scholarly journals Imaging of electron transition and bond breaking in the photodissociation of H via ultrafast X-ray photoelectron diffraction

2021 ◽  
Vol 29 (7) ◽  
pp. 10893
Author(s):  
Zhaopeng Sun ◽  
Hongbin Yao ◽  
Xianghe Ren ◽  
Yunquan Liu ◽  
Dehua Wang ◽  
...  
Keyword(s):  
Electron Transition ◽  
Bond Breaking ◽  
X Ray ◽  
Photoelectron Diffraction

Substitution sites of Pb and Y in Bi2Sr2Ca1Cu2O8+δ: X-ray photoelectron diffraction as fingerprinting tool

1999 ◽  
Vol 75 (11) ◽  
pp. 1550-1552 ◽  
Author(s):  
Th. Pillo ◽  
J. Hayoz ◽  
P. Schwaller ◽  
H. Berger ◽  
P. Aebi ◽  
...  
Keyword(s):  
X Ray ◽  
Photoelectron Diffraction

Structure of the ZnO(0001) surface studied by X-ray photoelectron diffraction

1994 ◽  
Vol 222 (4) ◽  
pp. 349-352 ◽  
Author(s):  
M. Galeotti ◽  
A. Atrei ◽  
U. Bardi ◽  
G. Rovida ◽  
M. Torrini ◽  
...  
Keyword(s):  
X Ray ◽  
Photoelectron Diffraction

Hard-X-ray Photoelectron Diffraction from Si(001) Covered by a 0–7-nm-Thick SiO2Layer

2010 ◽  
Vol 3 (5) ◽  
pp. 056701 ◽  
Author(s):  
Igor Píš ◽  
Masaaki Kobata ◽  
Tomohiro Matsushita ◽  
Hiroshi Nohira ◽  
Keisuke Kobayashi
Keyword(s):  
X Ray ◽  
Photoelectron Diffraction

The Rh oxide ultrathin film on Rh(100): An x-ray photoelectron diffraction study

2010 ◽  
Vol 133 (21) ◽  
pp. 214701 ◽  
Author(s):  
Rong Rong Zhan ◽  
Erik Vesselli ◽  
Alessandro Baraldi ◽  
Silvano Lizzit ◽  
Giovanni Comelli
Keyword(s):  
Diffraction Study ◽  
Ultrathin Film ◽  
X Ray ◽  
Photoelectron Diffraction ◽  
Rh Oxide

Growth of Transition Metal Films on AL(110) Surfaces

1995 ◽  
Vol 399 ◽  
Author(s):  
R.J. Smith ◽  
Adli A. Saleh ◽  
V. Shutthanandan ◽  
N.R. Shivaparan ◽  
V. Krasemann
Keyword(s):  
High Energy ◽  
Metal Films ◽  
Surface Strain ◽  
The Other ◽  
Photoemission Spectroscopy ◽  
Alloy Formation ◽  
Ion Scattering ◽  
X Ray ◽  
Photoelectron Diffraction ◽  
Ti Films

ABSTRACTThe growth of thin Pd, Ni, Fe and Ti films on Al(110) surfaces has been studied using high-energy ion scattering (HEIS), x-ray photoemission spectroscopy and photoelectron diffraction techniques. Of these four metals, only Ti grows as an epitaxial overlayer, while the other metals mix with the substrate to form surface alloys. In the HEIS experiments the backscattered ion yield from Al surface atoms is measured as a function of metal coverage on the Al surface. A decrease in the Al scattering is observed for Ti deposition while the other metals result in increased Al scattering, attributed to alloy formation. An explanation for the exceptional growth behavior of Ti on Al is provided using a model of surface strain associated with aluminide formation.

Polarity of GaN with polar {0001} and semipolar , , orientations by x-ray photoelectron diffraction

2015 ◽  
Vol 30 (19) ◽  
pp. 2881-2892 ◽  
Author(s):  
Oleksandr Romanyuk ◽  
Petr Jiříček ◽  
Tania Paskova ◽  
Igor Bartoš
Keyword(s):  
X Ray ◽  
Photoelectron Diffraction ◽  
Image Position

Abstract

DICHROISM IN ANGLE-RESOLVED PHOTOEMISSION FROM Pt(111)

2002 ◽  
Vol 09 (02) ◽  
pp. 883-888 ◽  
Author(s):  
G. H. FECHER ◽  
J. BRAUN ◽  
A. OELSNER ◽  
CH. OSTERTAG ◽  
G. SCHÖNHENSE
Keyword(s):  
Circular Dichroism ◽  
Band Structure ◽  
Valence Band ◽  
Single Step ◽  
Core Level ◽  
X Ray ◽  
Photoelectron Diffraction ◽  
Band Emission ◽  
First Results ◽  
Circular Dichroïsm

The angular dependence of the circular dichroism in photoemission from Pt(111) was investigated for excitation with VUV and soft X-ray radiation. VUV excitation was used to probe band structure and the circular dichroism for valence band emission. The measurements are compared to full relativistic single step photoemission calculations. XPS was used to investigate the circular dichroism in emission from the 4f core level. In this case, the dichroism is induced by photoelectron diffraction. First results from single step core level calculations are compared to the experimental observations.

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