Aging Effects of As-deposited and Passivated Cobalt Slanted Columnar Thin Films

2012 ◽  
Vol 1409 ◽  
Author(s):  
Daniel Schmidt ◽  
Eva Schubert ◽  
Mathias Schubert

ABSTRACTAging effects of as-deposited and passivated slanted columnar thin films from cobalt determined by generalized ellipsometry within the visible spectral region are reported. Slanted columnar thin films have been grown by glancing angle electron beam deposition and sub-sequently coated with Al2O3 by an atomic layer deposition process. An anisotropic Bruggeman effective medium approximation developed for highly ordered three dimensional metal nanostructures is employed to analyze spectroscopic Mueller matrix ellipsometry data. Our model approach allows for determination of biaxial optical and structural properties as well as fractions of multiple film constituents. While the optical properties of the uncoated film change over time, the alumina passivation layer prevents oxidation in air and therefore aging effects; however, it affects the intrinsic bulk-like Co optical properties.

Crystals ◽  
2020 ◽  
Vol 10 (8) ◽  
pp. 650
Author(s):  
Aile Tamm ◽  
Aivar Tarre ◽  
Valeriy Verchenko ◽  
Helina Seemen ◽  
Raivo Stern

In previous decades, investigation of superconductors was aimed either at finding materials with higher critical temperatures or at discovering nontypical superconducting behavior. Here, we present the cupric (CuO) thin films, which were synthesized by atomic layer deposition by using a metal-organic precursor, copper (II)-bis-(-dimethylamino-2-propoxide), and ozone as an oxidizer. The deposition process was optimized by employing a quartz crystal monitoring, and the contact between the deposited films and planar and three-dimensional SiO2/Si substrates was examined by scanning electron microscopy with a focused ion beam module. Phase and elemental composition were analyzed by X-ray diffraction and X-ray fluorescence. Two-probe electrical resistivity measurements revealed a resistivity drop below the critical temperature of 4 K, which may indicate low-temperature superconductivity of the CuO thin films.


2016 ◽  
Vol 120 (27) ◽  
pp. 14681-14689 ◽  
Author(s):  
Shaista Babar ◽  
Anil U. Mane ◽  
Angel Yanguas-Gil ◽  
Elham Mohimi ◽  
Richard T. Haasch ◽  
...  

2005 ◽  
Author(s):  
Jaan Aarik ◽  
Aarne Kasikov ◽  
Marco Kirm ◽  
Sven Lange ◽  
Teet Uustare ◽  
...  

2011 ◽  
Vol 31 (10) ◽  
pp. 1031001
Author(s):  
范欢欢 Fan Huanhuan ◽  
章岳光 Zhang Yueguang ◽  
沈伟东 Shen Weidong ◽  
李旸晖 Li Yanghui ◽  
李承帅 Li Chengshuai ◽  
...  

2019 ◽  
Vol 217 (8) ◽  
pp. 1900237
Author(s):  
Zhen Zhu ◽  
Saoussen Merdes ◽  
Oili M. E. Ylivaara ◽  
Kenichiro Mizohata ◽  
Mikko J. Heikkilä ◽  
...  

2012 ◽  
Vol 30 (2) ◽  
pp. 021202 ◽  
Author(s):  
Tara Dhakal ◽  
Daniel Vanhart ◽  
Rachel Christian ◽  
Abhishek Nandur ◽  
Anju Sharma ◽  
...  

2019 ◽  
Vol 9 (10) ◽  
pp. 1990 ◽  
Author(s):  
Jinseong Ahn ◽  
Changui Ahn ◽  
Seokwoo Jeon ◽  
Junyong Park

Atomic layer deposition (ALD) is a unique tool for conformally depositing inorganic thin films with precisely controlled thickness at nanoscale. Recently, ALD has been used in the manufacture of inorganic thin films using a three-dimensional (3D) nanonetwork structure made of polymer as a template, which is pre-formed by advanced 3D nanofabrication techniques such as electrospinning, block-copolymer (BCP) lithography, direct laser writing (DLW), multibeam interference lithography (MBIL), and phase-mask interference lithography (PMIL). The key technical requirement of this polymer template-assisted ALD is to perform the deposition process at a lower temperature, preserving the nanostructure of the polymer template during the deposition process. This review focuses on the successful cases of conformal deposition of inorganic thin films on 3D polymer nanonetworks using thermal ALD or plasma-enhanced ALD at temperatures below 200 °C. Recent applications and prospects of nanostructured polymer–inorganic composites or hollow inorganic materials are also discussed.


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