Study of Organic Contaminants Analysis using TD-GCMS on Silicon Wafer Surfaces

2019 ◽  
Vol 16 (6) ◽  
pp. 237-248
Author(s):  
Toshikazu Taira ◽  
Yoshimi Shiramizu ◽  
Masaharu Watanabe ◽  
Nobuyuki Kawai
Keyword(s):  
Silicon Wafer ◽  
Organic Contaminants ◽  
Wafer Surfaces

Experimental Observation of Fractal-Regular Surfaces and a Transformation Scheme for Extracting Fractal Parameters

2005 ◽  
Author(s):  
Shao Wang ◽  
Wai Kin Chan
Keyword(s):  
Silicon Wafer ◽  
Roughness Parameter ◽  
Hard Disk ◽  
Spectral Density Function ◽  
Power Spectral ◽  
Fractal Parameters ◽  
Asperity Contacts ◽  
Fractal Roughness ◽  
Magnetic Hard Disk ◽  
Wafer Surfaces

To account for the effects of asperity contacts at various length scales, it is appropriate to characterize an engineering surface as a fractal-regular surface. In spite of significant theoretical advancement, there is a desperate need for experimental verification of the theory of fractal-regular surfaces and a consistent scheme of obtaining the fractal parameters. In the present study, the existence of a fractal region and a regular-shape region in the power spectral density function for fractal-regular surfaces was confirmed experimentally, for the first time, with data obtained from magnetic hard disk and silicon wafer surfaces. A novel scheme involving a variable transformation was developed to extract fractal parameters. This scheme was validated by accurate recovery of fractal parameters from simulated surfaces. The fractal dimension, the fractal roughness parameter and the fractal domain length were found for magnetic hard disk and silicon wafer surfaces.

High Sensitivity Optical Detection of Oriented Microdefects on Silicon Wafer Surfaces Using Annular Illumination

CIRP Annals ◽  
2001 ◽  
Vol 50 (1) ◽  
pp. 389-392 ◽  
Author(s):  
Takashi Miyoshi ◽  
Satoru Takahashi ◽  
Yasuhiro Takaya ◽  
Shoichi Shimada
Keyword(s):  
Silicon Wafer ◽  
Optical Detection ◽  
High Sensitivity ◽  
Wafer Surfaces
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