scholarly journals Large area compatible broadband superabsorber surfaces in the VIS-NIR spectrum utilizing metal-insulator-metal stack and plasmonic nanoparticles

2016 ◽  
Vol 24 (16) ◽  
pp. 17644 ◽  
Author(s):  
Sina Abedini Dereshgi ◽  
Ali Kemal Okyay
Keyword(s):  
Plasmonic Nanoparticles ◽  
Large Area ◽  
Metal Insulator ◽  
Metal Insulator Metal

scholarly journals Thermally assisted nanotransfer printing with sub–20-nm resolution and 8-inch wafer scalability

2020 ◽  
Vol 6 (31) ◽  
pp. eabb6462
Author(s):  
Tae Wan Park ◽  
Myunghwan Byun ◽  
Hyunsung Jung ◽  
Gyu Rac Lee ◽  
Jae Hong Park ◽  
...  
Keyword(s):  
Self Assembly ◽  
Transfer Printing ◽  
Combined Method ◽  
Large Area ◽  
Metal Insulator ◽  
Metal Insulator Metal ◽  
Good Pattern ◽  
Ordered Nanostructures ◽  
20 Nm ◽  
Pattern Resolution

Nanotransfer printing (nTP) has attracted considerable attention due to its good pattern resolution, process simplicity, and cost-effectiveness. However, the development of a large-area nTP process has been hampered by critical reliability issues related to the uniform replication and regular transfer printing of functional nanomaterials. Here, we present a very practical thermally assisted nanotransfer printing (T-nTP) process that can easily produce well-ordered nanostructures on an 8-inch wafer via the use of a heat-rolling press system that provides both uniform pressure and heat. We also demonstrate various complex pattern geometries, such as wave, square, nut, zigzag, and elliptical nanostructures, on diverse substrates via T-nTP. Furthermore, we demonstrate how to obtain a high-density crossbar metal-insulator-metal memristive array using a combined method of T-nTP and directed self-assembly. We expect that the state-of-the-art T-nTP process presented here combined with other emerging patterning techniques will be especially useful for the large-area nanofabrication of various devices.

Large Area, Aluminum Metal-Insulator-Metal Infrared Perfect Absorber

2014 ◽  
Author(s):  
Thang Duy Dao ◽  
Kai Chen ◽  
Satoshi Ishii ◽  
Gandham Lakshminarayana ◽  
Akihiko Ohi ◽  
...  
Keyword(s):  
Perfect Absorber ◽  
Large Area ◽  
Metal Insulator ◽  
Aluminum Metal ◽  
Metal Insulator Metal

Smart electrodes for ultralarge-area thin film capacitors

2007 ◽  
Vol 22 (7) ◽  
pp. 1763-1766 ◽  
Author(s):  
Patrick Daniels ◽  
Jon Ihlefeld ◽  
William Borland ◽  
Jon-Paul Maria
Keyword(s):  
Thin Film ◽  
Clean Room ◽  
Large Area ◽  
Metal Insulator ◽  
Insulating Layer ◽  
Thin Film Capacitors ◽  
High Temperature Anneal ◽  
Insulator Film ◽  
Metal Insulator Metal ◽  
Metal Migration

A process suitable for preparing metal-insulator-metal thin film capacitors with submicron insulating layers and top electrodes with cm-scale dimensions is presented. Most importantly, this process does not require sophisticated deposition equipment or a clean room environment. The key to large area yield is co-firing the insulator film with a non-dewetting electrode during the dielectric crystallization/densification anneal. We propose a mechanism of electrode dewetting during the high temperature anneal where the metal laterally retreats from geometric asperities that compromise the integrity of the insulating layer. This behavior is driven by surface energy minimization, which promotes metal migration away from the regions of high curvature. This methodology is not material specific, and only requires a top electrode with a large contact angle to the dielectric in question. Using this technique, functional thin film capacitors with 2.5 cm lateral dimensions and 1 μm dielectric thicknesses can be routinely prepared.

Modeling, Fabrication, and Electrical Testing of Metal-Insulator-Metal Diode

2011 ◽  
Author(s):  
Terrance O'Regan ◽  
Matthew Chin ◽  
Cheng Tan ◽  
Anthony Birdwell
Keyword(s):  
Metal Insulator ◽  
Metal Insulator Metal

scholarly journals Hyperspectral Molecular Orientation Mapping in Metamaterials

2021 ◽  
Vol 11 (4) ◽  
pp. 1544
Author(s):  
Meguya Ryu ◽  
Yoshiaki Nishijima ◽  
Shinya Morimoto ◽  
Naoki To ◽  
Tomoki Hashizume ◽  
...  
Keyword(s):  
Molecular Orientation ◽  
Field Enhancement ◽  
Chemical Mapping ◽  
Metal Insulator ◽  
Orientation Mapping ◽  
Metal Insulator Metal ◽  
Finger Printing ◽  
Thermal Emitter ◽  
Ir Bands ◽  
Sub Wavelength

The four polarisation method is adopted for measurement of molecular orientation in dielectric nanolayers of metal-insulator-metal (MIM) metamaterials composed of gold nanodisks on polyimide and gold films. Hyperspectral mapping at the chemical finger printing spectral range of 4–20 μμm was carried out for MIM patterns of 1–2.5 μμm period (sub-wavelength). Overlay images taken at 0,π4,π2,3π4 orientation angles and subsequent baseline compensation are shown to be critically important for the interpretation of chemical mapping results and reduction of spurious artefacts. Light field enhancement in the 60-nm-thick polyimide (I in MIM) was responsible for strong absorption at the characteristic polyimide bands. Strong absorbance A at narrow IR bands can be used as a thermal emitter (emittance E=1−R), where R is the reflectance and A=1−R−T, where for optically thick samples the transmittance is T=0.

Nonstoichiometric Nanolayered Ni/NiO/Al2O3/CrAu Metal–Insulator–Metal Infrared Rectenna

2021 ◽  
Vol 4 (3) ◽  
pp. 2470-2475 ◽  
Author(s):  
Ayendra Weerakkody ◽  
Amina Belkadi ◽  
Garret Moddel
Keyword(s):  
Metal Insulator ◽  
Metal Insulator Metal

scholarly journals Design of a Liquid-Crystal-Tunable Terahertz Demultiplexer Based on a Metal-Insulator-Metal Waveguide

2019 ◽  
Vol 9 (4) ◽  
pp. 644
Author(s):  
Xue-Shi Li ◽  
Naixing Feng ◽  
Yuan-Mei Xu ◽  
Liang-Lun Cheng ◽  
Qing Liu
Keyword(s):  
Liquid Crystal ◽  
Electric Field ◽  
Metal Insulator ◽  
Resonance Modes ◽  
External Bias ◽  
Bias Electric Field ◽  
Metal Waveguide ◽  
Metal Insulator Metal ◽  
Fabry Perot ◽  
Mim Waveguide

A tunable demultiplexer with three output channels infiltrated by liquid crystal (LC) is presented, which is based on a metal-insulator-metal (MIM) waveguide. The operating frequencies of the three output channels can be tuned simultaneously at will by changing the external bias electric field applied to the LC. By analyzing the Fabry-Pérot (FP) resonance modes of the finite-length MIM waveguide both theoretically and numerically, the locations of the three channels are delicately determined to achieve the best demultiplexing effects. Terahertz (THz) signals input from the main channel can be demultiplexed by channels 1, 2 and 3 at 0.7135 THz, 1.068 THz and 1.429 THz, respectively. By applying an external electric field to alter the tilt angle of the infiltrating LC material, the operating frequencies of channels 1, 2 and 3 can be relatively shifted up to 12.3%, 9.6% and 9.7%, respectively. The designed demultiplexer can not only provide a flexible means to demultiplex signals but also tune operating bands of output channels at the same time.

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