Size-tuning and Optical Properties of High-quality CdSe Nanoparticles Synthesized from Cadmium Stearate

2005 ◽  
Vol 34 (7) ◽  
pp. 1004-1005 ◽  
Author(s):  
Toshiharu Teranishi ◽  
Masami Nishida ◽  
Masayuki Kanehara
2021 ◽  
Vol 127 ◽  
pp. 105690
Author(s):  
A. Sáenz-Trevizo ◽  
D. Kuchle-Mena ◽  
P. Pizá-Ruiz ◽  
P. Amézaga-Madrid ◽  
O. Solís-Canto ◽  
...  

1994 ◽  
Vol 348 ◽  
Author(s):  
N.V. Kilassen

ABSTRACTThe studies of the dependence of the optical properties of various scintillators on intrinsic structural defects have been reviewed. The greater part of the review is devoted to the defects introduced by plastic deformation. A wide range of variations in the light output, spectral distribution, kinetics and other properties has been observed. These defects can be induced during crystal growth, annealing, processing, etc. The proper regulation of the superstructure of intrinsic defects can ensure the production of high quality scintillators having required properties.


2004 ◽  
Vol 809 ◽  
Author(s):  
Yves Chriqui ◽  
Ludovic Largeau ◽  
Gilles Patriarche ◽  
Guillaume Saint-Girons ◽  
Sophie Bouchoule ◽  
...  

ABSTRACTOne of the major challenges during recent years was to achieve the compatibility of III-V semiconductor epitaxy on silicon substrates to combine opto-electronics with high speed circuit technology. However, the growth of high quality epitaxial GaAs on Si is not straightforward due to the intrinsic differences in lattice parameters and thermal expansion coefficients of the two materials. Moreover, antiphase boundaries (APBs) appear that are disadvantageous for the fabrication of light emitting devices. Recently the successful fabrication of high quality germanium layers on exact (001) Si by chemical vapor deposition (CVD) was reported. Due to the germanium seed layer the lattice parameter is matched to the one of GaAs providing for excellent conditions for the subsequent GaAs growth. We have studied the material morphology of GaAs grown on Ge/Si PS using atomic layer epitaxy (ALE) at the interface between Ge and GaAs. We present results on the reduction of APBs and dislocation density on (001) Ge/Si PS when ALE is applied. The ALE allows the reduction of the residual dislocation density in the GaAs layers to 105 cm−2 (one order of magnitude as compared to the dislocation density of the Ge/Si PS). The optical properties are improved (ie. increased photoluminescence intensity). Using ALE, light emitting diodes based on strained InGaAs/GaAs quantum well as well as of In(Ga)As quantum dots on an exactly oriented (001) Ge/Si pseudo-substrate were fabricated and characterized.


2021 ◽  
Author(s):  
Yubin Kang ◽  
Haolin li ◽  
Jilong Tang ◽  
Huimin Jia ◽  
Xiaobing Hou ◽  
...  

2010 ◽  
Vol 26 (03) ◽  
pp. 691-694
Author(s):  
ZHAO Hui-Ling ◽  
◽  
◽  
SHEN Huai-Bin ◽  
WANG Hong-Zhe ◽  
...  

Nanomaterials ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 863 ◽  
Author(s):  
Owen Kendall ◽  
Pierce Wainer ◽  
Steven Barrow ◽  
Joel van Embden ◽  
Enrico Della Gaspera

Fluorine-doped tin oxide (FTO) is one of the most studied and established materials for transparent electrode applications. However, the syntheses for FTO nanocrystals are currently very limited, especially for stable and well-dispersed colloids. Here, we present the synthesis and detailed characterization of FTO nanocrystals using a colloidal heat-up reaction. High-quality SnO2 quantum dots are synthesized with a tuneable fluorine amount up to ~10% atomic, and their structural, morphological and optical properties are fully characterized. These colloids show composition-dependent optical properties, including the rise of a dopant-induced surface plasmon resonance in the near infrared.


1986 ◽  
Vol 2 (6) ◽  
pp. 501-505 ◽  
Author(s):  
M.-E. Pistol ◽  
S. Nilsson ◽  
P. Silverberg ◽  
L. Samuelson ◽  
M. Rask ◽  
...  

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