Highly-ordered Porous Coordination Polymer Nanofilms Grown by Layer-by-Layer Deposition Technique

2011 ◽  
Vol 1312 ◽  
Author(s):  
Rie Makiura ◽  
Hiroshi Kitagawa
Keyword(s):  
Layer Growth ◽  
Layer By Layer ◽  
Unique Combination ◽  
Growth Technique ◽  
X Ray ◽  
Langmuir Blodgett ◽  
Layer Deposition ◽  
Out Of Plane ◽  
Porous Coordination Polymer ◽  
Ordered Porous

ABSTRACTThe facile bottom-up fabrication of a perfect preferentially-oriented MOF nanofilm, NAFS-1 on a solid surface, which is endowed with highly crystalline order both in the out-of-plane and in-plane orientations to the substrate, as determined by synchrotron X-ray surface crystallography, was achieved by the unique combination of a layer-by-layer growth technique coupled with the Langmuir-Blodgett (LB) method.

Synthesis and Characterization of Zn Oxide Hexagonal Nano-Pole Films on Quartz Glass Substrate

2009 ◽  
Vol 7 (1) ◽  
Author(s):  
Jie Chen ◽  
Jun Wang
Keyword(s):  
Growth Mechanism ◽  
Quartz Glass ◽  
Photoelectron Spectroscopy ◽  
Glass Substrate ◽  
Sol Gel ◽  
Layer Growth ◽  
Layer By Layer ◽  
Quartz Glass Substrate ◽  
Wurtzite Phase ◽  
X Ray

Hexagon-shaped Zn oxide nano-pole films with terraces and steps have been successfully fabricated by means of a combined approach involving sol-gel process, high-temperature heat treatment, and the hydrothermal method. The surface chemistry and morphological features of the films were characterized by means of x-ray photoelectron spectroscopy and scanning electron microcopy. All the diffraction peaks in x-ray diffraction pattern match with those of the hexagonal wurtzite phase of Zn oxide. Transmittance measurements show that the optical transmittance of the sample synthesized at 520°C on quartz glass substrate is the highest, reaching about 65% in the visible-light region. Based on the detailed structural characterization and the nucleation-growth kinetics, we find that the whole crystallization process of wurtzite Zn oxide nano-poles includes nanocatalysis and layer-by-layer growth mechanism. The present study provides an important understanding of the growth mechanism for nano-pole synthesis of Zn oxide and related materials.

scholarly journals Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO

Crystals ◽  
2020 ◽  
Vol 10 (4) ◽  
pp. 291
Author(s):  
Alberto Perrotta ◽  
Julian Pilz ◽  
Roland Resel ◽  
Oliver Werzer ◽  
Anna Maria Coclite
Keyword(s):  
Atomic Layer ◽  
Layer Growth ◽  
Growth Mode ◽  
Ex Situ ◽  
Native Oxide ◽  
Layer By Layer ◽  
Initial Growth ◽  
Island Growth ◽  
X Ray ◽  
Crystallization Onset

Direct plasma enhanced-atomic layer deposition (PE-ALD) is adopted for the growth of ZnO on c-Si with native oxide at room temperature. The initial stages of growth both in terms of thickness evolution and crystallization onset are followed ex-situ by a combination of spectroscopic ellipsometry and X-ray based techniques (diffraction, reflectivity, and fluorescence). Differently from the growth mode usually reported for thermal ALD ZnO (i.e., substrate-inhibited island growth), the effect of plasma surface activation resulted in a substrate-enhanced island growth. A transient region of accelerated island formation was found within the first 2 nm of deposition, resulting in the growth of amorphous ZnO as witnessed with grazing incidence X-ray diffraction. After the islands coalesced and a continuous layer formed, the first crystallites were found to grow, starting the layer-by-layer growth mode. High-temperature ALD ZnO layers were also investigated in terms of crystallization onset, showing that layers are amorphous up to a thickness of 3 nm, irrespective of the deposition temperature and growth orientation.

Surfactant-Mediated Growth of Ge/Si(001) Interface Studied by XPD

1998 ◽  
Vol 05 (01) ◽  
pp. 157-161 ◽  
Author(s):  
R. Gunnella ◽  
P. Castrucci ◽  
N. Pinto ◽  
P. Cucculelli ◽  
I. Davoli ◽  
...  
Keyword(s):  
High Temperature ◽  
Auger Electron ◽  
Layer Growth ◽  
Layer By Layer ◽  
Growth Morphology ◽  
High Quality ◽  
X Ray ◽  
Photoelectron Diffraction ◽  
Quality Degradation ◽  
Cap Layer

The influence of Sb as a surfactant on the formation of Si/Ge interface is studied by means of XPD (X-ray photoelectron diffraction) and AED (Auger electron diffraction) from Ge and Si core levels. The technique employed is particularly suitable for checking the film tetragonal distortion, the growth morphology and the sharpness of the interface. We found a layer by layer growth mode for 3 ML of Ge on Si(001) and related values of strain of the film close to the value predicted by the elastic theory which enforces the use of such a surfactant to obtain high quality and sharp heterostructures. In addition, studying the influence of 3 ML of the Si cap layer on the 3 ML Ge, we obtain no indication of Ge segregation into the Si cap layer. Finally, evidences of quality degradation after high temperature (T > 600° C ) annealing are shown.

Study of HfAlOx Films Deposited by Layer-by-Layer Growth for CMOS High-k Gate Dielectrics

2003 ◽  
Vol 786 ◽  
Author(s):  
Akira Toriumi ◽  
Toshihide Nabatame ◽  
Tsuyoshi Horikawa
Keyword(s):  
Gate Dielectrics ◽  
Layer Growth ◽  
Atomic Diffusion ◽  
Layer By Layer ◽  
Al Content ◽  
Nitrogen Incorporation ◽  
Layer Deposition ◽  
Superlattice Peak ◽  
High K ◽  
Ternary Metal

ABSTRACTWe have investigated ternary metal oxide films for high-k gate dielectrics by using a layer-by-layer deposition & annealing method so as to keep the dielectric constant of the film high with no crystallization. HfAlOx films have been prepared by alternating deposition of HfO2 and Al2O3 layers, where it is a key for the improvement of the film quality to understand the intermixing process between two layers by thermal treatments. So, we first discuss the atomic diffusion and structural change of the HfO2/Al2O3 “superlattice” film as a function of the annealing temperature by changing the Hf/Al ratio. In a typical case of the film with HfOx/AlOx=3Å/9Å cycle, a clear superlattice peak is observed below 750 °C by XRD. Above 850 °C, a different type of crystalline structure with no superlattice peaks is observed. These results indicate that the intermixing in HfO2/Al2O3 (3Å/9Å) films occurs between 750 and 850 °C. The intermixing onset temperature increases with increasing Al content in Hf/Al ratio.To further increase the crystallization temperature, nitrogen incorporation into the film is considered, and effects of the nitrogen incorporation into HfAlOx films are studied from the structural and electrical viewpoints. The results indicate that there is a tradeoff between crystallization restriction and leakage current degradation for the nitrogen incorporation into HfAlOx films.

Rheed Intensity Oscillation During Layer-by-Layer Growth of Bi-Sr-Ca-Cu-O Thin Films

1992 ◽  
Vol 275 ◽  
Author(s):  
K. Yoshikawa ◽  
N. Sasaki
Keyword(s):  
Thin Films ◽  
Buffer Layer ◽  
High Energy ◽  
Layer Growth ◽  
Layer By Layer ◽  
Two Dimensional ◽  
Growth Interruption ◽  
Layer Deposition ◽  
Unit Cells ◽  
Layered Growth

ABSTRACTUsing in-situ reflection high-energy electron diffraction (RHEED), we studied the growth of Bi-Sr-Ca-Cu-O (BSCCO) thin films prepared by reactive evaporation using layer-by-layer deposition. Bi2Sr2CaCu2Ox(2212) tends to be grown three-dimensionally if it is grown directly on (100) SrTiO3, in contrast to Bi2Sr2CuOx(2201) which is easily grown two-dimensionally on SrTiO3. Two-dimensional 2212 growth can be realized, if a buffer layer of 2201 is deposited on (100) SrTiO3 and growth interruption is utilized after SrO layer deposition. A buffer layer of only two 2201 unit cells improved the surface crystallinity of the substrate for the epitaxial growth of 2212. Growth interruption for two minutes after the 2nd SrO layer in the half unit cell is necessary to keep two-dimensional layered growth. The resulting Tc (zero) is 76 K and Jc (at 4.2 K) is 1.5 × 106 (A/cm2) with these epitaxial films.

Growth of CaFeOX/LaFeO3 Superlattice on SrTiO3(100) Substrates

2011 ◽  
Vol 1292 ◽  
Author(s):  
Nobuyuki Iwata ◽  
Mark Huijben ◽  
Guus Rijnders ◽  
Hiroshi Yamamoto ◽  
Dave H. A. Blank
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Layer Growth ◽  
Laser Deposition ◽  
Growth Mode ◽  
Layer By Layer ◽  
X Ray Diffraction ◽  
Reciprocal Space Mapping ◽  
X Ray

ABSTRACTThe CaFeOX(CFO) and LaFeO3(LFO) thin films as well as superlattices were fabricated on SrTiO3(100) substrates by pulsed laser deposition (PLD) method. The tetragonal LFO film grew with layer-by-layer growth mode until approximately 40 layers. In the case of CFO, initial three layers showed layer-by-layer growth, and afterward the growth mode was transferred to two layers-by-two layers (TLTL) growth mode. The RHEED oscillation was observed until the end of the growth, approximately 50nm. Orthorhombic twin CaFeO2.5 (CFO2.5) structure was obtained. However, it is expected that the initial three CFO layers are CaFeO3 (CFO3) with the valence of Fe4+. The CFO and LFO superlattice showed a step-terraces surface, and the superlattice satellite peaks in a 2θ-θ and reciprocal space mapping (RSM) x-ray diffraction (XRD) measurements, indicating that the clear interfaces were fabricated.

scholarly journals Investigations on the Electrochemical Atomic Layer Growth of Bi2Se3 and the Surface Limited Deposition of Bismuth at the Silver Electrode

Materials ◽  
2018 ◽  
Vol 11 (8) ◽  
pp. 1426 ◽  
Author(s):  
Walter Giurlani ◽  
Andrea Giaccherini ◽  
Nicola Calisi ◽  
Giovanni Zangari ◽  
Emanuele Salvietti ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Ultrathin Films ◽  
Photoelectron Spectroscopy ◽  
Atomic Layer ◽  
Layer Growth ◽  
Electrochemical Studies ◽  
Optimal Conditions ◽  
X Ray ◽  
Layer Deposition ◽  
Controlled Deposition

The Electrochemical Atomic Layer Deposition (E-ALD) technique is used for the deposition of ultrathin films of bismuth (Bi) compounds. Exploiting the E-ALD, it was possible to obtain highly controlled nanostructured depositions as needed, for the application of these materials for novel electronics (topological insulators), thermoelectrics and opto-electronics applications. Electrochemical studies have been conducted to determine the Underpotential Deposition (UPD) of Bi on selenium (Se) to obtain the Bi2Se3 compound on the Ag (111) electrode. Verifying the composition with X-ray Photoelectron Spectroscopy (XPS) showed that, after the first monolayer, the deposition of Se stopped. Thicker deposits were synthesized exploiting a time-controlled deposition of massive Se. We then investigated the optimal conditions to deposit a single monolayer of metallic Bi directly on the Ag.

A SURFACE X-RAY DIFFRACTION STUDY OF THE GROWTH OF ULTRATHIN LAYERS OF Fe ON Cu(001)

1994 ◽  
Vol 01 (04) ◽  
pp. 631-634 ◽  
Author(s):  
M.A. JAMES ◽  
C. NORRIS ◽  
C.L. NICKLIN ◽  
R.G. VAN SILFHOUT ◽  
P.B. HOWES ◽  
...  
Keyword(s):  
Layer Growth ◽  
Detailed Knowledge ◽  
Exact Nature ◽  
Layer By Layer ◽  
X Ray Diffraction ◽  
Iron Films ◽  
X Ray ◽  
Diffusion Limited ◽  
Ultrathin Layers ◽  
Fcc Phase

Although it is well known that the γ (fcc) phase of Fe can be stabilised on Cu(001) single crystal substrates, there is still considerable disagreement about the exact nature of the growth mode and the structures that evolve with increasing film thickness. A detailed knowledge of the structure and morphology is essential for a complete understanding of the magnetic properties of ultrathin iron films. Surface X-ray diffraction measurements, recorded in real time during deposition of Fe deposition on Cu(001), are presented. At room temperature, well-defined layer-by-layer growth, with no significant agglomeration of iron, was observed. The specular intensity of the X-ray beam varied parabolically with coverage, as predicted by kinematical theory. Intensity oscillations were observed up to 15 Fe monolayers, at which coverage relaxation to the α (bcc) phase was confirmed. At 85 K the growth is diffusion limited.

A compact UHV X-ray diffractometer for studying surfaces and interfaces

1998 ◽  
Vol 5 (3) ◽  
pp. 887-889
Author(s):  
Yoshikazu Fujii ◽  
Takeshi Nakamura ◽  
Mutsumi Kai ◽  
Kentaroh Yoshida
Keyword(s):  
High Vacuum ◽  
Layer Growth ◽  
Ultra High Vacuum ◽  
Layer By Layer ◽  
Crystal Surfaces ◽  
X Ray ◽  
Surfaces And Interfaces ◽  
Optical Table ◽  
Specimen Orientation

A compact ultra-high-vacuum (UHV) X-ray diffractometer for surface glancing X-ray scattering has been constructed. All the equipment, including a rotating-anode source of 18 kW and a UHV specimen chamber, is arranged on one optical table of dimensions 70 × 90 cm. The specimen chamber is 14 cm in diameter and 20 cm high and can be evacuated up to 3 × 10−8 Pa. It is equipped with two Be windows of thicknesses 0.2 and 0.4 mm. Specimen orientation in the vacuum is controlled from the outside. The specimen can be heated up to 773 K. The chamber has two evaporation cells and can be used for in situ observations of growing crystal surfaces. Using this instrument, we observed a mechanically polished Ag surface and successfully made an in situ observation of the layer-by-layer growth of a PbSe(111) surface. The instrument will be useful for preliminary experiments using laboratory sources, prior to final measurements at synchrotron radiation facilities.

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