Gas Plasma Treatment of Sputtered Carbon Thin Film and Enhancement of its Properties

1988 ◽  
Vol 140 ◽  
Author(s):  
J.P. Sharma ◽  
P.B. Narayan ◽  
A.S. Brar
Keyword(s):  
Plasma Treatment ◽  
Plasma Etching ◽  
Carbon Layer ◽  
Magnetic Media ◽  
Ion Diffusion ◽  
Lubricating Film ◽  
Gas Plasma ◽  
Lubricating Layer ◽  
The Media ◽  
Frictional Instability

AbstractIn magnetic recording, the metallic magnetic media are protected from corrosion and wear by a thin sputtered carbon layer. The latter also acts as a self-lubricating film during the interaction of the media with the ceramic read \write head pad material. Since the surface energy of carbon is high, it tends to absorb and chemisorb environmental constituents such as oxygen, nitrogen, water vapor and hydrocarbons. These could then react with the head\media interface and form heterogeneous layers of “frictional polymers”. These changes in carbon lead to frictional instability and friction build-up. Low temperature gas plasma treatment of sputtered carbon layer was found to improve the surface properties and the frictional instability problems. Use of a mixture of argon and carbon tetrafluoride gases led to the formation of a very thin self-lubricating layer, probably a fluorocarbon. The surface also becomes smooth. This is because of thecombined reaction of chemical reaction, ion-diffusion, ion-penetration and plasma etching. This reaction product was found to be prominently present at the grain boundaries and other morphological inhomogeneities, thereby strengthening the weak areas and improving the tribo-performance of the media.

Using the scanning electron microscope for failure analysis of high density magnetic media

1987 ◽  
Vol 45 ◽  
pp. 392-393
Author(s):  
Evelyn R. Ackerman ◽  
Gary D. Burnett
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Failure Analysis ◽  
High Density ◽  
Magnetic Media ◽  
Specific Data ◽  
Retrieval Systems ◽  
Operating Environments ◽  
The Media ◽  
Scanning Electron

Advancements in state of the art high density Head/Disk retrieval systems has increased the demand for sophisticated failure analysis methods. From 1968 to 1974 the emphasis was on the number of tracks per inch. (TPI) ranging from 100 to 400 as summarized in Table 1. This emphasis shifted with the increase in densities to include the number of bits per inch (BPI). A bit is formed by magnetizing the Fe203 particles of the media in one direction and allowing magnetic heads to recognize specific data patterns. From 1977 to 1986 the tracks per inch increased from 470 to 1400 corresponding to an increase from 6300 to 10,800 bits per inch respectively. Due to the reduction in the bit and track sizes, build and operating environments of systems have become critical factors in media reliability.Using the Ferrofluid pattern developing technique, the scanning electron microscope can be a valuable diagnostic tool in the examination of failure sites on disks.

Tumor cell metabolism correlates with resistance to gas plasma treatment: The evaluation of three dogmas

2021 ◽  
Vol 167 ◽  
pp. 12-28
Author(s):  
Sander Bekeschus ◽  
Grit Liebelt ◽  
Jonas Menz ◽  
Julia Berner ◽  
Sanjeev Kumar Sagwal ◽  
...  
Keyword(s):  
Tumor Cell ◽  
Plasma Treatment ◽  
Cell Metabolism ◽  
Gas Plasma ◽  
Tumor Cell Metabolism

The Role of a Photoresist Film on Reverse Gas Plasma Etching of Chromium Films

1980 ◽  
Vol 19 (7) ◽  
pp. 1371-1376 ◽  
Author(s):  
Teruhiko Yamazaki ◽  
Yoshiki Suzuki ◽  
Jun Uno ◽  
Hidefumi Nakata
Keyword(s):  
Plasma Etching ◽  
Gas Plasma ◽  
Photoresist Film ◽  
Chromium Films

Effects of gas plasma treatment on zirconia-veneering ceramics bonding

2014 ◽  
Vol 30 ◽  
pp. e32
Author(s):  
Y.C. Liu ◽  
C.S. Hwang ◽  
S.F. Chuang
Keyword(s):  
Plasma Treatment ◽  
Gas Plasma

scholarly journals Medical Gas Plasma Treatment in Head and Neck Cancer—Challenges and Opportunities

2020 ◽  
Vol 10 (6) ◽  
pp. 1944
Author(s):  
Julia Berner ◽  
Christian Seebauer ◽  
Sanjeev Kumar Sagwal ◽  
Lars Boeckmann ◽  
Steffen Emmert ◽  
...  
Keyword(s):  
Head And Neck Cancer ◽  
Plasma Treatment ◽  
Head And Neck ◽  
Neck Cancer ◽  
Treatment Modalities ◽  
Surgical Approaches ◽  
Novel Treatment ◽  
Gas Plasma ◽  
Medical Gas ◽  
Physical Plasma

Despite progress in oncotherapy, cancer is still among the deadliest diseases in the Western world, emphasizing the demand for novel treatment avenues. Cold physical plasma has shown antitumor activity in experimental models of, e.g., glioblastoma, colorectal cancer, breast carcinoma, osteosarcoma, bladder cancer, and melanoma in vitro and in vivo. In addition, clinical case reports have demonstrated that physical plasma reduces the microbial contamination of severely infected tumor wounds and ulcerations, as is often seen with head and neck cancer patients. These antimicrobial and antitumor killing properties make physical plasma a promising tool for the treatment of head and neck cancer. Moreover, this type of cancer is easily accessible from the outside, facilitating the possibility of several rounds of topical gas plasma treatment of the same patient. Gas plasma treatment of head and neck cancer induces diverse effects via the deposition of a plethora of reactive oxygen and nitrogen species that mediate redox-biochemical processes, and ultimately, selective cancer cell death. The main advantage of medical gas plasma treatment in oncology is the lack of adverse events and significant side effects compared to other treatment modalities, such as surgical approaches, chemotherapeutics, and radiotherapy, making plasma treatment an attractive strategy for the adjuvant and palliative treatment of head and neck cancer. This review outlines the state of the art and progress in investigating physical plasma as a novel treatment modality in the therapy of head and neck squamous cell carcinoma.

scholarly journals CoPt/TiN films nanopatterned by RF plasma etching towards dot-patterned magnetic media

2018 ◽  
Vol 435 ◽  
pp. 31-38 ◽  
Author(s):  
János Szívós ◽  
Szilárd Pothorszky ◽  
Jan Soltys ◽  
Miklós Serényi ◽  
Hongyu An ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Rf Plasma ◽  
Magnetic Media ◽  
Tin Films

An All Dry Mask Making Process by Reverse Gas Plasma Etching

1982 ◽  
Vol 21 (Part 1, No. 10) ◽  
pp. 1518-1519
Author(s):  
Teruhiko Yamazaki ◽  
Kazuhiro Tanaka ◽  
Hidefumi Nakata
Keyword(s):  
Plasma Etching ◽  
Mask Making ◽  
Gas Plasma

Corrosion Phenomena on the Grain Boundary of AlCu FIlms After Plasma Etching

1997 ◽  
Vol 473 ◽  
Author(s):  
C. L. Kim ◽  
K. H. Kwon ◽  
S. J. Yu ◽  
H. J. Kim ◽  
E. G. Chang
Keyword(s):  
Grain Boundary ◽  
Plasma Etching ◽  
Photoelectron Spectroscopy ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
X Ray ◽  
Gas Plasma ◽  
Point Analysis ◽  
Selective Corrosion ◽  
Scanning Electron

ABSTRACTThe effect of grain boundary on the corrosion of Al(Cu 1%) etched using SiCl4/Cl2/He/CHF3 gas plasma has been evaluated with XPS (X-ray photoelectron spectroscopy), SEM (scanning electron microscopy) and AES (Auger electron spectroscopy). It was found with SEM that the surface of Al(Cu 1 %) mainly corroded at the grain boundary. Using AES point analysis, the cause of selective corrosion at the grain boundary of Al(Cu 1 %) has been investigated. The results of AES indicated that the contents of F and Cl have made a difference at the analyzed positions. This seems to result from the imperfect crystalline structure of Al(Cu 1%) grain boundary. It was also confirmed that F has passivated the Cl at the grain boundary. The SEM and XPS results implied that Cl incorporated in the grain boundary of polycrystalline Al(Cu 1%) film accelerated the corrosion and could not be easily removed by the subsequent SF6 plasma treatment.

Frequency Effect on Material Selectivity in Gas Plasma Etching in Planar Type Reactor

1981 ◽  
Vol 20 (3) ◽  
pp. 681-682 ◽  
Author(s):  
Hiroyasu Toyoda ◽  
Mineto Tobinaga ◽  
Hiroyoshi Komiya
Keyword(s):  
Plasma Etching ◽  
Frequency Effect ◽  
Type Reactor ◽  
Gas Plasma
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