Structural and optical properties of titanium dioxide films produced by RAS (Radical Assisted Sputtering) coater

Author(s):  
Yousong Jiang ◽  
Yizhou Song ◽  
Ming Li ◽  
Haiqian Wang ◽  
J.g. Hou
2013 ◽  
Vol 2013 ◽  
pp. 1-10 ◽  
Author(s):  
Yaser M. Abdulraheem ◽  
Sahar Ghoraishi ◽  
Lidia Arockia-Thai ◽  
Suji K. Zachariah ◽  
Moustafa Ghannam

Titanium dioxide thin films were deposited on crystalline silicon substrates by electron beam physical vapor deposition. The deposition was performed under vacuum ranging from 10−5to 10−6Torr without process gases, resulting in homogeneousTiO2-xlayers with a thickness of around 100 nm. Samples were then annealed at high temperatures ranging from500°C to800°C for 4 hours under nitrogen, and their structural and optical properties along with their chemical structure were characterized before and after annealing. The chemical and structural characterization revealed a substoichiometricTiO2-xfilm with oxygen vacancies, voids, and an interface oxide layer. It was found from X-ray diffraction that the deposited films were amorphous and crystallization to anatase phase occurred for annealed samples and was more pronounced for annealing temperatures above700°C. The refractive index obtained through spectroscopic ellipsometry ranged between 2.09 and 2.37 in the wavelength range, 900 nm to 400 nm for the as-deposited sample, and jumped to the range between 2.23 and 2.65 for samples annealed at800°C. The minimum surface reflectance changed from around 0.6% for the as-deposited samples to 2.5% for the samples annealed at800°C.


2013 ◽  
Vol 16 (6) ◽  
pp. 1888-1893
Author(s):  
Di Yang ◽  
Ke Wang ◽  
Yang Cao ◽  
Lei Gao ◽  
Xiao Chen ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document