scholarly journals Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

Author(s):  
Holger Glatzel ◽  
Dominic Ashworth ◽  
Mark Bremer ◽  
Rodney Chin ◽  
Kevin Cummings ◽  
...  
2007 ◽  
Vol 46 (18) ◽  
pp. 3736 ◽  
Author(s):  
Regina Soufli ◽  
Russell M. Hudyma ◽  
Eberhard Spiller ◽  
Eric M. Gullikson ◽  
Mark A. Schmidt ◽  
...  

2007 ◽  
Vol 46 (9B) ◽  
pp. 6155-6160 ◽  
Author(s):  
Yukinobu Kakutani ◽  
Masahito Niibe ◽  
Yoshio Gomei ◽  
Hiromitsu Takase ◽  
Shigeru Terashima ◽  
...  

1999 ◽  
Author(s):  
Claude Montcalm ◽  
Eberhard A. Spiller ◽  
Marco Wedowski ◽  
Eric M. Gullikson ◽  
James A. Folta

2003 ◽  
Vol 42 (Part 1, No. 9A) ◽  
pp. 5844-5847 ◽  
Author(s):  
Yucong Zhu ◽  
Katsumi Sugisaki ◽  
Katsuhiko Murakami ◽  
Kazuya Ota ◽  
Hiroyuki Kondo ◽  
...  

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