Fast Diffusion of Water Molecules into Chemically Modified SiO2 Films Formed by Chemical Vapor Deposition

2012 ◽  
Vol 41 (1) ◽  
pp. 60-61
Author(s):  
Atsushi Ohtake ◽  
Kinya Kobayashi ◽  
Syuhei Kurokawa ◽  
Osamu Ohnishi ◽  
Toshiro Doi
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Water Molecules ◽  
Fast Diffusion ◽  
Sio2 Films ◽  
Chemically Modified

Chemical vapor deposition of SiO2 films by TEOS/O2 supermagnetron plasma

Vacuum ◽  
2004 ◽  
Vol 76 (1) ◽  
pp. 19-22 ◽  
Author(s):  
Haruhisa Kinoshita ◽  
Toichi Murakami ◽  
Fumihiko Fukushima
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Sio2 Films

Low Temperature Nitridatio of SiO2 Films using a Catalytic-CVD System

2000 ◽  
Vol 611 ◽  
Author(s):  
Akira Izumi ◽  
Hidekazu Sato ◽  
Hideki Matsumura
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Photoelectron Spectroscopy ◽  
Chemical Vapor ◽  
Catalytic Decomposition ◽  
Catalytic Chemical Vapor Deposition ◽  
Sio2 Films ◽  
X Ray

ABSTRACTThis paper reports a procedure for low-temperature nitridation of silicon dioxide (SiO2) surfaces using species produced by catalytic decomposition of NH3 on heated tungsten in catalytic chemical vapor deposition (Cat-CVD) system. The surface of SiO2/Si(100) was nitrided at temperatures as low as 200°C. X-ray photoelectron spectroscopy measurements revealed that incorporated N atoms are bound to Si atoms and O atoms and located top-surface of SiO2.

A soft Plasma Enhanced-Chemical Vapor Deposition process for the tailored synthesis of SiO2 films

2008 ◽  
Vol 516 (21) ◽  
pp. 7393-7399 ◽  
Author(s):  
Davide Barreca ◽  
Alberto Gasparotto ◽  
Chiara Maccato ◽  
Eugenio Tondello ◽  
Gilberto Rossetto
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Chemical Vapor Deposition Process ◽  
Sio2 Films ◽  
Vapor Deposition Process

Preparation of low dielectric constant F‐doped SiO2 films by plasma enhanced chemical vapor deposition

1996 ◽  
Vol 68 (6) ◽  
pp. 832-834 ◽  
Author(s):  
Sang Woo Lim ◽  
Yukihiro Shimogaki ◽  
Yoshiaki Nakano ◽  
Kunio Tada ◽  
Hiroshi Komiyama
Keyword(s):  
Dielectric Constant ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Dielectric Constant ◽  
Sio2 Films ◽  
Low Dielectric

Mechanical Stress in SiO2 Films Obtained by Remote Plasma‐Enhanced Chemical Vapor Deposition

1993 ◽  
Vol 140 (2) ◽  
pp. 564-567 ◽  
Author(s):  
D. Temple ◽  
A. Reisman ◽  
G. G. Fountain ◽  
M. Walters ◽  
S. V. Hattangady
Keyword(s):  
Chemical Vapor Deposition ◽  
Mechanical Stress ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Remote Plasma ◽  
Sio2 Films
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