scholarly journals Mathematical Modeling of Droplet Formation, Evaporation, and Film Growth to Study Crystallite Size and Film Thickness of Spray Pyrolysis Deposited TiO2 Thin Films

2018 ◽  
Vol 16 (0) ◽  
pp. 419-426
Author(s):  
Dipak L. Gapale ◽  
Sandeep A. Arote ◽  
Ratan Y. Borse
Keyword(s):  
Mathematical Modeling ◽  
Thin Films ◽  
Film Thickness ◽  
Crystallite Size ◽  
Spray Pyrolysis ◽  
Film Growth ◽  
Droplet Formation

scholarly journals Synthesis and characterization of Eu3+ doped TiO2 thin films deposited by spray pyrolysis technique for photocatalytic application

2020 ◽  
Author(s):  
Shereen Alshomar
Keyword(s):  
Thin Films ◽  
Methylene Blue ◽  
Refractive Index ◽  
Optical Properties ◽  
Film Thickness ◽  
Photocatalytic Degradation ◽  
Spray Pyrolysis ◽  
Spray Pyrolysis Technique ◽  
Average Grain Size ◽  
Double Beam

Abstract In this study, nanocrystalline TiO 2 : Eu 3+ thin films are successfully formed by spray pyrolysis technique deposited on glass substrate. Optical, electrical, structure, surface morphology, and photocatalytic degradation of Methylene blue have been examined. The optical properties of the films are analyzed using transmittance and reflectance spectra, which are measured using UV-Vis-NIR double-beam spectrophotometer. Optical properties such as refractive index (n), extinction coefficient (k), optical conductivity (σ) and Urbach energy (E u ) have been calculated as a function of Eu 3+ concentration. Film thickness were evaluated using the refractive index dependence on wavelength . The films thickness were determined as 97.13, 122.62, 123.24, 117.14 and 128.25 nm, respectively, for Eu doped TiO 2 at 0,4, 6, 8 and 10 wt % doping concentration. The band gap values raised from 3.29 to 3.42 eV with increasing the Eu 3+ dopant concentration. The highest electrical conductivity was found to be 3.01x10 -2 (Ω.cm) -1 at high doping level with 10 wt% Eu 3+ . The XRD analysis illustrate the tetragonal crystal structure of films with anatase phase and reduces crystallite size linearly with increasing Eu 3+ concentration. Scanning electron microscopy (SEM) analysis indicated consistent allocation of irregular and spherical shaped grains covering the substrate surface. The average grain size in range of 82.5 – 51.1 nm is observed and films show porous nature. The photocatalytic effect of TiO 2 : Eu 3+ thin films is predicted from the degradation of methylene blue (MB) at room temperature under UV light irradiation. An enhancement in photocatalytic degradation observed by increasing the amount of Eu 3+ due to increase in the e/h pair production and increase of film thickness. These results make TiO 2 : Eu 3+ thin films as attractive candidate for photovoltaic cells and other optoelectronic device applications

scholarly journals Studies on nanocomposites nanoplates and pervoskite nanorod thin films

YMER Digital ◽  
2021 ◽  
Vol 20 (12) ◽  
pp. 303-313
Author(s):  
M M Patil ◽  
◽  
K. P Joshi ◽  
S.B Patil ◽  
◽  
...  
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Nickel Oxide ◽  
Spray Pyrolysis ◽  
Glass Substrate ◽  
Spray Pyrolysis Technique ◽  
Precursor Solution ◽  
Element Composition ◽  
Sem And Tem ◽  
Nano Crystalline

Nano crystalline nickel oxide thin films of different film thickness were deposited onto glass substrate at 350 oC by varying volume of precursor solution using spray pyrolysis technique. This structural, morphological and microstructure properties were investigated using XRD, FE-SEM and TEM. The element composition was studied using EDAX. It is found that increase in the volume of sprayed solution leads to the increment in film thickness and amelioration of crystallinity of the film. The results are discussed and interpreted.

Thickness Effect on Microstructure and Residual Stress of Annealed Copper Thin Films

2011 ◽  
Vol 681 ◽  
pp. 139-144 ◽  
Author(s):  
Renaud Vayrette ◽  
Christian Rivero ◽  
Sylvain Blayac ◽  
Karim Inal
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Film Thickness ◽  
Crystallite Size ◽  
Annealing Temperature ◽  
Stress Generation ◽  
Thickness Effect ◽  
Electron Backscattered Diffraction ◽  
Electroplated Copper ◽  
Stress Models

In this work, coupled effects of thickness and annealing temperature on both microstructure and residual stress of electroplated copper thin films are studied. Microstructure is investigated by Electron Backscattered Diffraction (EBSD) and residual stress is estimated from samples curvature. All films exhibit highly twinned grains. Except for several microns films, median crystallite size grows with both film thickness and annealing temperature. Concerning residual stress, it decreases, first as the increase of film thickness, and secondly as the decrease of annealing temperature. The comparison between experiments and stress models demonstrates that the root mechanisms of residual stress generation change with annealing temperature. As well as annealing temperature, film thickness determines the level of residual stress through control of microstructure. Furthermore, EBSD investigations confirmed that the relevant microstructural length to define mechanical properties of thin copper films is the median crystallite size.

Formation of Self-Affine Surface During the Growth of Nickel Thin Films

1994 ◽  
Vol 367 ◽  
Author(s):  
M.V.H. Rao ◽  
V. Srinivas ◽  
B.K. Mathur ◽  
K.L. Chopra
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Surface Structure ◽  
Film Growth ◽  
The Self ◽  
Affine Surface ◽  
Nickel Thin Films ◽  
Topographic Data ◽  
Shape And Size

AbstractThin films of nickel deposited on various substrates have been investigated by using an STM. Topographic data recorded at different stages of the film growth reveal that the surface structure at one location of the film resemble that at another location of the same film. The repetitive structures are made up of a few coalescing clusters and forming exactly similar looking islands. As the film thickness increases, the shape and size of these repetitive patterns changes but the self-affinity of the surface structure is maintained.

Formation of Nanoparticles in Zr and Dy Doped YBCO MOD Superconducting Films

2011 ◽  
Vol 700 ◽  
pp. 15-18
Author(s):  
James A. Xia ◽  
Nick M. Strickland ◽  
Evgueni F. Talantsev ◽  
Nick J. Long
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Formation Mechanism ◽  
Film Growth ◽  
Precursor Solution ◽  
Superconducting Films ◽  
Metal Organic ◽  
Metal Organic Deposition ◽  
Precursor Layer ◽  
Dy Doping

We study the formation mechanism of nanoparticles in thin films of the superconductor YBa2Cu3O7-δ(YBCO). We form the films by metal-organic deposition (MOD) on buffered, textured metal substrates. Through the addition of Dy or Zr salts to the precursor solution we precipitate (Y,Dy)2O3and BaZrO3nanoparticles, uniformly distributed through the film thickness. By quenching samples during the film growth, we show the nanoparticles form in the precursor layer before YBCO growth. The size of the nanoparticles was quantitatively analysed by TEM. We found that Zr doping produces smaller nanoparticles than Dy doping.

scholarly journals Thickness Effect on Photocatalytic Activity of TiO2 Thin Films Fabricated by Ultrasonic Spray Pyrolysis

Catalysts ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 1058
Author(s):  
Ibrahim Dundar ◽  
Arvo Mere ◽  
Valdek Mikli ◽  
Malle Krunks ◽  
Ilona Oja Acik
Keyword(s):  
Thin Films ◽  
Photocatalytic Activity ◽  
Film Thickness ◽  
Stearic Acid ◽  
Spray Pyrolysis ◽  
Ultrasonic Spray Pyrolysis ◽  
Tio2 Films ◽  
Tio2 Thin Films ◽  
Ultrasonic Spray ◽  
Self Cleaning

In this study, TiO2 thin films were deposited by ultrasonic spray pyrolysis from solutions with concentrations of 0.1 and 0.2 M. The deposition temperature was adjusted at 350 °C and all samples were annealed at 500 °C for 1 h in air. The thickness of TiO2 films was changed in the range of 50 to ca. 800 nm by varying the number of spray cycles from 1 to 21 and the solution concentration. The results showed that the mean crystallite size of the anatase structure, the surface roughness, and light absorption increased with the film thickness. The effect of film thickness on the photocatalytic activity was investigated with the photodegradation of stearic acid under UV-A irradiation. The optimal thickness of TiO2 films fabricated by ultrasonic spray pyrolysis for photocatalytic self-cleaning applications was in the range of 170–230 nm, indicating a ca. 2.6 times-higher photocatalytic self-cleaning activity compared to the reference sample, Pilkington ActivTM. The photocatalytic results showed that the 190 nm-thick TiO2 film deposited from the 0.1 M solution applying seven spray cycles exhibited the finest grain structure and maximum photocatalytic activity, leading to 94% of stearic acid degradation in 180 min under UV-A light with the reaction rate constant k = 0.01648 min−1.

Surface Roughness and Growth Texture of (Ba,Sr)TiO3 Thin Films Formed by MOCVD

1998 ◽  
Vol 541 ◽  
Author(s):  
Y. Gao ◽  
P. Alluri ◽  
S. He ◽  
M. Engelhard ◽  
A.S. Lea ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Roughness ◽  
Film Thickness ◽  
Film Growth ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Pure Oxygen ◽  
Si Substrates ◽  
Direct Liquid Injection ◽  
Plasma Enhancement

AbstractMetalorganic chemical vapor deposition (MOCVD) has been used to grow (Ba,Sr)TiO3 thin films on Ir/SiO2/Si substrates. β-diketonates of Ba, Sr, and Ti were used as the precursors, and delivered to the reactor via direct-liquid injection. Growth rate and film thickness were monitored by in-situ spectroscopic ellipsometry, and determined after growth. Film growth was studied as a function of film thickness, composition, substrate temperature, and mixture of O2 and N2O with and without microwave plasma enhancement. Dense, mirror-like films were obtained under all conditions except when pure oxygen plasma enhancement was used. Surface roughness of the films appears strongly dependent on film thickness and composition. Film composition and growth temperature determine growth texture of the films. This paper describes these results as well as the correlation between these results and dielectric properties.

Effect of Thermal Treatments on the Structural and Optical Properties of Thermally Deposited Polycrystalline Cu Thin Films

2012 ◽  
Vol 510-511 ◽  
pp. 335-342
Author(s):  
S.K. Mehmood ◽  
M. Mansoor ◽  
M.M. Asim ◽  
S. Zaman
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Film Thickness ◽  
Crystallite Size ◽  
Residual Strain ◽  
Infrared Region ◽  
Laser Applications ◽  
Crystallographic Preferred Orientation ◽  
Double Beam ◽  
Crystallite Sizes

Copper thin films are potentially used in optical and laser applications due to their intrinsic reflective indexes in visible and infrared region of the spectrum. The reflective properties of the thin films are mainly driven by their thickness, structure, and residual strain induced during the processing stages. Copper thin films of various thicknesses were deposited on glass slides using a thermal evaporation unit. The deposited substrates were thermally treated, in inert environment for 30 minutes, for various temperatures. Further, the substrates were characterized using various techniques. Structural studies of the thin films were carried out using XRD on the as deposited and heat treated films to study the phases, the crystallographic preferred orientation, residual strain and crystallite size. The polycrystalline Cu phase was revealed and no oxide phases were identified. The films were preferentially oriented along (111). The crystallite size increases while the residual strain decreases as the film thickness increases. The crystallite sizes were very small as compared to the film thickness. The optical properties of these coatings were investigated by double beam spectrophotometer. It was found that reflectance of these coatings strongly depends upon the film thickness and post deposition heat treatment. The optimum deposition procedure was established to obtain the enhanced reflecting power.

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