Deep-Level Defects in Nitrogen-Doped 6H-SiC Grown by PVT Method

2008 ◽  
Vol 1069 ◽  
Author(s):  
Pawel Kaminski ◽  
Michal Kozubal ◽  
Krzysztof Grasza ◽  
Emil Tymicki

ABSTRACTAn effect of the nitrogen concentration on the concentrations of deep-level defects in bulk 6H-SiC single crystals is investigated. Six electron traps labeled as T1A, T1B, T2, T3, T4 and T5 with activation energies of 0.34, 0.40, 0.64, 0.67, 0.69, and 1.53 eV, respectively, were revealed. The traps T1A (0.34 eV) and T1B (0.40 eV), observed in the samples with the nitrogen concentration ranging from ∼2×1017 to 5×1017 cm−3, are attributed to complexes formed by carbon vacancies located at various lattice sites and carbon antisites. The concentrations of traps T2 (0.64 eV) and T3 (0.67 eV) have been found to rise from ∼5×1015 to ∼1×1017 cm−3 with increasing the nitrogen concentration from ∼2×1017 to ∼2.0×1018 cm−3. These traps are assigned to complexes involving silicon vacancies occupying hexagonal and quasi-cubic sites, respectively, and nitrogen atoms. The trap T4 (0.69 eV) concentration also substantially rises with increasing the nitrogen concentration and it is likely to be related to complexes formed by carbon antisites and nitrogen atoms. The midgap trap T5 (1.53 eV) is presumably associated with vanadium contamination. The presented results show that doping with nitrogen involves a significant change in the defect structure of 6H-SiC single crystals.

1984 ◽  
Vol 41 ◽  
Author(s):  
S J Barnett ◽  
B K Tanner ◽  
G. T. Brown

AbstractThe high intensity and large beam size of a synchrotron radiation source have been exploited in order to obtain double crystal X-ray topographs of whole 2in. and 3in. slices of semi-insulating LEC GaAs single crystals. Exposure times, typically 30 minutes for high resolution topographs, are at least one order of magnitude down on those required when using a conventional source. Variations in relative lattice parameter and lattice tilt have been measured as a function of position on the slice. The defect structure has been imaged and dislocations are seen in cellular configurations, slip bands and linear arrays (lineage), the latter of which are shown to be associated with small lattice tilts, typically 30”. The defect structure revealed on the topographs has been correlated with 1μm infrared absorption micrographs which are believed to represent the concentration of the dominant deep level EL2.


1981 ◽  
Vol 52 (1) ◽  
pp. 261-268 ◽  
Author(s):  
M. Hussein ◽  
G. Lleti ◽  
G. Sagnes ◽  
G. Bastide ◽  
M. Rouzeyre

1988 ◽  
Vol 126 ◽  
Author(s):  
H. Ueda ◽  
A. Kitagawa ◽  
Y. Tokuda ◽  
A. Usami ◽  
T. Wada ◽  
...  

ABSTRACTUsing deep level transient spectroscopy we have studied the variations of electron traps in molecular beam epitaxial (MBE) AlxGa1−xAs by rapid thermal processing (RTP) using halogen lamps. RTP was performed at 700, 800 and 900 °C for 6s under a SiO2 cap and a capless condition. It is found that during RTP the electron traps with the thermal activation energies of 0.89 and 0.99 eV are produced in Al0.lGa0.9As and Al0.3Ga0.7As, respectively. The thermal activation energies of these traps are close to the reported ones for the trap EL2 in AlxGaM1−xAs. Therefore, these traps are probably related to the trap EL2. In the RTP samples under a capless condition, the concentrations of the trap EL2 in AlxGa1−xAs (x=0.1, 0.3) decreases from the surface to the deeper position in MBE layers, while the depth profile of the trap EL2 in GaAs is flat. It is suggested that the origin of the trap EL2 formation in AlxGa1−xAs is different from one in GaAs.


2002 ◽  
Vol 719 ◽  
Author(s):  
Masashi Kato ◽  
Masaya Ichimura ◽  
Eisuke Arai ◽  
Shigehiro Nishino

AbstractEpitaxial layers of 4H-SiC are grown on (0001) substrates inclined toward <1120> and <1100> directions. Defects in these films are characterized by deep level transient spectroscopy (DLTS) in order to clarify the dependence of concentrations and activation energies on substrate inclination. DLTS results show no such dependence on substrate inclination but show thickness dependence of the concentration.


2020 ◽  
Vol 11 (1) ◽  
pp. 126
Author(s):  
Jen-Chuan Tung ◽  
Tsung-Che Li ◽  
Yen-Jui Teseng ◽  
Po-Liang Liu

The aim of this research is the study of hydrogen abstraction reactions and methyl adsorption reactions on the surfaces of (100), (110), and (111) oriented nitrogen-doped diamond through first-principles density-functional calculations. The three steps of the growth mechanism for diamond thin films are hydrogen abstraction from the diamond surface, methyl adsorption on the diamond surface, and hydrogen abstraction from the methylated diamond surface. The activation energies for hydrogen abstraction from the surface of nitrogen-undoped and nitrogen-doped diamond (111) films were −0.64 and −2.95 eV, respectively. The results revealed that nitrogen substitution was beneficial for hydrogen abstraction and the subsequent adsorption of methyl molecules on the diamond (111) surface. The adsorption energy for methyl molecules on the diamond surface was generated during the growth of (100)-, (110)-, and (111)-oriented diamond films. Compared with nitrogen-doped diamond (100) films, adsorption energies for methyl molecule adsorption were by 0.14 and 0.69 eV higher for diamond (111) and (110) films, respectively. Moreover, compared with methylated diamond (100), the activation energies for hydrogen abstraction were by 0.36 and 1.25 eV higher from the surfaces of diamond (111) and (110), respectively. Growth mechanism simulations confirmed that nitrogen-doped diamond (100) films were preferred, which was in agreement with the experimental and theoretical observations of diamond film growth.


2015 ◽  
Vol 9 (9) ◽  
pp. 530-534 ◽  
Author(s):  
M. Tyagi ◽  
A. K. Singh ◽  
S. G. Singh ◽  
D. G. Desai ◽  
G. D. Patra ◽  
...  

Author(s):  
Bi-Xia Wang ◽  
S. Rosenkranz ◽  
X. Rui ◽  
Junjie Zhang ◽  
F. Ye ◽  
...  

1979 ◽  
Vol 18 (1) ◽  
pp. 29-33 ◽  
Author(s):  
P. H. Chang ◽  
R. Herz ◽  
H. Strunk

Sign in / Sign up

Export Citation Format

Share Document