Scattering ◽  
Ray Scattering
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