Quantitative Analysis of the Strain Field beneath the Si3N4/Si(001) Interface Formed by the Xe/NH3 Plasma Nitridation using a Multiple-Wave X-ray Diffraction Phenomenon
2009 ◽
Vol 34
(4)
◽
pp. 597-599
Keyword(s):
X Ray
◽
2007 ◽
Vol 32
(1)
◽
pp. 227-229
2013 ◽
Vol 03
(01)
◽
pp. 47-53
◽
2018 ◽
Vol 27
(0)
◽
pp. 57-67
◽
Keyword(s):
2008 ◽
Vol 452
(2)
◽
pp. 446-450
◽