Structural and optical properties of titanium dioxide films deposited by reactive magnetron sputtering in pure oxygen plasma

2004 ◽  
Vol 95 (11) ◽  
pp. 6011-6016 ◽  
Author(s):  
T. Asanuma ◽  
T. Matsutani ◽  
C. Liu ◽  
T. Mihara ◽  
M. Kiuchi
Keyword(s):  
Titanium Dioxide ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Oxygen Plasma ◽  
Reactive Magnetron Sputtering ◽  
Pure Oxygen ◽  
Reactive Magnetron ◽  
Structural And Optical Properties ◽  
Titanium Dioxide Films

scholarly journals Structural and Optical Properties of TiO2Thin Films Prepared by RF Reactive Magnetron Sputtering

2002 ◽  
Vol 12 (6) ◽  
pp. 452-457
Author(s):  
Gye-Won Gang ◽  
Yeong-Hun Lee ◽  
Jae-Cheon Gwak ◽  
Dong-Gu Lee ◽  
Bong-Gyo Jeong ◽  
...  
Keyword(s):  
Optical Properties ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Structural And Optical Properties

Influence of Sputtering Power on Structural and Optical Properties of Ta2O5 Thin Films Prepared by DC Reactive Magnetron Sputtering

2014 ◽  
Vol 979 ◽  
pp. 431-434 ◽  
Author(s):  
Narong Sangwaranatee ◽  
Mati Horprathum ◽  
Jakrapong Kaewkhao
Keyword(s):  
Thin Films ◽  
Growth Rate ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Maximum Growth ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Structural And Optical Properties ◽  
Sputtering Power ◽  
Dc Reactive Magnetron Sputtering

In this article, amorphous tantalum oxide thin films were deposited by dc reactive magnetron sputtering onto silicon (001) wafer and glass slide substrates. Sputtering power has been varied for optimizing thin film quality. The structural and optical properties of the Ta2O5 thin films were investigated by using X-ray diffraction, UV-Vis spectrophotometer and spectroscopic ellipsometry respectively. The XRD pattern result indicates that the films are amorphous. It was found that the growth rate was also increased with increasing dc power up to 250 W, and the maximum growth rate observed at 250 W was 0.25 nm/s. In addition, the refractive index and packing density of the films increases with increasing dc sputtering power.

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