Relaxation of Metastable Semiconductor Strained-Layer Structures by Plastic Flow

1987 ◽  
Vol 103 ◽  
Author(s):  
Brian W. Dodson ◽  
Jeffrey Y. Tsao
Keyword(s):  
Plastic Flow ◽  
Continuum Model ◽  
Critical Thickness ◽  
Misfit Strain ◽  
Relaxation Behavior ◽  
Strained Layer ◽  
Metastable Structures ◽  
Layer Structures ◽  
Bulk Diamond ◽  
Excess Stress

ABSTRACTThe relaxation of misfit strain in metastable structures by plastic flow is described using a continuum model based on Haasen's picture of plastic flow in bulk diamond-phase semiconductors and the concept of excess stress. This model provides a unified explanation of the equilibrium critical thickness, the relaxation behavior of metastable strained-layer structures, and the “metastable” critical thicknesses reported in many semiconductor strained-layer geometries.

Mbe Growth of Strained-Layer InSb/InAlSb Structures

1990 ◽  
Vol 198 ◽  
Author(s):  
C.R. Whitehouse ◽  
C.F. Mcconville ◽  
G.M. Williams ◽  
A.G. Cullis ◽  
S.J. Barnett ◽  
...  
Keyword(s):  
Quantum Wells ◽  
Critical Thickness ◽  
Multiple Quantum ◽  
Material System ◽  
X Ray Diffraction ◽  
Mbe Growth ◽  
X Ray ◽  
Strained Layer ◽  
Transmission Electron ◽  
Layer Structures

ABSTRACTThe MBE growth and related materials characterisation of InSb/InAlSb strained-layer structures is described. Band-gap considerations and critical thickness calculations are presented and indicate that this material system should offer considerable device potential. Detailed structural studies, performed using both transmission electron microscopy and X-ray diffraction, confirm the growth of high quality multiple quantum-wells, and 2K photoluminescence has shown corresponding energy upshifted transitions.

X-ray topography and EBIC studies of misfit dislocations in strained layer structures

1987 ◽  
Vol 102 ◽  
Author(s):  
N. Hamaguchi ◽  
T. P. Humphreys ◽  
C. A. Parker ◽  
S. M. Bedair ◽  
B-L. Jiang ◽  
...  
Keyword(s):  
Critical Thickness ◽  
Misfit Dislocations ◽  
X Ray ◽  
Strained Layer ◽  
Layer Structures ◽  
Lattice Matched

ABSTRACTX-ray topography(XRT) and EBIC have been used to study the generation of misfit dislocations in strained layer structures. Two structures studied were GaAs1−yPy(y=0.15) film and SLS consisting of InxGa1−xAs(x=0.08) and GaAs1−y Py(y=0.16) layers. XRT and EBIC techniques gave consistent results for the behavior of dislocations. The value of the critical thickness for generation of misfit dislocations in the former was found to be few times larger than that in the latter. EBIC image showed that a SLS lattice matched to the substrate is effective in reducing defects originating from the substrate.

Mechanics of Elastic Dislocations in Strained Layer Structures

1988 ◽  
Vol 130 ◽  
Author(s):  
L. B. Freund ◽  
A. Bower ◽  
J. C. Ramirez
Keyword(s):  
Critical Thickness ◽  
Strain Relaxation ◽  
Continuum Theory ◽  
Growth Surface ◽  
Threading Dislocation ◽  
Strained Layer ◽  
Periodic Arrays ◽  
Layer Structures ◽  
Surface Irregularities ◽  
Generalized Driving Force

AbstractApplication of the elastic continuum theory of dislocations to modeling of phenomena associated with elastic strain relaxation in strained layer epitaxial heterostructures is discussed. The concept of critical thickness for onset of strain relaxation in a strained epitaxial layer is first reviewed, and some extensions to periodic arrays of dislocations and to multiple layers are described. Then, two issues are addressed that arise when the assumptions underlying the critical thickness concept are not met. One issue concerns the nucleation of dislocations at the growth surface of an epitaxial film, particularly the influence of surface irregularities on the activation energy for surface nucleation. A second issue concerns the kinetics of glide of a threading dislocation as it lays down an interface misfit dislocation when the layer thickness exceeds the critical thickness. A generalized driving force for the glide process is defined, and a relationship between this force and the glide speed is proposed.

Epitaxial Growth in Dislocation-Free Strained Alloy Films

2002 ◽  
Vol 715 ◽  
Author(s):  
Zhi-Feng Huang ◽  
Rashmi C. Desai
Keyword(s):  
Deposition Rate ◽  
Elastic Moduli ◽  
Composition Dependence ◽  
Critical Thickness ◽  
Lattice Misfit ◽  
Misfit Strain ◽  
Joint Stability ◽  
Alloy Films ◽  
The Stability ◽  
Stability Results

AbstractThe morphological and compositional instabilities in the heteroepitaxial strained alloy films have attracted intense interest from both experimentalists and theorists. To understand the mechanisms and properties for the generation of instabilities, we have developed a nonequilibrium, continuum model for the dislocation-free and coherent film systems. The early evolution processes of surface pro.les for both growing and postdeposition (non-growing) thin alloy films are studied through a linear stability analysis. We consider the coupling between top surface of the film and the underlying bulk, as well as the combination and interplay of different elastic effects. These e.ects are caused by filmsubstrate lattice misfit, composition dependence of film lattice constant (compositional stress), and composition dependence of both Young's and shear elastic moduli. The interplay of these factors as well as the growth temperature and deposition rate leads to rich and complicated stability results. For both the growing.lm and non-growing alloy free surface, we determine the stability conditions and diagrams for the system. These show the joint stability or instability for film morphology and compositional pro.les, as well as the asymmetry between tensile and compressive layers. The kinetic critical thickness for the onset of instability during.lm growth is also calculated, and its scaling behavior with respect to misfit strain and deposition rate determined. Our results have implications for real alloy growth systems such as SiGe and InGaAs, which agree with qualitative trends seen in recent experimental observations.

Planar channeling in GaAs/InxGa1−xAs/GaAs strained‐layer structures

1989 ◽  
Vol 65 (4) ◽  
pp. 1510-1515 ◽  
Author(s):  
J. L. E. Stevens ◽  
B. J. Robinson ◽  
J. A. Davies ◽  
D. A. Thompson ◽  
T. E. Jackman
Keyword(s):  
Planar Channeling ◽  
Strained Layer ◽  
Layer Structures

Solid phase epitaxial regrowth of Si1−xGex/Si strained‐layer structures amorphized by ion implantation

1989 ◽  
Vol 54 (1) ◽  
pp. 42-44 ◽  
Author(s):  
B. T. Chilton ◽  
B. J. Robinson ◽  
D. A. Thompson ◽  
T. E. Jackman ◽  
J.‐M. Baribeau
Keyword(s):  
Ion Implantation ◽  
Solid Phase ◽  
Strained Layer ◽  
Epitaxial Regrowth ◽  
Layer Structures

Direct measurement of local lattice distortions in strained layer structures by HREM

1993 ◽  
Vol 49 (1-4) ◽  
pp. 273-285 ◽  
Author(s):  
R. Bierwolf ◽  
M. Hohenstein ◽  
F. Phillipp ◽  
O. Brandt ◽  
G.E. Crook ◽  
...  
Keyword(s):  
Direct Measurement ◽  
Strained Layer ◽  
Layer Structures ◽  
Local Lattice ◽  
Lattice Distortions
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