The Contribution of Beam Processing to Present and Future Integrated Circuit Technologies
Keyword(s):
ABSTRACTA brief history and present state of beam processing techniques and applications to silicon integrated circuit technology are given. The viability of incorporating pulse-laser controlled doping profiles into the emitter-base structure of an advanced bipolar transistor is discussed. The areas of present I.C. technology which will constrain future device development are identified, and the contribution that beam processing can make in removing these constraints is discussed. The beam processing techniques most likely to be found in future I.C. technologies are described.
1995 ◽
Vol 53
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pp. 518-519
1991 ◽
Vol 02
(03)
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pp. 147-162
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2013 ◽
Vol 313-314
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pp. 666-670
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2018 ◽
Vol 7
(2.6)
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pp. 217
Keyword(s):
1991 ◽
Vol 59
(12)
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pp. 1018-1018
2013 ◽
Vol 427-429
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pp. 1285-1288