Test Methods for Analyzing Organic Contaminants on Silicon Wafer Surfaces by Thermal Desorption Gas Chromatography

10.1520/f1982-99e01 ◽

1999 ◽

Author(s):

Keyword(s):

Gas Chromatography ◽

Silicon Wafer ◽

Thermal Desorption ◽

Organic Contaminants ◽

Test Methods ◽

Wafer Surfaces

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Study of Organic Contaminants Analysis using TD-GCMS on Silicon Wafer Surfaces

ECS Transactions ◽

10.1149/1.2980307 ◽

2019 ◽

Vol 16 (6) ◽

pp. 237-248

Author(s):

Toshikazu Taira ◽

Yoshimi Shiramizu ◽

Masaharu Watanabe ◽

Nobuyuki Kawai

Keyword(s):

Silicon Wafer ◽

Organic Contaminants ◽

Wafer Surfaces

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Direct quantitative analysis of phthalate esters as micro-contaminants in cleanroom air and wafer surfaces by auto-thermal desorption–gas chromatography–mass spectrometry

Journal of Chromatography A ◽

10.1016/j.chroma.2005.02.055 ◽

2005 ◽

Vol 1070 (1-2) ◽

pp. 137-145 ◽

Cited By ~ 29

Author(s):

Yuhao Kang ◽

Walter Den ◽

Hsunling Bai ◽

Fu-Hsiang Ko

Keyword(s):

Mass Spectrometry ◽

Gas Chromatography ◽

Quantitative Analysis ◽

Thermal Desorption ◽

Phthalate Esters ◽

Gas Chromatography Mass Spectrometry ◽

Chromatography Mass Spectrometry ◽

Wafer Surfaces

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TXRF Analysis of Low Z Elements and TXRF-NEXAFS Speciation of Organic Contaminants on Silicon Wafer Surfaces Excited by Monochromatized Undulator Radiation

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.92.165 ◽

2003 ◽

Vol 92 ◽

pp. 165-170 ◽

Cited By ~ 3

Author(s):

Burkhard Beckhoff ◽

R. Fliegauf ◽

Gerhard Ulm ◽

J. Weser ◽

G. Pepponi ◽

...

Keyword(s):

Silicon Wafer ◽

Organic Contaminants ◽

Undulator Radiation ◽

Wafer Surfaces

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Computation Program System for Structural Analysis and Quantification of Organic Contaminants on Silicon Wafer Surfaces from Mass Spectra.

Analytical Sciences ◽

10.2116/analsci.16.593 ◽

2000 ◽

Vol 16 (6) ◽

pp. 593-596 ◽

Cited By ~ 2

Author(s):

Keiji SAITO ◽

Hiroshi SIMIZU ◽

Toshio OGAWA

Keyword(s):

Structural Analysis ◽

Silicon Wafer ◽

Organic Contaminants ◽

Mass Spectra ◽

Program System ◽

Wafer Surfaces

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Analysis of organic contaminants from silicon wafer and disk surfaces by thermal desorption-GC-MS

10.1117/12.343711 ◽

1999 ◽

Cited By ~ 1

Author(s):

Mark J. Camenzind ◽

Latif Ahmed ◽

Anurag Kumar

Keyword(s):

Silicon Wafer ◽

Thermal Desorption ◽

Organic Contaminants

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Study of Organic Contaminants Analysis using TD-GCMS on Silicon Wafer Surfaces

ECS Meeting Abstracts ◽

10.1149/ma2008-02/26/2001 ◽

2008 ◽

Keyword(s):

Silicon Wafer ◽

Organic Contaminants ◽

Wafer Surfaces

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A novel IR monitoring system for organic contaminants on 300-mm silicon wafer surfaces

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) ◽

10.1109/issm.1999.808835 ◽

2003 ◽

Author(s):

H. Yoshida ◽

M. Endo ◽

Y. Maeda ◽

M. Niwano ◽

N. Miyamoto

Keyword(s):

Monitoring System ◽

Silicon Wafer ◽

Organic Contaminants ◽

Wafer Surfaces

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Indoor, ambient and workplace air. Sampling and analysis of volatile organic compounds by sorbent tube/thermal desorption/capillary gas chromatography

10.3403/02362476u ◽

2015 ◽

Keyword(s):

Gas Chromatography ◽

Volatile Organic Compounds ◽

Organic Compounds ◽

Thermal Desorption ◽

Capillary Gas Chromatography ◽

Air Sampling ◽

Volatile Organic ◽

Workplace Air

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Indoor, ambient and workplace air. Sampling and analysis of volatile organic compounds by sorbent tube/thermal desorption/capillary gas chromatography

10.3403/02362476 ◽

2001 ◽

Keyword(s):

Gas Chromatography ◽

Volatile Organic Compounds ◽

Organic Compounds ◽

Thermal Desorption ◽

Capillary Gas Chromatography ◽

Air Sampling ◽

Volatile Organic ◽

Workplace Air

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