scholarly journals Bistable enhanced total reflection in Kretschmann configuration containing a saturable gain medium

2018 ◽  
Vol 26 (5) ◽  
pp. 5253 ◽  
Author(s):  
Haichun Zhou ◽  
Jie Guo ◽  
Kun Xu ◽  
Zhe Li ◽  
Junqi Tang ◽  
...  
Keyword(s):  
Gain Medium ◽  
Total Reflection ◽  
Kretschmann Configuration ◽  
Saturable Gain

NANOSTRUCTURED LB FILMS AND EMISSION LIGHT DUE TO MULTIPLE SURFACE PLASMON EXCITATIONS IN THE KRETSCHMANN CONFIGURATION

2002 ◽  
Vol 01 (05n06) ◽  
pp. 409-414
Author(s):  
FUTAO KANEKO ◽  
MITSURU TERAKADO ◽  
TOSHIHARU SATO ◽  
HIROTSUGI HATAKEYAMA ◽  
WATARU SAITO ◽  
...  
Keyword(s):  
Laser Beam ◽  
Surface Plasmon ◽  
Total Reflection ◽  
Attenuated Total Reflection ◽  
Dye Molecules ◽  
Lb Films ◽  
Langmuir Blodgett ◽  
Kretschmann Configuration ◽  
Direct Irradiation ◽  
Emission Light

Surface plasmon (SP) excitations have been investigated in the attenuated total reflection (ATR) Kretschmann configuration of prism/metal/Langmuir–Blodgett (LB) films containing dyes. The emission light through the prism was observed using direct irradiation of a laser beam from air to the LB films, i.e., reverse irradiation. The emission intensities depend on the emission angles through the prism, nanostructure of metal and LB films, dye molecules, separation between metal and dye molecules, interactions of dye molecules, etc. The spectra is strongly depended on the emission angles, and the emission light was caused by multiple SP excitations. Nanostructured devices of LB films using SP excitations are described.

Used Surface Plasma Wave Measure the Thickness and the Negative Permittivity of Nanometal Film

2013 ◽  
Vol 341-342 ◽  
pp. 971-974
Author(s):  
Rong Jiang ◽  
Zhi Xun Huang ◽  
Nai Cheng Shen ◽  
Xin Meng Liu
Keyword(s):  
Plasma Wave ◽  
Plasma Waves ◽  
Total Reflection ◽  
Attenuated Total Reflection ◽  
Negative Permittivity ◽  
Surface Plasma ◽  
Kretschmann Configuration ◽  
Surface Plasma Waves ◽  
Wave Measure

In this paper we used He-Ne laser with 632.8nm and prism with aurum film to do the experiment, used Kretschmann configuration excite the surface plasma waves (SPW) on the prism with aurum film,and measure the attenuated total reflection (ATR) spectrum. The thickness of the nanofilm and the negative permittivity of the aurum were obtained.

Molecular thin film structure and multiple surface plasmon excitations at nano-interfaces in the attenuated total reflection Kretschmann configuration

2003 ◽  
Vol 438-439 ◽  
pp. 108-113 ◽  
Author(s):  
Futao Kaneko ◽  
Wataru Saito ◽  
Toshiharu Sato ◽  
Hirotsugi Hatakeyama ◽  
Kazunari Shinbo ◽  
...  
Keyword(s):  
Thin Film ◽  
Surface Plasmon ◽  
Film Structure ◽  
Total Reflection ◽  
Attenuated Total Reflection ◽  
Thin Film Structure ◽  
Kretschmann Configuration

Emission Light from Prism/Silver/Molecular Ultrathin Films and Excitations of Multiple Surface Plasmons in ATR Kretschmann Configuration

2001 ◽  
Vol 710 ◽  
Author(s):  
Futao Kaneko ◽  
Takayuki Nakano ◽  
Toshiharu Sato ◽  
Kazunari Shinbo ◽  
Keizo Kato ◽  
...  
Keyword(s):  
Thin Film ◽  
Dispersion Relation ◽  
Surface Plasmons ◽  
Rhodamine B ◽  
Ultrathin Films ◽  
Total Reflection ◽  
Attenuated Total Reflection ◽  
Lb Film ◽  
Kretschmann Configuration ◽  
Emission Light

ABSTRACTEmission light through the prism has been investigated from the Kretschmann configuration of the prism/ Ag thin film/ rhodamine-B (RB) LB film in the resonant excitation of the attenuated total reflection (ATR) measurement. The emission light and the spectra strongly depended upon the emission angles where the light was observed. The emission properties corresponded to the dispersion relation of the resonant excitations of surface plasmons (SPs) in the ATR configuration. It was concluded that the emission light was caused by multiple excitations of SPs in the ATR configuration. It is thought that the phenomenon will be used as a new sensing device.

scholarly journals Tuning Metamaterials for Applications at DUV Wavelengths

2012 ◽  
Vol 2012 ◽  
pp. 1-7
Author(s):  
Andrew Estroff ◽  
Bruce W. Smith
Keyword(s):  
Refractive Index ◽  
Negative Refractive Index ◽  
Total Reflection ◽  
Attenuated Total Reflection ◽  
Interference Lithography ◽  
Structured Materials ◽  
Kretschmann Configuration ◽  
Tunable Metamaterial ◽  
Recent Attention ◽  
Selection Of

The unique properties of metamaterials, namely, their negative refractive index, permittivity, or permeability, have gained much recent attention. Research into these materials has led to the realization of a host of applications that may be useful to enhance optical nanolithography. A selection of materials has been examined both experimentally and theoretically to verify their support of surface plasmons, or lack thereof, in the DUV spectrum via the attenuated total reflection (ATR) method using the Kretschmann configuration. At DUV wavelengths, materials that were previously useful at mid-UV and longer wavelengths no longer act as metamaterials. Structured materials comprised of alternating layers of aluminum and aluminum oxide (Al2O3), as well as some other absorption-free dielectrics, exhibit metamaterial behavior, as do some elemental materials such as aluminum. These elemental and structured materials exhibit the best properties for use in plasmonic nanolithographic applications. Therefore, a simulator was created to examine material and thickness combinations to generate a tunable metamaterial for use in the DUV. A method for performing plasmonic interference lithography with this metamaterial has been proposed, with calculations showing the potential for half-pitch imaging resolution of 25 nm.

Contribution of x-ray total reflection to the background intensity in EPMA

1990 ◽  
Vol 48 (2) ◽  
pp. 202-203
Author(s):  
Werner P. Rehbach ◽  
Peter Karduck
Keyword(s):  
Atomic Number ◽  
Target Material ◽  
Total Reflection ◽  
Background Intensity ◽  
X Rays ◽  
Characteristic Radiation ◽  
X Ray

In the EPMA of soft x rays anomalies in the background are found for several elements. In the literature extremely high backgrounds in the region of the OKα line are reported for C, Al, Si, Mo, and Zr. We found the same effect also for Boron (Fig. 1). For small glancing angles θ, the background measured using a LdSte crystal is significantly higher for B compared with BN and C, although the latter are of higher atomic number. It would be expected, that , characteristic radiation missing, the background IB (bremsstrahlung) is proportional Zn by variation of the atomic number of the target material. According to Kramers n has the value of unity, whereas Rao-Sahib and Wittry proposed values between 1.12 and 1.38 , depending on Z, E and Eo. In all cases IB should increase with increasing atomic number Z. The measured values are in discrepancy with the expected ones.

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