Correlation of Oxygen and Recombination Centers on a Microscale in Asgrown Czochralski Silicon Crystals

1982 ◽  
Vol 14 ◽  
Author(s):  
K. Nauka ◽  
H. C. Gatos ◽  
J. Lagowski
Keyword(s):  
Oxygen Concentration ◽  
Carrier Lifetime ◽  
Growth Direction ◽  
Interstitial Oxygen ◽  
Czochralski Silicon ◽  
Laser Absorption ◽  
Silicon Crystals ◽  
Recombination Centers ◽  
Oxygen Precipitates ◽  
Absorption Technique

ABSTRACTQuantitative microprofiles of the interstitial oxygen concentration and of the excess carrier lifetime, with a spacial resolution of about 20 μm, were obtained in as-grown dislocationfree CZ-Si crystals employing a double laser absorption technique. It was found that maxima (minima) in oxygen concentration along the crystal growth direction coincide with minima (maxima) of the lifetime. It was further found that the relation between changes in oxygen concentration and in lifetime varies in the radial direction indicating that “as-grown” oxygen precipitates are involved in lifetime limiting processes.

Oxygen Precipitation in Conventional and Nitrogen Co-Doped Heavily Arsenic-Doped Czochralski Silicon Crystals: Oswald Ripening

2009 ◽  
Vol 156-158 ◽  
pp. 275-278
Author(s):  
Xiang Yang Ma ◽  
Yan Feng ◽  
Yu Heng Zeng ◽  
De Ren Yang
Keyword(s):  
High Temperature ◽  
Low Temperature ◽  
Czochralski Silicon ◽  
Silicon Crystals ◽  
Oxygen Precipitation ◽  
High Temperature Anneal ◽  
Oxygen Precipitates ◽  
Co Doped ◽  
Oswald Ripening

Oxygen precipitation (OP) behaviors in conventional and nitrogen co-doped heavily arsenic-doped Czocharalski silicon crystals subjected to low-high two-step anneals of 650 oC/8 h + 1000 oC/4-256 h have been comparatively investigated. Due to the nitrogen enhanced nucleation of OP during the low temperature anneal, much higher density of oxygen precipitates generated in the nitrogen co-doped specimens. With the extension of high temperature anneal, Oswald ripening of OP in the nitrogen co-doped specimens preceded that in the conventional ones. Moreover, due to the Oswald ripening effect, the oxygen precipitates in the conventional specimens became larger with a wider range of sizes. While, the sizes of oxygen precipitates in the nitrogen co-doped specimens distributed in a much narrower range with respect to the conventional ones.

Oxygen‐induced recombination centers in as‐grown Czochralski silicon crystals

1983 ◽  
Vol 43 (3) ◽  
pp. 241-243 ◽  
Author(s):  
K. Nauka ◽  
H. C. Gatos ◽  
J. Lagowski
Keyword(s):  
Czochralski Silicon ◽  
Silicon Crystals ◽  
Recombination Centers

scholarly journals Superdiffusion of Carbon by Vacancies Irradiated with Soft X-Rays in CZ Silicon / Superdifūzija Ar Vakancēm Iestarota Ar Mīkstajiem Rentgenstariem CZ Silīcijā

2015 ◽  
Vol 52 (5) ◽  
pp. 68-75
Author(s):  
A. J. Janavičius ◽  
A. Mekys ◽  
R. Purlys ◽  
Ž. Norgėla ◽  
S. Daugėla ◽  
...  
Keyword(s):  
Room Temperature ◽  
Diffusion Theory ◽  
Fast Diffusion ◽  
Interstitial Oxygen ◽  
X Rays ◽  
X Ray ◽  
Czochralski Silicon ◽  
Silicon Crystals ◽  
Thickness Layer ◽  
Oxygen Complexes

Abstract The soft X-ray photons absorbed in the inner K, L, M shells of Si atoms produce photoelectrons and Auger electrons, thus generating vacancies, interstitials and metastable oxygen complexes. The samples of Czochralski silicon crystals covered with 0.1 μm thickness layer of carbon have been irradiated by X-rays using different voltages of Cu anode of the Russian diffractometer DRON-3M. The influence of X-rays on the formation of point defects and vacancy complexes, and their dynamics in Cz-Si crystals have been studied by infrared absorption. We have measured and calculated dynamics of concentration of carbon and interstitial oxygen using FTIR spectroscopy at room temperature after irradiation by soft X-rays. Using transmittance measurements and nonlinear diffusion theory we have calculated densities increasing for substitutional carbon and interstitial oxygen by reactions and very fast diffusion. The superdiffusion coefficients of carbon in silicon at room temperature generated by X-rays are about hundred thousand times greater than diffusion coefficients obtained for thermodiffusion.

Crystallographic Analysis Of Flow Pattern Defects In Dislocated Czochralski Silicon Crystals

1996 ◽  
Vol 442 ◽  
Author(s):  
Y. Ikematsu ◽  
T. Iwasaki ◽  
H. Harada ◽  
K. Tanaka ◽  
M. Fujinami ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Crystallographic Analysis ◽  
Crystal Defects ◽  
Dislocation Loops ◽  
Etch Pits ◽  
Czochralski Silicon ◽  
Silicon Crystals ◽  
Transmission Electron ◽  
Type Dislocation ◽  
Oxygen Precipitates

AbstractIn dislocated Cz-Si crystals, rows of flow patterns (FP) and Secco etch pits (SEP) (2–3 mm in length, along <110> direction) can be revealed by Secco etch without agitation. In this study, the crystal defects forming FP-SEP rows in dislocated Cz-Si crystals are investigated by transmission electron microscopy. Microdefects, 0.1 μm in size, are observed in a row along a FP-SEP row, <110> direction. These defects were identified as oxygen precipitates with or without dislocation loops (interstitial-type), and voids with oxidized interiors. We conclude that FP originate from interstitial-type dislocation loops, and SEP are due to oxygen precipitates or voids.

Structure of Thermally-Induced Microdefects in Czochralski Silicon

1983 ◽  
Vol 31 ◽  
Author(s):  
F. A. Ponce ◽  
S. Hahn
Keyword(s):  
Quasi Equilibrium ◽  
Interstitial Oxygen ◽  
Thermally Induced ◽  
Czochralski Silicon ◽  
Oxygen Precipitation ◽  
Transmission Electron ◽  
Long Time ◽  
History Of ◽  
Silicon Materials ◽  
Oxygen Precipitates

ABSTRACTThe process of oxygen precipitation in Czochralski silicon materials has been studied using high resolution transmission electron microscopy. The resulting structure depends strongly on the thermal history of the material. The initial stages of precipitation involve the formation of clusters exhibiting strain fields which are coherent and isotropic at intermediate temperatures (∼7000°C). Incoherent defects are formed when the interstitial oxygen precipitates into substitutional sites in the silicon lattice. For long-time anneals, the quasi-equilibrium defect structure ranges from needle-like coesite (450–600°C), silica platelets (600–1000°C) to polyhedral silica precipitates (900–1200°C).

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