A rebound mechanism for Lomer dislocation formation in strained layer structures

1991 ◽  
Vol 69 (4) ◽  
pp. 2169-2175 ◽  
Author(s):  
S. A. Dregia ◽  
J. P. Hirth
1989 ◽  
Vol 65 (4) ◽  
pp. 1510-1515 ◽  
Author(s):  
J. L. E. Stevens ◽  
B. J. Robinson ◽  
J. A. Davies ◽  
D. A. Thompson ◽  
T. E. Jackman

1989 ◽  
Vol 54 (1) ◽  
pp. 42-44 ◽  
Author(s):  
B. T. Chilton ◽  
B. J. Robinson ◽  
D. A. Thompson ◽  
T. E. Jackman ◽  
J.‐M. Baribeau

1993 ◽  
Vol 49 (1-4) ◽  
pp. 273-285 ◽  
Author(s):  
R. Bierwolf ◽  
M. Hohenstein ◽  
F. Phillipp ◽  
O. Brandt ◽  
G.E. Crook ◽  
...  

1988 ◽  
Vol 4 (4-5) ◽  
pp. 417-422 ◽  
Author(s):  
Brian W. Dodson ◽  
Jeffrey Y. Tsao ◽  
Paul A. Taylor

1988 ◽  
Vol 93 (1-4) ◽  
pp. 449-458 ◽  
Author(s):  
N. Hamaguchi ◽  
T.P. Humphreys ◽  
D.J. Moore ◽  
C.A. Parker ◽  
S.M. Bedair ◽  
...  

1987 ◽  
Vol 103 ◽  
Author(s):  
Brian W. Dodson ◽  
I. J. Fritz ◽  
S. Thomas Picraux ◽  
Jeffrey Y. Tsao

ABSTRACTThe physics governing stability properties and relaxation of mismatch strain in semiconductor strained-layer structures is reviewed. Experimental data on stability and rates of strain relaxation are examined. We conclude that essentially all observations on structural relaxation of semiconductor strained-layer structures can be explained by standard models of plastic deformation adapted to the special conditions controlling dislocation dynamics in these structures.


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