Preparation of ZnO Films by Low-pressure Organometallic Chemical Vapor Deposition

1993 ◽  
Vol 22 (12) ◽  
pp. 2133-2136 ◽  
Author(s):  
Kenkichiro Kobayashi ◽  
Toshihiro Matsubara ◽  
Shigenori Matsushima ◽  
Gengi Okada
1995 ◽  
Vol 266 (2) ◽  
pp. 106-109 ◽  
Author(s):  
K. Kobayashi ◽  
T. Matsubara ◽  
S. Matsushima ◽  
S. Shirakata ◽  
S. Isomura ◽  
...  

1993 ◽  
Vol 235 (1-2) ◽  
pp. 20-21 ◽  
Author(s):  
Kenkichiro Kobayashi ◽  
Toshihiro Matsubara ◽  
Shigenori Matsushima ◽  
Gengi Okada

1989 ◽  
Vol 169 ◽  
Author(s):  
J. M. Zhang ◽  
H. O Marcy ◽  
L .M. Tonge ◽  
B. W. Wessels ◽  
T. J. Marks ◽  
...  

AbstractFilms of the high‐Tc undoped and Pb‐doped Bi‐Sr‐Ca‐Cu‐O (BSCCO) superconductors have been prepared by low pressure organometallic chemical vapor deposition (OMCVD) using the volatile metal‐organic precursors Cu(acetylacetonate)2, Sr(dipivaloylmethanate)2, Ca(dipivaloylmethanate)2, and triphenyl bismuth. Factors which influence texture and morphology of the OMCVD‐derived films have been investigated, including the effects of annealing, doping, and substrates.


2003 ◽  
Vol 42 (Part 1, No. 4B) ◽  
pp. 2291-2295 ◽  
Author(s):  
Bao-Ping Zhang ◽  
Le-Hong Manh ◽  
Katsuki Wakatsuki ◽  
Tsuyoshi Ohnishi ◽  
Mikk Lippmaa ◽  
...  

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