scholarly journals Digitally tunable holographic lithography using a spatial light modulator as a programmable phase mask

2013 ◽  
Vol 21 (22) ◽  
pp. 26227 ◽  
Author(s):  
J. Lutkenhaus ◽  
D. George ◽  
M. Moazzezi ◽  
U. Philipose ◽  
Y. Lin
2010 ◽  
Vol 57 (10) ◽  
pp. 893-900 ◽  
Author(s):  
G. Carles ◽  
G. Muyo ◽  
S. Bosch ◽  
A.R. Harvey

2012 ◽  
Vol 2012 ◽  
pp. 1-6
Author(s):  
Sunil Vyas

Generation of optical vortices using linear phase ramps is experimentally demonstrated. When two regions of a wavefront have opposite phase gradients then along the line of phase discontinuity vortices can be generated. It is shown that vortices can evolve during propagation even with the unequal magnitude of tilt in the two regions of the wavefront. The number of vortices and their location depend upon the magnitude of tilt. vortex generation is experimentally realized by encoding phase mask on spatial light modulator and their presence is detected interferometrically. Numerical simulation has been performed to calculate the diffracted intensity distribution from the phase mask, and presence of vortices in the diffracted field is detected by computational techniques.


2014 ◽  
Author(s):  
Jeff Lutkenhaus ◽  
David George ◽  
Bayaner Arigong ◽  
Hualiang Zhang ◽  
Usha Philipose ◽  
...  

2013 ◽  
Vol 114 (21) ◽  
pp. 213102 ◽  
Author(s):  
Kris Ohlinger ◽  
Jeff Lutkenhaus ◽  
Bayaner Arigong ◽  
Hualiang Zhang ◽  
Yuankun Lin

Author(s):  
Nathan J. Jenness ◽  
Daniel G. Cole ◽  
Robert L. Clark

In this paper we present a lithographic process with the ability to automatically translate and arbitrarily position three-dimensional (3D) computer-generated patterns through the use of phase holograms. This method, dynamic maskless holographic lithography (DMHL), advances current photo-directed patterning and functionalization capabilities by expanding the capability to manipulate light in real-time without the use of expensive fixed masks. The system could be used for large-scale parallel manufacturing over larger areas and for point specific serial fabrication, interrogation, and metrology. The use of coherent illumination allows for the direct creation of 3D patterns of light for lithography as opposed to the mechanical stage, layer-by-layer 3D fabrication approach typical of direct-write systems. Extrinsic control over interfacial properties will provide a method for addressing aqueous phase bionanotechnolgy experimental systems in which detection, separation, transport, and handling are vital.


2015 ◽  
Vol 54 (29) ◽  
pp. 8587 ◽  
Author(s):  
Sharon V. King ◽  
Ana Doblas ◽  
Nurmohammed Patwary ◽  
Genaro Saavedra ◽  
Manuel Martínez-Corral ◽  
...  

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