Structural and optical properties of (Zn,Mn)O thin films prepared by atomic layer deposition

2020 ◽  
Vol 38 (4) ◽  
pp. 042408 ◽  
Author(s):  
Amirhossein Ghods ◽  
Chuanle Zhou ◽  
Ian T. Ferguson
2015 ◽  
Vol 37 ◽  
pp. 92-98 ◽  
Author(s):  
J.L. Tian ◽  
Gui Gen Wang ◽  
Hua Yu Zhang

ZnO thin films were deposited on Si (100) substrates by atomic layer deposition. Annealing treatments for the as-deposited films were performed in nitrogen, oxygen, argon and air at 800 °C, respectively. The influence of annealing atmosphere on the structural and optical properties of the ALD-ZnO thin films was investigated by XRD, SEM, and PL. Results reveals that the films annealed in oxygen atmosphere exhibited excellent crystallinity (polycrystalline hexagonal wurtzite structure with a strong (002) preferred crystallographic planes), relatively smooth surface and better luminescence performance, which means that O2 is the most suitable annealing atmosphere for obtaining high quality ALD-ZnO thin films.


2016 ◽  
Vol 120 (27) ◽  
pp. 14681-14689 ◽  
Author(s):  
Shaista Babar ◽  
Anil U. Mane ◽  
Angel Yanguas-Gil ◽  
Elham Mohimi ◽  
Richard T. Haasch ◽  
...  

2005 ◽  
Author(s):  
Jaan Aarik ◽  
Aarne Kasikov ◽  
Marco Kirm ◽  
Sven Lange ◽  
Teet Uustare ◽  
...  

2011 ◽  
Vol 31 (10) ◽  
pp. 1031001
Author(s):  
范欢欢 Fan Huanhuan ◽  
章岳光 Zhang Yueguang ◽  
沈伟东 Shen Weidong ◽  
李旸晖 Li Yanghui ◽  
李承帅 Li Chengshuai ◽  
...  

2012 ◽  
Vol 30 (2) ◽  
pp. 021202 ◽  
Author(s):  
Tara Dhakal ◽  
Daniel Vanhart ◽  
Rachel Christian ◽  
Abhishek Nandur ◽  
Anju Sharma ◽  
...  

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