Development of new phenylcalix[4]resorcinarene: its application to positive-tone molecular resist for EB and EUV lithography

2009 ◽  
Author(s):  
Masatoshi Echigo ◽  
Dai Oguro
Keyword(s):  
Euv Lithography

Status of the liquid-xenon-jet laser-plasma source for EUV lithography

2002 ◽  
Author(s):  
Bjoern A. M. Hansson ◽  
Lars Rymell ◽  
Magnus Berglund ◽  
Oscar E. Hemberg ◽  
Emmanuelle Janin ◽  
...  
Keyword(s):  
Laser Plasma ◽  
Plasma Source ◽  
Liquid Xenon ◽  
Euv Lithography

Toward the In Situ Remediation of Carbon Deposition on Ru-Capped Multilayer Mirrors Intended for EUV Lithography:  Exploiting the Electron-Induced Chemistry

2007 ◽  
Vol 111 (33) ◽  
pp. 12165-12168 ◽  
Author(s):  
David J. Davis ◽  
Georgios Kyriakou ◽  
Robert B. Grant ◽  
Mintcho S. Tikhov ◽  
Richard M. Lambert
Keyword(s):  
Carbon Deposition ◽  
In Situ Remediation ◽  
Multilayer Mirrors ◽  
Euv Lithography

Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography

2000 ◽  
Author(s):  
Takeo Watanabe ◽  
Hiroo Kinoshita ◽  
Atsushi Miyafuji ◽  
Shigeo Irie ◽  
Shigeru Shirayone ◽  
...  
Keyword(s):  
Single Layer ◽  
Chemically Amplified ◽  
Euv Lithography

Efficient multi-die placement for blank defect mitigation in EUV lithography

2012 ◽  
Author(s):  
Yuelin Du ◽  
Hongbo Zhang ◽  
Martin D. F. Wong ◽  
Yunfei Deng ◽  
Rasit O. Topaloglu
Keyword(s):  
Euv Lithography

Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography

2012 ◽  
Author(s):  
Junichi Fujimoto ◽  
Tsukasa Hori ◽  
Tatsuya Yanagida ◽  
Takeshi Ohta ◽  
Yasufumi Kawasuji ◽  
...  
Keyword(s):  
Light Source ◽  
Euv Lithography ◽  
Laser Produced Plasma

Multiscale Simulation for Exploring Photo-Chemical Processes to Mitigate the Critical Dimension Variability of Contact Hole in EUV Lithography

2021 ◽  
Author(s):  
Sungwoo Park ◽  
Hyungwoo Lee ◽  
Muyoung Kim ◽  
Taegyeom Kim ◽  
Byunghoon Lee ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Extreme Ultraviolet ◽  
Critical Dimension ◽  
Multiscale Simulation ◽  
Chemical Processes ◽  
Production Yield ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Patterned Surface ◽  
Euv Lithography

In extreme ultraviolet lithography (EUVL), non-uniformity of patterned surface roughness of contact holes results in pattern failures such as bridging- or missing holes, which affect production yield. In this study,...

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