A High Performance Submicrometer CMOS/SOI Technology Using Ultrathin Silicon Films on Simox
Keyword(s):
AbstractThe use of ultrathin SIMOX wafers for fabricating submicrometer CMOS integrated circuits is described. It is demonstrated from ring oscillator speeds that properly designed devices can exhibit very high transconductance and performance superior to circuits using bulk Si.
1990 ◽
Vol 01
(03n04)
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pp. 245-301
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2000 ◽
Vol 22
(3)
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pp. 175-187
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Keyword(s):
2010 ◽
Vol 87
(10)
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pp. 1955-1962
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