Nitrogen‐doped ZnSe with selenium‐rich growth by low‐pressure organometallic chemical vapor deposition

1994 ◽  
Vol 75 (12) ◽  
pp. 7821-7824 ◽  
Author(s):  
M. K. Lee ◽  
M. Y. Yeh ◽  
S. J. Guo ◽  
H. D. Huang
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Nitrogen Doped ◽  
Organometallic Chemical Vapor Deposition

High‐Tc Undoped and Pb‐Doped BI‐SR‐CA‐CU‐O thin Films Prepared by Organometallic Chemical Vapor Deposition

1989 ◽  
Vol 169 ◽  
Author(s):  
J. M. Zhang ◽  
H. O Marcy ◽  
L .M. Tonge ◽  
B. W. Wessels ◽  
T. J. Marks ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
High Tc ◽  
Metal Organic ◽  
Organic Precursors ◽  
Organometallic Chemical Vapor Deposition

AbstractFilms of the high‐Tc undoped and Pb‐doped Bi‐Sr‐Ca‐Cu‐O (BSCCO) superconductors have been prepared by low pressure organometallic chemical vapor deposition (OMCVD) using the volatile metal‐organic precursors Cu(acetylacetonate)2, Sr(dipivaloylmethanate)2, Ca(dipivaloylmethanate)2, and triphenyl bismuth. Factors which influence texture and morphology of the OMCVD‐derived films have been investigated, including the effects of annealing, doping, and substrates.

Preparation of ZnO Films by Low-pressure Organometallic Chemical Vapor Deposition

1993 ◽  
Vol 22 (12) ◽  
pp. 2133-2136 ◽  
Author(s):  
Kenkichiro Kobayashi ◽  
Toshihiro Matsubara ◽  
Shigenori Matsushima ◽  
Gengi Okada
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Zno Films ◽  
Organometallic Chemical Vapor Deposition

Low pressure organometallic chemical vapor deposition of high-Tc superconducting YBa2Cu3O7−δ films

1989 ◽  
Vol 69 (2) ◽  
pp. 187-189 ◽  
Author(s):  
Jing Zhao ◽  
Klaus-Hermann Dahmen ◽  
Henry O. Marcy ◽  
Lauren M. Tonge ◽  
Bruce W. Wessels ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
High Tc ◽  
Organometallic Chemical Vapor Deposition
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