Rapid Thermal Annealing of GaAs/AlGaAs Coupled Double Quantum Wells

1988 ◽  
Vol 144 ◽  
Author(s):  
Emil S. Koteles ◽  
B. Elman ◽  
C. A. Armiento ◽  
P. Melman ◽  
J. Y. Chi ◽  
...  

ABSTRACTThe effect of rapid thermal annealing (RTA) on the shapes of silicon dioxide capped symmetric coupled double GaAs/AlGaAs quantum wells (CDQW) has been investigated. In contrast to previous results on single quantum wells in which increases in exciton energies were observed after RTA, large decreases in exciton energies were seen in CDQWs. Furthermore, there was clear evidence, in the excitation spectrum and in increases in the lowest energy exciton lifetime, of asymmetry present in the heterostructure after RTA.

1989 ◽  
Vol 147 ◽  
Author(s):  
S. E. Beck ◽  
R. J. Jaccodine ◽  
C. Clark

AbstractRapid thermal annealed tail regions of shallow junction arsenic implants into silicon have been investigated. Tail profiles have been roduced by an anodic oxidation and stripping technique after implantation to fluences of 1014 to 1016 cm−2 and by implanting through a layer of silicon dioxide. Electrical activation and diffusion have been achieved by rapid thermal annealing in the temperature range of 800 to 1100 °C. Electrically active defects remain after annealing. Spreading resistance and deep level transient spectroscopy results are presented. The diffusion of the arsenic tail is discussed and compared with currently accepted models.


1994 ◽  
Vol 64 (6) ◽  
pp. 766-768 ◽  
Author(s):  
D. Tönnies ◽  
G. Bacher ◽  
A. Forchel ◽  
A. Waag ◽  
G. Landwehr

1998 ◽  
Vol 47 (6) ◽  
pp. 945
Author(s):  
XU ZUN-TU ◽  
XU JUN-YING ◽  
YANG GUO-WEN ◽  
ZHANG JING-MING ◽  
YIN TAO ◽  
...  

2020 ◽  
Vol 127 (12) ◽  
pp. 125704 ◽  
Author(s):  
Haifa Alghamdi ◽  
Vanessa Orsi Gordo ◽  
Martin Schmidbauer ◽  
Jorlandio F. Felix ◽  
Sultan Alhassan ◽  
...  

2006 ◽  
Vol 23 (9) ◽  
pp. 2579-2582
Author(s):  
Zhao Huan ◽  
Xu Ying-Qiang ◽  
Ni Hai-Qiao ◽  
Han Qin ◽  
Wu Rong-Han ◽  
...  

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