Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling
2008 ◽
Vol 128
(10)
◽
pp. 668-668
Keyword(s):
2007 ◽
Vol 111
(33)
◽
pp. 12165-12168
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2009 ◽
Vol 133
(8)
◽
pp. 1278-1284