scholarly journals Maskless lithography using silicon oxide etch-stop layer induced by megahertz repetition femtosecond laser pulses

2011 ◽  
Vol 19 (11) ◽  
pp. 10834 ◽  
Author(s):  
Amirkianoosh Kiani ◽  
Krishnan Venkatakrishnan ◽  
Bo Tan ◽  
Venkat Venkataramanan
Keyword(s):  
Femtosecond Laser ◽  
Silicon Oxide ◽  
Laser Pulses ◽  
Femtosecond Laser Pulses ◽  
Maskless Lithography ◽  
Etch Stop ◽  
Etch Stop Layer

scholarly journals Maskless Lithography Using Silicon Oxide Etch-Stop Layer Induced by Megahertz Repetition Femtosecond Laser Pulses

2021 ◽  
Author(s):  
Amirkianoosh Kiani ◽  
Krishnan Venkatakrishnan ◽  
Bo Tan ◽  
Venkat Venkataramanan
Keyword(s):  
Femtosecond Laser ◽  
Thin Layer ◽  
Silicon Oxide ◽  
Laser Pulses ◽  
Femtosecond Laser Pulses ◽  
Maskless Lithography ◽  
Silicon Oxide Layer ◽  
X Ray ◽  
Etch Stop ◽  
Etch Stop Layer

In this study we report a new method for maskless lithography fabrication process by a combination of direct silicon oxide etch-stop layer patterning and wet alkaline etching. A thin layer of etch-stop silicon oxide of predetermined pattern was first generated by irradiation with high repetition (MHz) ultrafast (femtosecond) laser pulses in air and at atmospheric pressure. The induced thin layer of silicon oxide is used as an etch stop during etching process in alkaline etchants such as KOH. Our proposed method has the potential to enable low-cost, flexible, high quality patterning for a wide variety of application in the field of micro- and nanotechnology, this technique can be leading to a promising solution for maskless lithography technique. A Scanning Electron Microscope (SEM), optical microscopy, Micro-Raman, Energy Dispersive X-ray (EDX) and X-ray diffraction spectroscopy were used to analyze the silicon oxide layer induced by laser pulses.

scholarly journals Fabrication of Periodic Nanostructures on Silicon Suboxide Films with Plasmonic Near-Field Ablation Induced by Low-Fluence Femtosecond Laser Pulses

Nanomaterials ◽  
2020 ◽  
Vol 10 (8) ◽  
pp. 1495
Author(s):  
Tatsuyoshi Takaya ◽  
Godai Miyaji ◽  
Issei Takahashi ◽  
Lukas Janos Richter ◽  
Jürgen Ihlemann
Keyword(s):  
Optical Absorption ◽  
Femtosecond Laser ◽  
Absorption Coefficient ◽  
Silicon Oxide ◽  
Near Field ◽  
Laser Pulses ◽  
Femtosecond Laser Pulses ◽  
Fused Silica ◽  
Optical Absorption Coefficient ◽  
Silicon Suboxide

Silicon suboxide (SiOx, x ≈ 1) is a substoichiometric silicon oxide with a large refractive index and optical absorption coefficient that oxidizes to silica (SiO2) by annealing in air at ~1000 °C. We demonstrate that nanostructures with a groove period of 200–330 nm can be formed in air on a silicon suboxide film with 800 nm, 100 fs, and 10 Hz laser pulses at a fluence an order of magnitude lower than that needed for glass materials such as fused silica and borosilicate glass. Experimental results show that high-density electrons can be produced with low-fluence femtosecond laser pulses, and plasmonic near-fields are subsequently excited to create nanostructures on the surface because silicon suboxide has a larger optical absorption coefficient than glass. Calculations using a model target reproduce the observed groove periods well and explain the mechanism of the nanostructure formation.

Silicon Surface Morphologies after Femtosecond Laser Irradiation

MRS Bulletin ◽  
2006 ◽  
Vol 31 (8) ◽  
pp. 626-633 ◽  
Author(s):  
Brian R. Tull ◽  
James E. Carey ◽  
Eric Mazur ◽  
Joel P. McDonald ◽  
Steven M. Yalisove
Keyword(s):  
Femtosecond Laser ◽  
Silicon Surface ◽  
Sulfur Hexafluoride ◽  
Silicon Oxide ◽  
Single Crystal Silicon ◽  
Laser Pulses ◽  
Femtosecond Laser Pulses ◽  
Femtosecond Laser Irradiation ◽  
Crystal Silicon ◽  
Surface Morphologies

AbstractIn this article, we present summaries of the evolution of surface morphology resulting from the irradiation of single-crystal silicon with femtosecond laser pulses. In the first section, we discuss the development of micrometer-sized cones on a silicon surface irradiated with hundreds of femtosecond laser pulses in the presence of sulfur hexafluoride and other gases. We propose a general formation mechanism for the surface spikes. In the second section, we discuss the formation of blisters or bubbles at the interface between a thermal silicon oxide and a silicon surface after irradiation with one or more femtosecond laser pulses. We discuss the physical mechanism for blister formation and its potential use as channels in microfluidic devices.

Inorganic-organic Hybrid Materials for Real 3-D Sub-νm Lithography

2003 ◽  
Vol 780 ◽  
Author(s):  
R. Houbertz ◽  
J. Schulz ◽  
L. Fröhlich ◽  
G. Domann ◽  
M. Popall ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Sol Gel ◽  
Laser Pulses ◽  
Femtosecond Laser Pulses ◽  
Hybrid Polymer ◽  
Organic Hybrid ◽  
Two Photon ◽  
Applied Technology ◽  
Scale Structures ◽  
Sol Gel Synthesis

AbstractReal 3-D sub-νm lithography was performed with two-photon polymerization (2PP) using inorganic-organic hybrid polymer (ORMOCER®) resins. The hybrid polymers were synthesized by hydrolysis/polycondensation reactions (modified sol-gel synthesis) which allows one to tailor their material properties towards the respective applications, i.e., dielectrics, optics or passivation. Due to their photosensitive organic functionalities, ORMOCER®s can be patterned by conventional photo-lithography as well as by femtosecond laser pulses at 780 nm. This results in polymerized (solid) structures where the non-polymerized parts can be removed by conventional developers.ORMOCER® structures as small as 200 nm or even below were generated by 2PP of the resins using femtosecond laser pulses. It is demonstrated that ORMOCER®s have the potential to be used in components or devices built up by nm-scale structures such as, e.g., photonic crystals. Aspects of the materials in conjunction to the applied technology are discussed.

Ablation of metals with femtosecond laser pulses

2001 ◽  
Author(s):  
K. H. Leong ◽  
T. Y. Plew ◽  
R. L. Maynard ◽  
A. A. Said ◽  
L. A. Walker
Keyword(s):  
Femtosecond Laser ◽  
Laser Pulses ◽  
Femtosecond Laser Pulses

Picosecond Single-Photon and Femtosecond Two-Photon Pulsed Laser Stimulation for IC Characterization and Failure Analysis

2009 ◽  
Author(s):  
V. Pouget ◽  
E. Faraud ◽  
K. Shao ◽  
S. Jonathas ◽  
D. Horain ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Single Photon ◽  
Pulsed Laser ◽  
Laser Pulses ◽  
Femtosecond Laser Pulses ◽  
Ultrashort Laser Pulses ◽  
Laser Stimulation ◽  
Two Photon ◽  
Resolution Improvement ◽  
Ultrashort Laser

Abstract This paper presents the use of pulsed laser stimulation with picosecond and femtosecond laser pulses. We first discuss the resolution improvement that can be expected when using ultrashort laser pulses. Two case studies are then presented to illustrate the possibilities of the pulsed laser photoelectric stimulation in picosecond single-photon and femtosecond two-photon modes.

Storing energy in lithium fluoride crystals irradiated with femtosecond laser pulses

2016 ◽  
Vol 80 (1) ◽  
pp. 85-88 ◽  
Author(s):  
V. P. Dresvyanskiy ◽  
M. A. Moiseeva ◽  
A. V. Kuznetsov ◽  
D. S. Glazunov ◽  
B. Chadraa ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Lithium Fluoride ◽  
Laser Pulses ◽  
Femtosecond Laser Pulses ◽  
Fluoride Crystals
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