Prism-Based Laser Interference Lithography System for Simple Multibeam Interference Lithography

2020 ◽  
Vol 12 (3) ◽  
pp. 398-402
Author(s):  
Jun Han Park ◽  
Dan Hee Yun ◽  
Yong Won Ma ◽  
Cheong Yeol Gwak ◽  
Bo Sung Shin
Keyword(s):  
Optical Fibers ◽  
Optical System ◽  
Beam Splitter ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Precise Control ◽  
Multibeam Interference ◽  
Line Patterns ◽  
Lithography System

Laser interference lithography is a powerful technique of subwavelength-scale patterning. However, this technique requires a complicated optical system, the precise control and complexity of which increases exponentially with increasing number of beams. In this study, a compact prism-based laser interference lithography system using optical fibers and a prism was proposed to simplify the technique. In this system, the beam splitter and mirrors in a typical laser interference lithography system were replaced by a designed prism, and the pattern could be easily changed by only changing the prism, without other modification, irrespective of the number of beams required. In addition, because the laser and the laser interference lithography system are connected by an optical fiber, the system can be moved easily and flexibly. The fabrication of various submicroscale line patterns, holes, and dot patterns with a 270–1400 nm pitch was achieved using the proposed laser interference lithography system.

Development of Nanohole Array Patterned by Laser Interference Lithography Technique

2016 ◽  
Vol 675-676 ◽  
pp. 41-44
Author(s):  
N. Srisuai ◽  
Mati Horprathum ◽  
P. Eiamchai ◽  
P. Chindaudom ◽  
S. Boonruang ◽  
...  
Keyword(s):  
Beam Splitter ◽  
Incident Angle ◽  
Laser Source ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Nanohole Array ◽  
Si Substrates ◽  
Set Up ◽  
Two Parameters

Periodic nanohole pattern was created in spin-coated photoresist S1805 on Si substrates by Laser Interference Lithography (LIL). Wavelength of a laser source used in the optical system is 442 nm with the photon energy 2.80 eV. The system was set up to employ two laser beams from a beam splitter to generate interference pattern and expose to the photoresist. There are two parameters (incident angle and exposure time) which are determined due to affecting the ordering and feature of nanohole array. Therefore, the relation of these two parameters and actual dose were investigated and theoretically analyzed to optimize the resolution of LIL technique for nanoholes. The prepared samples after developing in the M26A for 5 sec were analyzed by field-emission scanning electron microscopy (FE-SEM). The results show that the pitch of the pattern is 440 nm and the smallest hole size is 190 nm The best feature is found for a laser fluence of 140 mJ/cm2. This nanohole array patterned by LIL consists of periodic nanostructures for high density storage to fabricate various nanodevices.

Periodic patterning using multi-facet prism based laser interference lithography

Laser Physics ◽  
2009 ◽  
Vol 19 (3) ◽  
pp. 505-510 ◽  
Author(s):  
R. Sidharthan ◽  
F. Chollet ◽  
V. M. Murukeshan
Keyword(s):  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference

Theoretical study of micro-structure fabrication by multi-beam laser interference lithography with different polarization combinations

2021 ◽  
pp. 2150459
Author(s):  
Xiangxian Wang ◽  
Tianxu Jia ◽  
Jiankai Zhu ◽  
Yingwen Su ◽  
Liping Zhang ◽  
...  
Keyword(s):  
Manufacturing Industry ◽  
Structural Parameters ◽  
Interference Lithography ◽  
Polarization Angle ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Micro Structure ◽  
Periodic Patterns ◽  
Beam Laser ◽  
Micro Structures

In this study, we systematically and comprehensively investigated the influence of polarization angle on the fabrication of micro-structures by multi-beam laser interference lithography. Using theoretical analysis and simulation, we studied the effect of different polarization combinations, i.e. transverse electric (TE) and transverse magnetic (TM) polarization combinations, on the characteristics of the micro-structures fabricated by three-, four-, and six-beam laser interference lithography. We successfully obtained micro-structures with different periodic patterns such as honeycomb dots, quasi-elliptic dots, different square dots, and quasi-triangular dots. The simulation results illustrate that polarization affects the formation of interference patterns, pattern contrasts, and periods. The methods discussed herein are simple, low cost, and allow excellent control over structural parameters, and hence are useful for the micro-structure manufacturing industry.

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