Thermodynamic Consistency in Microkinetic Development of Surface Reaction Mechanisms

2003 ◽  
Vol 107 (46) ◽  
pp. 12721-12733 ◽  
Author(s):  
A. B. Mhadeshwar ◽  
H. Wang ◽  
D. G. Vlachos
Keyword(s):  
Reaction Mechanisms ◽  
Surface Reaction ◽  
Thermodynamic Consistency

Plasma-chemical promotion of catalysis for CH4 dry reforming: unveiling plasma-enabled reaction mechanisms

2020 ◽  
Vol 22 (34) ◽  
pp. 19349-19358
Author(s):  
Zunrong Sheng ◽  
Hyun-Ha Kim ◽  
Shuiliang Yao ◽  
Tomohiro Nozaki
Keyword(s):  
Reaction Mechanisms ◽  
Surface Reaction ◽  
Dry Reforming ◽  
Adsorbed Oxygen ◽  
Oxygen Species ◽  
Plasma Chemical ◽  
Vibrationally Excited ◽  
Adsorbed Oxygen Species ◽  
Carbonate Species

Abundant carbonate species are generated over lanthanum by vibrationally excited CO2, which increase adsorbed oxygen species fixation for surface reaction.

Laser Chemical Etching of Conducting and Semiconducting Materials

1982 ◽  
Vol 17 ◽  
Author(s):  
T. J. Chuang
Keyword(s):  
Material Processing ◽  
Laser Radiation ◽  
Reaction Mechanisms ◽  
Chemical Etching ◽  
Surface Reaction ◽  
Semiconducting Materials ◽  
Laser Method ◽  
Experimental Approaches ◽  
Product Species ◽  
Insight Into

ABSTRACTThe purpose of the paper is to examine the basic processes involved in the laser-enhanced chemical etching of solids. Specifically, the process of chemisorption, the reaction between the adsorbate and substrate atoms and the vaporization of product species affected by the laser radiation are discussed. It is shown that the laser method can provide important insight into the gas-surface reaction mechanisms. In addition, a number of examples are given to demonstrate the potential of the technique for applications to material processing. Some current studies on the laser-induced chemical etching of materials relevant to microelectronics are reviewed. Certain practical experimental approaches are also considered.

Surface Reaction Mechanisms in the Metallisation and Etching of Semiconductor Materials.

1988 ◽  
Vol 131 ◽  
Author(s):  
A Wee ◽  
A J Murrell ◽  
C L French ◽  
R J Price ◽  
R B Jackman ◽  
...  
Keyword(s):  
Reaction Mechanisms ◽  
Surface Reaction ◽  
Ion Beams ◽  
Semiconductor Materials ◽  
Spectroscopic Techniques ◽  
Thermal Reactions ◽  
Chemical States ◽  
Uv Lamps

ABSTRACTSurface spectroscopic techniques have been used to investigate aluminium deposition form tri-methyl aluminium (TMA) on Si(100), and the etching of InP by chlorine. Thermal reactions and processes stimulated by UV lamps and ion beams are examined. The results are interpreted in the light of the adsorption states which are formed and the surface transformations of chemical states which are observed to occur.

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