Surface Reaction Mechanisms in the Metallisation and Etching of Semiconductor Materials.

1988 ◽  
Vol 131 ◽  
Author(s):  
A Wee ◽  
A J Murrell ◽  
C L French ◽  
R J Price ◽  
R B Jackman ◽  
...  
Keyword(s):  
Reaction Mechanisms ◽  
Surface Reaction ◽  
Ion Beams ◽  
Semiconductor Materials ◽  
Spectroscopic Techniques ◽  
Thermal Reactions ◽  
Chemical States ◽  
Uv Lamps

ABSTRACTSurface spectroscopic techniques have been used to investigate aluminium deposition form tri-methyl aluminium (TMA) on Si(100), and the etching of InP by chlorine. Thermal reactions and processes stimulated by UV lamps and ion beams are examined. The results are interpreted in the light of the adsorption states which are formed and the surface transformations of chemical states which are observed to occur.

Surface Reaction Mechanisms in Chemical Beam Epitaxy

1990 ◽  
Vol 204 ◽  
Author(s):  
John S. Foord ◽  
Nagindar K. Singh ◽  
Andrew T.S. Wee ◽  
Cathy L. French ◽  
Emma T. Fitzgerald
Keyword(s):  
Reaction Mechanisms ◽  
Molecular Beam ◽  
Surface Reaction ◽  
Spectroscopic Techniques ◽  
Chemical Beam Epitaxy ◽  
Molecular Beam Scattering ◽  
Group Iii ◽  
Rate Effects ◽  
Beam Scattering ◽  
Complex Growth Rate

ABSTRACTSurface reaction mechanisms which underly the growth of III-V semiconductors by chemical beam epitaxy have been investigated using a combination of surface spectroscopic techniques in conjunction with modulated molecular beam scattering techniques. Emphasis is placed on understanding the complex growth rate effects observed during the growth of Ga(Al,In)As and the origin of selected area epitaxy. These effects are shown to arise from the surface sensitive nature of the decomposition of the group III alkyl source chemicals used in CBE.

Structure effects on reaction mechanisms in collisions induced by radioactive ion beams

2006 ◽  
Vol 69 (8) ◽  
pp. 1366-1371 ◽  
Author(s):  
A. Di Pietro ◽  
P. Figuera ◽  
V. Scuderi ◽  
F. Amorini ◽  
C. Angulo ◽  
...  
Keyword(s):  
Reaction Mechanisms ◽  
Ion Beams ◽  
Radioactive Ion Beams

Plasma-chemical promotion of catalysis for CH4 dry reforming: unveiling plasma-enabled reaction mechanisms

2020 ◽  
Vol 22 (34) ◽  
pp. 19349-19358
Author(s):  
Zunrong Sheng ◽  
Hyun-Ha Kim ◽  
Shuiliang Yao ◽  
Tomohiro Nozaki
Keyword(s):  
Reaction Mechanisms ◽  
Surface Reaction ◽  
Dry Reforming ◽  
Adsorbed Oxygen ◽  
Oxygen Species ◽  
Plasma Chemical ◽  
Vibrationally Excited ◽  
Adsorbed Oxygen Species ◽  
Carbonate Species

Abundant carbonate species are generated over lanthanum by vibrationally excited CO2, which increase adsorbed oxygen species fixation for surface reaction.

Thermodynamic Consistency in Microkinetic Development of Surface Reaction Mechanisms

2003 ◽  
Vol 107 (46) ◽  
pp. 12721-12733 ◽  
Author(s):  
A. B. Mhadeshwar ◽  
H. Wang ◽  
D. G. Vlachos
Keyword(s):  
Reaction Mechanisms ◽  
Surface Reaction ◽  
Thermodynamic Consistency
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