Molecular beam epitaxy growth of nonmagnetic Weyl semimetal LaAlGe thin film

2020 ◽  
Vol 10 (2) ◽  
pp. 272-277
Author(s):  
Niraj Bhattarai ◽  
Andrew W. Forbes ◽  
Rajendra P. Dulal ◽  
Ian L. Pegg ◽  
John Philip

Author(s):  
R. M. Feenstra ◽  
J. E. Northrup ◽  
Jörg Neugebauer

A review of surface structures of bare and adsorbate-covered GaN (0001) and (000) surfaces is presented, including results for In, Mg, Si, and H adsorbates. Emphasis is given to direct determination of surface structure employing experimental techniques such as scanning tunneling microscopy, electron diffraction, and Auger electron spectroscopy, and utilizing first principles computations of the total energy of various structural models. Different surface stoichiometries are studied experimentally by varying the surface preparation conditions (e.g. Ga-rich compared to N-rich), and the stoichiometry is included in the theory by performing calculations for various chemical potentials of the constituent atoms. Based on the work reviewed here, surface reconstructions for plasma-assisted molecular beam epitaxy growth of GaN (0001) and (000) surfaces are fairly well understood, but reconstructions for reactive molecular beam epitaxy or for metal-organic vapor phase epitaxy (both involving H, at moderate and high temperatures, respectively) are less well understood at present.


2017 ◽  
Vol 33 (2) ◽  
pp. 419-425
Author(s):  
Hai-Fei WU ◽  
◽  
Yao CHEN ◽  
Shan-Hu XU ◽  
Yong-Hong YAN ◽  
...  

2016 ◽  
Vol 65 (12) ◽  
pp. 127401
Author(s):  
Zhang Ma-Lin ◽  
Ge Jian-Feng ◽  
Duan Ming-Chao ◽  
Yao Gang ◽  
Liu Zhi-Long ◽  
...  

Author(s):  
M. E. Twigg ◽  
E. D. Richmond ◽  
J. G. Pellegrino

For heteroepitaxial systems, such as silicon on sapphire (SOS), microtwins occur in significant numbers and are thought to contribute to strain relief in the silicon thin film. The size of this contribution can be assessed from TEM measurements, of the differential volume fraction of microtwins, dV/dν (the derivative of the microtwin volume V with respect to the film volume ν), for SOS grown by both chemical vapor deposition (CVD) and molecular beam epitaxy (MBE).In a (001) silicon thin film subjected to compressive stress along the [100] axis , this stress can be relieved by four twinning systems: a/6[211]/( lll), a/6(21l]/(l1l), a/6[21l] /( l1l), and a/6(2ll)/(1ll).3 For the a/6[211]/(1ll) system, the glide of a single a/6[2ll] twinning partial dislocation draws the two halves of the crystal, separated by the microtwin, closer together by a/3.


1988 ◽  
Vol 64 (7) ◽  
pp. 3522-3527 ◽  
Author(s):  
Mitsuru Ohtsuka ◽  
Seiichi Miyazawa

2014 ◽  
Vol 390 ◽  
pp. 120-124 ◽  
Author(s):  
Robert D. Richards ◽  
Faebian Bastiman ◽  
Christopher J. Hunter ◽  
Danuta F. Mendes ◽  
Abdul R. Mohmad ◽  
...  

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