Tunable ultrahigh spectral brightness ArF* excimer laser source

1981 ◽  
Author(s):  
H. Egger ◽  
T. Srinivasan ◽  
K. Hohla ◽  
H. Scheingraber ◽  
C. R. Vidal ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Source ◽  
Spectral Brightness ◽  
Arf Excimer Laser

A tunable, ultrahigh‐spectral‐brightness ArF* excimer laser source

1981 ◽  
Vol 39 (1) ◽  
pp. 37-39 ◽  
Author(s):  
H. Egger ◽  
T. Srinivasan ◽  
K. Hohla ◽  
H. Scheingraber ◽  
C. R. Vidal ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Source ◽  
Spectral Brightness ◽  
Arf Excimer Laser

Tunable ultrahigh spectral brightness ArF* excimer laser source

1981 ◽  
Vol 17 (12) ◽  
pp. 2466-2466
Author(s):  
H. Egger ◽  
T. Srinivasan ◽  
K. Hohla ◽  
H. Scheingraber ◽  
C. Vidal ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Source ◽  
Spectral Brightness ◽  
Arf Excimer Laser

A tunable, ultrahigh spectral brightness KrF* excimer laser source

1980 ◽  
Vol 36 (6) ◽  
pp. 391-392 ◽  
Author(s):  
R. T. Hawkins ◽  
H. Egger ◽  
J. Bokor ◽  
C. K. Rhodes
Keyword(s):  
Excimer Laser ◽  
Laser Source ◽  
Spectral Brightness ◽  
Krf Excimer Laser

Tunable ArF* excimer-laser source

1981 ◽  
Vol 6 (6) ◽  
pp. 293 ◽  
Author(s):  
J. C. White ◽  
J. Bokor ◽  
R. R. Freeman ◽  
D. Henderson
Keyword(s):  
Excimer Laser ◽  
Laser Source ◽  
Arf Excimer Laser

Narrow-linewidth tunable ArF* excimer-laser source

1981 ◽  
Vol 17 (12) ◽  
pp. 2434-2434
Author(s):  
J. White ◽  
J. Bokor ◽  
R. Freeman
Keyword(s):  
Excimer Laser ◽  
Laser Source ◽  
Narrow Linewidth ◽  
Arf Excimer Laser

Picosecond, tunable ArF* excimer laser source

1982 ◽  
Vol 41 (11) ◽  
pp. 1032-1034 ◽  
Author(s):  
H. Egger ◽  
T. S. Luk ◽  
K. Boyer ◽  
D. F. Muller ◽  
H. Pummer ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Source ◽  
Arf Excimer Laser

Narrow-linewidth tunable ArF* excimer- laser source

1981 ◽  
Author(s):  
J. C. White ◽  
J. Bokor ◽  
R. R. Freeman
Keyword(s):  
Excimer Laser ◽  
Laser Source ◽  
Narrow Linewidth ◽  
Arf Excimer Laser

High Resolution Displacement of Functional Groups onto Fluorocarbon Resin Surface by Using ArF Excimer Laser

1996 ◽  
Vol 451 ◽  
Author(s):  
T. Shimizu ◽  
M. Murahara
Keyword(s):  
Contact Angle ◽  
High Resolution ◽  
Laser Beam ◽  
Thin Layer ◽  
Functional Groups ◽  
Excimer Laser ◽  
Laser Fluence ◽  
Large Area ◽  
Three Solutions ◽  
Arf Excimer Laser

ABSTRACTA Fluorocarbon resin surface was selectively modified by irradiation with a ArF laser beam through a thin layer of NaAlO2, B(OH)3, or H2O solution to give a hydrophilic property. As a result, with low fluence, the surface was most effectively modified with the NaAlO2 solution among the three solutions. However, the contact angle in this case changed by 10 degrees as the fluence changed only 1mJ/cm2. When modifying a large area of the surface, high resolution displacement could not be achieved because the laser beam was not uniform in displacing functional groups. Thus, the laser fluence was successfully made uniform by homogenizing the laser beam; the functional groups were replaced on the fluorocarbon resin surface with high resolution, which was successfully modified to be hydrophilic by distributing the laser fluence uniformly.

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