Optical properties of ion-implanted Si by cw CO2 laser annealing

1982 ◽  
Author(s):  
Yuan-Heng Li
Keyword(s):  
Optical Properties ◽  
Co2 Laser ◽  
Laser Annealing ◽  
Cw Co2 Laser ◽  
Ion Implanted

Front and back surface cw CO2-laser annealing of arsenic ion-implanted silicon

1980 ◽  
Vol 23 (2) ◽  
pp. 163-168 ◽  
Author(s):  
S. C. Tsou ◽  
P. H. Tsien ◽  
M. Takai ◽  
D. Röschenthaler ◽  
M. Ramin ◽  
...  
Keyword(s):  
Co2 Laser ◽  
Laser Annealing ◽  
Back Surface ◽  
Cw Co2 Laser ◽  
Ion Implanted

Pulsed excimer and CO2 laser annealing of ion‐implanted silicon

1985 ◽  
Vol 3 (4) ◽  
pp. 1836-1838 ◽  
Author(s):  
J. Narayan ◽  
R. B. James ◽  
O. W. Holland ◽  
M. J. Aziz
Keyword(s):  
Co2 Laser ◽  
Laser Annealing ◽  
Ion Implanted

Effect of laser annealing using high repetition rate pulsed laser on optical properties of phosphorus-ion-implanted ZnO nanorods

2013 ◽  
Vol 114 (2) ◽  
pp. 625-629
Author(s):  
Tetsuya Shimogaki ◽  
Taihei Ofuji ◽  
Norihiro Tetsuyama ◽  
Kota Okazaki ◽  
Mitsuhiro Higashihata ◽  
...  
Keyword(s):  
Optical Properties ◽  
Repetition Rate ◽  
Laser Annealing ◽  
Zno Nanorods ◽  
Pulsed Laser ◽  
High Repetition Rate ◽  
High Repetition ◽  
Ion Implanted

scholarly journals CW CO2-LASER ANNEALING AND ALLOYING OF SEMICONDUCTORS

1982 ◽  
Vol 31 (8) ◽  
pp. 1038
Author(s):  
ZOU SHI-CHANG ◽  
LIN CHENG-LU
Keyword(s):  
Co2 Laser ◽  
Laser Annealing ◽  
Cw Co2 Laser

CO2 laser annealing of ion–implanted silicon

1979 ◽  
Author(s):  
G. K. Celler ◽  
R. Borutta ◽  
W. L. Brown ◽  
J. M. Poate ◽  
G. A. Rozgonyi ◽  
...  
Keyword(s):  
Co2 Laser ◽  
Laser Annealing ◽  
Ion Implanted

Effect of High Repetition Pulsed Laser Annealing on Optical Properties of Phosphorus Ion-Implanted ZnO Nanorods

2013 ◽  
Vol 699 ◽  
pp. 383-386
Author(s):  
Tetsuya Shimogaki ◽  
Taihei Ofuji ◽  
Norihiro Tetsuyama ◽  
Kota Okazaki ◽  
Mitsuhiro Higashihata ◽  
...  
Keyword(s):  
Optical Properties ◽  
Ion Implantation ◽  
Repetition Rate ◽  
Laser Annealing ◽  
Zno Nanorods ◽  
Pulsed Laser ◽  
High Repetition ◽  
Pulsed Laser Annealing ◽  
Krf Excimer Laser ◽  
Ion Implanted

We report on the effect of high repetition pulsed laser annealing with a KrF excimer laser on the optical properties of phosphorus ion-implanted ZnO nanorods. The recovery levels of phosphorus ion-implanted ZnO nanorods have been measured by photoluminescence spectra and cathode luminescence (CL) images. After ion implantation on the surface of ZnO nanorods, CL was disappeared over 400 nm below the surface due to the damage caused by ion implantation. When the annealing was performed at a low repetition, CL was recovered only shallow area below the surface. The depth of the annealed area was increased with the repetition rate of the annealing laser. By optimizing the annealing conditions such as the repetition rate, the irradiation fluence and so on, we have succeeded to anneal the whole damaged area over 400 nm in depth and to observe CL. Thus, the effectiveness of high repetition pulsed laser annealing on phosphorus ion-implanted ZnO nanorods was demonstrated.

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