scholarly journals Rigorous imaging-based measurement method of polarization aberration in hyper-numerical aperture projection optics

2021 ◽  
Author(s):  
Yanqiu Li ◽  
Enze Li ◽  
Ke Liu ◽  
Yiyu Sun ◽  
yang liu ◽  
...  
2004 ◽  
Author(s):  
Tetsuya Oshino ◽  
Takahiro Yamamoto ◽  
Tatsuro Miyoshi ◽  
Masayuki Shiraishi ◽  
Takaharu Komiya ◽  
...  

2018 ◽  
Vol 26 (25) ◽  
pp. 32743 ◽  
Author(s):  
Enze Li ◽  
Yanqiu Li ◽  
Naiyuan Sheng ◽  
Tie Li ◽  
Yiyu Sun ◽  
...  

Author(s):  
Tetsuya Oshino ◽  
Shinichi Takahashi ◽  
Takahiro Yamamoto ◽  
Tatsuya Miyoshi ◽  
Masayuki Shiraishi ◽  
...  

2013 ◽  
Vol 552 ◽  
pp. 502-509
Author(s):  
Xiao Lin Liu ◽  
Yan Qiu Li ◽  
Ke Liu ◽  
Li Dong Wei

Small field ArF projection optics for experiment is favorable to the prospective study and key technique development for lithography equipment. An ArF projection optics has been designed with specifications of 0.75 numerical aperture (NA), 100μm image field of view and 40X reduction ratio. The designed composite root-mean-square (RMS) of wave front error of the system can reach 0.03λ (λ=193.29nm). To achieve diffraction limited resolution, the optical manufacture tolerances of this high-NA projection optics are too tight to manufacture, such as radius error within ±0.01%, central thickness within ±2μm and surface figure error less than peak-valley (P-V) of 1/30λ (λ=632.8nm). In this paper, two effective compensatory methods are presented to relax the manufacture tolerances before assembly. One method is re-computation of air spaces including actual measured values of the radii of curvature and center thickness for each element. The second method is rotating lenses to find the best matching manner of measured surface figure. The results show that radius error, central thickness error and surface figure error can be compensated significantly,and the best performance of the projection optics disregarding assembly error has been acquired. The composite wave front error RMS can reach 0.09λ (λ=193.29 nm) after compensation, which is much smaller than 0.25λ before compensation under the same optical manufacture error. Both methods can also be used in development of industrial lithographic projection optics.


2012 ◽  
Vol 49 (8) ◽  
pp. 081201
Author(s):  
唐春晓 Tang Chunxiao ◽  
李恩邦 Li Enbang ◽  
吴亚北 Wu Yabei

Author(s):  
N.S. Allen ◽  
R.D. Allen

Various methods of video-enhanced microscopy combine TV cameras with light microscopes creating images with improved resolution, contrast and visibility of fine detail, which can be recorded rapidly and relatively inexpensively. The AVEC (Allen Video-enhanced Contrast) method avoids polarizing rectifiers, since the microscope is operated at retardations of λ/9- λ/4, where no anomaly is seen in the Airy diffraction pattern. The iris diaphram is opened fully to match the numerical aperture of the condenser to that of the objective. Under these conditions, no image can be realized either by eye or photographically. Yet the image becomes visible using the Hamamatsu C-1000-01 binary camera, if the camera control unit is equipped with variable gain control and an offset knob (which sets a clamp voltage of a D.C. restoration circuit). The theoretical basis for these improvements has been described.


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